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Nanotechnology refers to the branch of science and engineering devoted to designing,
producing, and using structures, devices, and systems by manipulating atoms and mol
at nanoscale, i.e. having one or more dimensions of the order of 100 nanometres
(100 millionth of a millimetre) or less.
Nanoscience is the study of the unique properties of materials between 1-100 nm, and
nanotechnology is the application of such research to create or modify novel objects.
Nanomaterials have unique optical, electrical and/or magnetic properties at the nano
and these can be used in the fields of electronics and medicine, amongst other scenar
QUANTUM CONFINEMENT
Ball milling method
small balls are allowed to rotate around the inside of a drum, then fall on a solid w
gravity force and crush the solid into nano crystallites. Ball milling is used to produ
prepare a wide range of elemental and oxide powders.
Ball Milling
method for synthesis
of nanomaterials
TOP - DOWN APPROACH
BALL MILLING
It is a top-down technique
Also known as mechanical alloying
There are many types of mills such as planetary,
vibratory,
rod, tumbler etc
This process is used in producing
metallic and ceramic nanomaterials
A ball mill works on the principle of impact
Ball milling is used to
produce/prepare a wide range of elemental
and oxide powders.
It consists of:
01
02
Hollow cylindrical shell(drum) rotating
about its axis
03
Grinding media: balls made up of
wolframcarbide / steel / rubber
Precursor powder along with hardened
balls is taken in the drum and is closed with
tight lids
BALL MILLING INSTRUMENTS
WORKING
Drum rotates around a horizontal
axis
As the drum rotates, the balls are lifted up on the rising
side of the drum and then they drop down from near the
top of the drum
The solid particles in between the balls are ground
The milling balls impart energy on collision and produce
smaller grain nanoparticles
The energy transferred to the powder from the
balls depends on:
the rotational speed
size and number of the balls
ratio of the ball to powder mass
the time of milling
Befor
e
Milling
After
milling
Application
To prepare non toxic and biologically active
nano-composites for bio-medical
applications
To prepare nano-composites
Nano-coatings
ADVANTAGES :
1. Low Cost
2. Wet ordry
3. Relatively fast process
 DISADVANTAGES:
1. Residuals due to ballor grinding jar 2.Non-uniform size distribution
3.Waste of material
 4.Quantity in jar can e ect the e iciency
Combustion METHOD:
 The combustion method is popular ,widely used in
academic and industrial fields and efficient method for
synthesis of nanomaterials. Using a simple and
economical process, the combustion method provides a
flexible means of creating nanomaterials.
 It involves a rapid, exothermic reaction between a fuel
and an oxidiser, resulting in the formation of
nanomaterial. This method is often used to synthesize
metal oxides and mixed metal oxides in the nanometer
size range.
The general steps involved in the combustion synthesis of nanomaterials are as
follows:
Selection of precursors:
Choose appropriate precursor materials that contain the desired
elements to form nanomaterial. These precursors can be salts,
nitrates, or other compounds that can easily decompose during
combustion.
Mixing of precursors:
Mix the precursors homogeneously to ensure uniformity in the final
product.
This can be achieved by grinding, ball milling or other mixing
methods.
Formation of reaction mixture:
The precursor mixture is then typically mixed with a suitable fuel
and an oxidiser. Common fuels include urea, glycine, citric acid and
sugars while nitrates or perchlorates are commonly used as
oxidizers. The ratio of fuel to oxidiser and precursor mixture plays a
crutial role in determining the properties of the resulting
nanomaterial.
Ignition and combustion:
The reaction mixture is ignited, either by an external heat source or
by a self-sustaining reaction. The combustion process generates
high temperatures and produces a large amount of gas, leading to
rapid heating and decomposition of the precursors
Nanomaterial formation:
During combustion, the decomposition of precursors occurs and the
metal ions react with oxygen from the oxidiser to form metal
oxides. The rapid heating and cooling rates result in formation of
nanosized particles.
Quenching:
After the combustion is completed, the reaction is quenched to stop
further growth and agglomeration of nanoparticles. This can be
achieved by removing the heat source or cooling the reaction
rapidly.
Nanomaterial collection:
The synthesized nanomaterials are collected and separated from
any residual reactants or by-products. Common methods of
collection include centrifugation, filtration and washing with
suitable solvents.
Advantages:
1)At relatively low temperatures, it enables quick nanomaterial
production.
2)It is particularly useful for large-scale production.
PHYSICAL VAPOUR DEPOSITION
• INTRODUCTION
• TYPES OF DEPOSITIONS
• ADVANTAGES
• DISADVANTAGES
• APPLICATIONS
INTRODUCTION
• Physical Vapour Deposition (PVD) is a collective set of processes
used to deposit thin layers of material, typically in the range of few
nanometers to several micrometers.
