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Jiun-Ruey Chen
110 Summerhill Dr. Apt 7, Ithaca, NY 14850
Mobile: 607-280-2131
jc2642@cornell.edu
OBJECTIVE
Seeking the job position where I can contribute my knowledge in vacuum technologies and
thin film material science to enable development of next generation tools and processes for
future technologies.
QUALIFICATION SUMMARY
Designer and tool manager of a custom reactant delivery system that is incorporated with an
ultra-high vacuum system and enables various studies in the material science and surface
chemistry in my research group.
EDUCATION
Cornell University, Ithaca, NY
Ph. D. Chemical and Biomolecular Engineering Dec. 2016 (Expected)
Graduate Advisor: Prof. James R. Engstrom
Overall GPA: 3.73/4.00
National Taiwan University, Taipei, Taiwan
B.S. Chemical Engineering Jun. 2010
Overall GPA: 3.98/4.00
EXPERIENCE FIELDS
• Vacuum Technologies
• Surface Science
• Thin film material science
RESEARCH
“Developing selective area atomic layer deposition processes for single digit nanometer
technologies”
Constructed a reactant delivery system coupled to an ultra-high vacuum (UHV) chamber:
including the mechanical design, the computational simulation of the system effectiveness, and
building computer-aided control interface.
Investigated in atomic layer deposition (ALD) processes with area selectivity that incorporated
with the custom reactant delivery system and can be applied to future semiconductor
processing.
“Charge Transfer Across the Boundary of Photon-Harvesting Nanocrystals”
Investigated on gas-phase chemical treatment on nanocrystal quantum dots at high pressure
(Torr range) and in vacuo surface analysis in UHV, aiming at improving carrier transport of
next generation solar cells.
AWARDS AND FELLOWSHIP
McMullen Fellowship, Cornell University, 2011
Presidential awards (4 out of 8 semesters), National Taiwan University, 2006-2010
E R GE R G

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PUBLICATION AND SELECTED PRESENTATIONS
J-R Chen, W. Zhang, R.K Nahm, M.A. DiFeo and J.R. Engstrom, Design of microreactor for
thin film deposition and in situ surface analysis, to be submitted in May 2016
H. Zhang, J. Yang, J-R Chen, J.R. Engstrom, T. Hanrath and F.W. Wise, Tuning coupling and
surface quality of PbS nanocrystals via a combined ammonium sulfide and iodine treatment, J.
Phys. Chem. Lett. 642–646 (2016)
J-R Chen, W. Zhang, R.K Nahm, M.A. DiFeo and J.R. Engstrom, Design and characterization
of a microreactor for thin film deposition and in situ surface analysis, ALD 2015, Portland OR,
June 28th
-July 1st
, 2015
W. Zhang, J-R Chen and J.R. Engstrom, Fundamental examinations of surface chemistry-
driven approaches to selective area atomic layer deposition, AVS 62nd
International Symposium,
Oct. 18th
-23rd
, 2015
TECHNICAL SKILLS
• Use and maintain an UHV chamber system
• Cleanroom experience:
o Thin film deposition: evaporation, sputtering, CVD and ALD
o Photolithographic techniques for micro-fabrication
• Thin Film characterization:
o X-ray photoelectron Spectroscopy (XPS)
o Low Energy Ion Scattering Spectroscopy (LEISS)
o Spectroscopic ellipsometry
o Profilometer
o 4-pt probe station
• Computational techniques:
o MATLAB/Simulink
o COMSOL Multiphysics (flow modeling)
• Computer-aided design and control:
o AutoCAD
o LabVIEW (certified associate developer, issued: 01/17/2014)
• Process pipe fabrication using orbital welding system
TEACHING ASSISTANTSHIP
CHEME 4840 Microchemical and Microfluidic Systems
CHEME 3130 Chemical Engineering Thermodynamics
Fall, 2012
Fall, 2015
LEADERSHIP
President, Cornell Taiwanese Student Association 2012-2013
Held annual activities for over 100 members. Built up networks with corporations and alumni
to increase job opportunities for Taiwanese students. Coordinated fundraising from Taiwan
Semiconductor Manufacturing Company (TSMC).
LANGUAGE SKILLS
English: Fluent
Mandarin: Native language
Japanese: Basic