This document is a resume for N. Gopinath summarizing his education and work experience. He has a B.Tech in Information Technology from Pallavan College of Engineering and a diploma in Electronics & Communication from Bhakthavachalam Polytechnic College. Since 2012, he has worked as a Project Technician at IIT Madras' Center for NEMS and Nano-Photonics, where he assists with setting up nanofabrication facilities and processes materials like silicon and GaAs. His responsibilities include process optimization, equipment operation and maintenance, and developing nanofabrication processes. He has experience with lithography, oxidation, deposition, etching, characterization, and packaging. He has fabricated devices for

1. N.GOPINATH
#2, Adambakkam | Chennai | TamilNadu | +91 9944977934| gopinath.nan@gmail.com
Objective
To pursue an intellectual, challenging career and looking for a dynamic position
where my skills and new technology can be innovative for the successful works.
Education
2012 B.Tech. Information Technology
Pallavan College of Engineering, Kanchipuram under the Anna University
Chennai, Scored 6.2 CGPA.
2009 Diploma in Electronics & Communication
Bhakthavachalam Polytechnic College Kancheepuram, Under the
Department of Technical Education TamilNadu, Scored 77%.
Work Experience
2012 Centre for NEMS and Nano-Photonics, IIT Madras
Working in Centre for NEMS and Nanophotonics(Dec 2012-Till now) as a
Project Technician in Microelectronics & MEMS Lab, Department of
Electrical Engineering, Indian Institute of Technology Madras.
Responsibility
 Assist with team for setting up nanofabrication facilities at IIT Madras.
 Process optimization for newly installed equipments.
 Operation & maintenance of equipments.
 Developing nanofabrication processes for the semiconductor materials: silicon,
GaAs and other III-V compounds, Silicon nitride, Silicon oxide, polysilicon and
silicon on insulator (SOI).
Expertisein Fabrication & its Applications
Lithography : Optical lithography
Oxidation & Diffusion : Oxidize or Diffuse the Si by using Furnace
LPCVD & PECVD : Silicon Nitrate/Poly Silicon/Silicon dioxide
Etching Process : Dry Etching (RIE & ICPRIE), Wet Etching
Characterization : Reliability testing of the device
Packaging : Dicing the Wafers, Wire Bonder

2. WORKINGAND MAINTENANCE OF THE FOLLOWING
INSTRUMENTS:
 Tempress&SVCS -Oxidation and Diffusion Furnace.
 Suss Microtech&OAI -Mask aligner/ Bond Aligner (MA6/BA6).
 Oxford Plasma lab -Reactive Ion Etching system,ICPRIE,DRIE.
 Plasma technology – ICPPECVD system.
 First Nano - LPCVD system.
 Edwards- E-beam evaporation system.
 Gaertner- Ellipsometer.
 Veeco-Optical Surface Profiler.
 ADT&Ultratech-Advance Dicing Technology.
Achievements
 Fabricated and packaged a special kind of diodes for RCI Hyderabad.
 Development of a Planar Coil using Lithography for MEMS applications.
 Fabricated and characterized the Solar Cells and MOSFET capacitors.
 Etching the Optical Fiber cable for the gas leak detector application.
 Development of fluidic structures for Sankaranethralaya eye hospital.
 Training many new students and research scholars.
Soft Skills
 Strong initiative and leadership skills
 Analytical thinking and problem solving
 Excellent organizational and planning skills
Skills
Fabrication Programing Operating system
VLSI C Windows
Semiconductors,
Optoelectronics C++,HTML Linux

3. PERSONAL DETAILS:
Name : Gopinath.N
Age & DOB : 25 years, 06-06-1991
Sex : Male.
Marital Status : Single
Nationality : Indian
Contact Number : +91-9944977934.
Permanent Address : #72,Small street,Pudupalayam,
Cheyyar TK,Thiruvannamalai
Passport Number : M2741445
Reference
Mr. Joseph, Technical associate, Dept. of Electrical Engg. Indian Institute of
Technology Madras. e-mail: joseph.mems@ee.iitm.ac.in