• Physical vapor deposition used to produce thin films and
coatings.
• Physical coating (deposition) process involve,
vaporization, transportation & condensation of
material to be deposited.
• PVD is used for high melting point and low vapour pressure
materials
The basic
mechanism -
Atom by atom transfer of material from the solid phase
to the vapor phase and back to the solid phase.
PVD processes are environmental
friendly vacuum deposition techniques consisting of
three fundamental steps:
• 1) Vaporization of the material from a solid
source assisted by high temperature vacuum or
gaseous plasma. High temperature is used
to vapourize the material.​
• 2) Transportation of the vapor in vacuum or
partial vacuum to the substrate surface.
• 3) Condensation onto the substrate to generate thin
films.
PVD
TECHNIQUES: 1. Evaporative deposition
2. Sputter deposition
Different PVD techniques utilize the same
three fundamental steps but differ in the
methods used to generate and deposit
material.
METHODS:
Thermal Evaporation Technique
• Thermal evaporation is a deposition technique that
relies on vaporization of source material by heating the
material using appropriate methods in vacuum.
• The material is evaporated in a vaccum.
• Heat is generated to a evaporate the material by
passing current through a high resistance coil.
• Vapour particles travel towards the target(substrate)
Deposited and condense back to a solid state.
SPUTTERING
TECHNIQUE
• Sputtering is a plasma-assisted technique that
creates a vapor from the source target through
bombardment with accelerated gaseous ions.
• Sputtering works on the bases of momentum
principle, formed by the collision of
the atoms and molecules,​​
• Plasma glow, ion accelerator or radioactive
emitting is used to evaporate material.​​
• Argon gas is used for inert atmosphere.
ADVANTAGES:
• 1) This method consists good strength and
durability
• 2) It is environment friendly vapor deposition
technique​​
• 3)PVD provides high adhesion and Hardness
DISADVANTAGES:
• 1) Cooling systems are required.
• 2) Mostly high temperature and vacuum control needs
skill and experience.
• 3)Cleaning of the substrate surface is not possible.
• PVD is used tofabricate of
microelectronic
devices, Interconnects, battery
and fuel cell electrodes,
Diffusion barriers, Optical and
conductive coatings, Surface
modifications.
• PVD is applied in fabrication of
electronic devices
• PVD is also used in Reflectors
and optics
APPLICATIONS:
Precipitation method
Among various strategies in the development of nanoparticles, chemical precipitation serves as one
of the promising methods to develop the Nano catalysts, since it allows the complete precipitation
of the metal ions. Also, nanoparticles of higher surface areas are commonly prepared by using this
method.
Principle:
The principle involved in the precipitation of precursor materials at constant pH via cond
Precipitation method can be used to prepare nanoparticles of metal oxides, metal
sulphides and metals.
Chemical Vapour
Deposition
technique(CVD)
 The precursors are solid, chemical vapour deposition (CVD) involves
depositing a solid material from a gaseous phase, with the material to be
deposited being vapourized from a solid target and deposited onto the
substrate.
 The term "CVD" refers to a variety of techniques, including
photochemical vapour deposition, chemical vapour infiltration,
chemical beam epitaxy, metal-organic CVD, low pressure CVD,plasma-
assisted CVD,and laser CVD (LCVD).
 Among them, thermal CVD, plasma-enhanced CVD (PECVD), and laser
CVD (LCVD) are the three primary CVD methods.
 Although all of these methods require volatile precursors, whose
chemical composition is changed throughout the deposition process.
 The precursors must have sufficient vapour pressure to produce a
stable, controllable flow to the process chamber.
 High pressure gases such as silane, hydrogen, ammonia, etc. meet this
criterion and are easily delivered to the process using mass flow
controllers (MFCs). Many liquids also have sufficient vapour pressure to
produce stable, controllable flows using MFCs.
 In practice, a substrate is loaded into the process chamber and heated
to the required process temperature under inert gas flow. Once the
substrateis at temperature,the precursor/diluent gas mixture is
introduced to the process chamber and it used to deposit onto the
substrate.
 Ex: CVD for tungsten is achieved from tungsten hexafluoride (WF6),
which may be deposited in two ways:
WF6→W+3F2
WF6+3H2→W+6HF
 By using CVD,copper and aluminum, can also be deposited. It is common
practice to employ CVD for refractorymetals like molybdenum,
tantalum, niobium, as well as titanium and nickel. When deposited on
silicon, these metals can create useful silicides at temperaturesas high
as 1373 K.
