This document outlines the components and systems involved in semiconductor manufacturing processes like plasma etching and deposition. It includes equipment for electrostatic chuck control, optical temperature sensing, plasma generation using RF or DC generators, plasma abatement, remote plasma sources, matching networks, and physical plasma control. Support systems are also listed for chamber cleaning, drying, and providing low voltage or heater power.

1. ELECTROSTATIC
CHUCK CONTROLLER
OPTICAL
TEMPERATURE
SENSOR
ESC SENSOR
PROCESS
CHAMBER
PLASMA
ABATEMENT
REMOTE
PLASMA
SOURCE
RF, DC OR
HIGH ENERGY
GENERATOR
PLASMA,
SPUTTERING
& ION IMPLANT
DENSITY
MATCH
NETWORK
PHYSICAL
PLASMA CONTROL
RF
GENERATOR
MATCH
NETWORK
CHAMBER
CLEAN
DRY
ABATEMENT
AE Powers Semiconductor Manufacturing
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LOW VOLTAGE HOUSE
SUPPORT POWER
HEATER POWER
CONTROLLER