CHARACTERIZATI
ONOF NANO-
PARTICLES
USING X-RAY DIFFRACTION
ABHIRAM AND ADITYA
Characterization of Nano-particles:
Characterization refers to the study of material features
such as its composition, structure and its properties
like physical, electrical, magnetic etc.
For characterization of Nano particles both 1) X-ray
diffraction (XRD) and 2) electron microscope are the most
widely used techniques
Characterization of Nanoparticles Using XRD:
XRD is the main method for crystallographic characterization for nano and thin film materials. The
characterization of the nanoparticles through XRD requires a source, a detector, and a sample.
Thin films of nanoparticles are prepared for XRD analysis, Nanoparticle samples of different
orientations are placed on a suitable goniometer, where several reflections are evaluated.
However,
a sample of random orientation scan through a diffraction angle of2θ as shone in the fig.
• Nanoparticles characterization from XRD in
the sample is determined through a search-
match process, where the peaks of high
• intensities are observed. The various atom
arrangements result different XRD peak
patterns as shone in the figure Crystal size,
crystalline phase, shape anisotropy, strain,
texture can be obtained from the evaluation
of width, shape, and position of the
diffraction peaks.
• In an XRD technique, the interference
occurs when the light of a designated
wavelength illuminates a periodic structure
having a predefined spacing.
• The XRD principle follows Bragg’s law,
nλ = 2dsinθ
• Where λ is wavelength of x rays, n is an
integer, d is inter planar spacing, and θ is
diffraction
PRESENTATION TITLE
PRESENTATION TITLE
Since nanoparticles have a large surface to volume ratio, their properties are significantly altered with their
size
The above line tell us that
Nanoparticles due to their large surface-to-volume ratio, exhibit size-
dependent properties. As their size decreases, their physical and chemical
characteristics, such as reactivity and optical behavior can undergo
significant alterations distinguishing them from bulk materials.
Effect of Polymer-Based Nanoparticles on the Assay of
Antimicrobial Drug Delivery Systems
EXAMPLE ON X-RAY
DIFFRACTION
The output from this instrument is generally called
a diffractogram, where the y-axis presents as
intensity, and the x-axis is illustrated as a function
of scanning angle. The result of a diffractogram
gives us some information about: the crystalline
structure, qualitative phase information, and space
group symmetry from the peak positions. On the
other hand, peak intensities present point symmetry
and quantitative phase fractions. Peak shapes and
width of the peaks illustrate crystallite size and
stacking faults, and antiphase boundaries
Conclusion:
In summary, XRD is crucial for exploring tiny
particle structures without causing damage. Its
accuracy and continuous improvements drive
discoveries in science and technology, making it
an invaluable tool. Additionally, XRD's ability to
provide precise measurements and non-invasive
insights further enhances its significance. It's a
key player in understanding the distinctive
properties of small materials.

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NANOTECHNO;OGY (1)NANOTECHNO;OGY (1).pptx

  • 1. Nanotechnology refers to the branch of science and engineering devoted to designing, producing, and using structures, devices, and systems by manipulating atoms and mol at nanoscale, i.e. having one or more dimensions of the order of 100 nanometres (100 millionth of a millimetre) or less. Nanoscience is the study of the unique properties of materials between 1-100 nm, and nanotechnology is the application of such research to create or modify novel objects. Nanomaterials have unique optical, electrical and/or magnetic properties at the nano and these can be used in the fields of electronics and medicine, amongst other scenar
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  • 16. Ball milling method small balls are allowed to rotate around the inside of a drum, then fall on a solid w gravity force and crush the solid into nano crystallites. Ball milling is used to produ prepare a wide range of elemental and oxide powders.
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  • 28. Ball Milling method for synthesis of nanomaterials TOP - DOWN APPROACH
  • 29. BALL MILLING It is a top-down technique Also known as mechanical alloying There are many types of mills such as planetary, vibratory, rod, tumbler etc
  • 30. This process is used in producing metallic and ceramic nanomaterials A ball mill works on the principle of impact Ball milling is used to produce/prepare a wide range of elemental and oxide powders.
  • 31. It consists of: 01 02 Hollow cylindrical shell(drum) rotating about its axis 03 Grinding media: balls made up of wolframcarbide / steel / rubber Precursor powder along with hardened balls is taken in the drum and is closed with tight lids
  • 33. WORKING Drum rotates around a horizontal axis As the drum rotates, the balls are lifted up on the rising side of the drum and then they drop down from near the top of the drum The solid particles in between the balls are ground The milling balls impart energy on collision and produce smaller grain nanoparticles
  • 34. The energy transferred to the powder from the balls depends on: the rotational speed size and number of the balls ratio of the ball to powder mass the time of milling
  • 36. Application To prepare non toxic and biologically active nano-composites for bio-medical applications To prepare nano-composites Nano-coatings
  • 37. ADVANTAGES : 1. Low Cost 2. Wet ordry 3. Relatively fast process  DISADVANTAGES: 1. Residuals due to ballor grinding jar 2.Non-uniform size distribution 3.Waste of material  4.Quantity in jar can e ect the e iciency
  • 38. Combustion METHOD:  The combustion method is popular ,widely used in academic and industrial fields and efficient method for synthesis of nanomaterials. Using a simple and economical process, the combustion method provides a flexible means of creating nanomaterials.  It involves a rapid, exothermic reaction between a fuel and an oxidiser, resulting in the formation of nanomaterial. This method is often used to synthesize metal oxides and mixed metal oxides in the nanometer size range.
  • 39. The general steps involved in the combustion synthesis of nanomaterials are as follows:
  • 40. Selection of precursors: Choose appropriate precursor materials that contain the desired elements to form nanomaterial. These precursors can be salts, nitrates, or other compounds that can easily decompose during combustion. Mixing of precursors: Mix the precursors homogeneously to ensure uniformity in the final product. This can be achieved by grinding, ball milling or other mixing methods. Formation of reaction mixture: The precursor mixture is then typically mixed with a suitable fuel and an oxidiser. Common fuels include urea, glycine, citric acid and sugars while nitrates or perchlorates are commonly used as oxidizers. The ratio of fuel to oxidiser and precursor mixture plays a crutial role in determining the properties of the resulting nanomaterial.
  • 41. Ignition and combustion: The reaction mixture is ignited, either by an external heat source or by a self-sustaining reaction. The combustion process generates high temperatures and produces a large amount of gas, leading to rapid heating and decomposition of the precursors Nanomaterial formation: During combustion, the decomposition of precursors occurs and the metal ions react with oxygen from the oxidiser to form metal oxides. The rapid heating and cooling rates result in formation of nanosized particles. Quenching: After the combustion is completed, the reaction is quenched to stop further growth and agglomeration of nanoparticles. This can be achieved by removing the heat source or cooling the reaction rapidly.
  • 42. Nanomaterial collection: The synthesized nanomaterials are collected and separated from any residual reactants or by-products. Common methods of collection include centrifugation, filtration and washing with suitable solvents. Advantages: 1)At relatively low temperatures, it enables quick nanomaterial production. 2)It is particularly useful for large-scale production.
  • 43. PHYSICAL VAPOUR DEPOSITION • INTRODUCTION • TYPES OF DEPOSITIONS • ADVANTAGES • DISADVANTAGES • APPLICATIONS
  • 44. INTRODUCTION • Physical Vapour Deposition (PVD) is a collective set of processes used to deposit thin layers of material, typically in the range of few nanometers to several micrometers. • Physical vapor deposition used to produce thin films and coatings. • Physical coating (deposition) process involve, vaporization, transportation & condensation of material to be deposited. • PVD is used for high melting point and low vapour pressure materials
  • 45. The basic mechanism - Atom by atom transfer of material from the solid phase to the vapor phase and back to the solid phase. PVD processes are environmental friendly vacuum deposition techniques consisting of three fundamental steps: • 1) Vaporization of the material from a solid source assisted by high temperature vacuum or gaseous plasma. High temperature is used to vapourize the material.​ • 2) Transportation of the vapor in vacuum or partial vacuum to the substrate surface. • 3) Condensation onto the substrate to generate thin films.
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  • 47. PVD TECHNIQUES: 1. Evaporative deposition 2. Sputter deposition Different PVD techniques utilize the same three fundamental steps but differ in the methods used to generate and deposit material. METHODS:
  • 48. Thermal Evaporation Technique • Thermal evaporation is a deposition technique that relies on vaporization of source material by heating the material using appropriate methods in vacuum. • The material is evaporated in a vaccum. • Heat is generated to a evaporate the material by passing current through a high resistance coil. • Vapour particles travel towards the target(substrate) Deposited and condense back to a solid state.
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  • 50. SPUTTERING TECHNIQUE • Sputtering is a plasma-assisted technique that creates a vapor from the source target through bombardment with accelerated gaseous ions. • Sputtering works on the bases of momentum principle, formed by the collision of the atoms and molecules,​​ • Plasma glow, ion accelerator or radioactive emitting is used to evaporate material.​​ • Argon gas is used for inert atmosphere.
  • 51. ADVANTAGES: • 1) This method consists good strength and durability • 2) It is environment friendly vapor deposition technique​​ • 3)PVD provides high adhesion and Hardness
  • 52. DISADVANTAGES: • 1) Cooling systems are required. • 2) Mostly high temperature and vacuum control needs skill and experience. • 3)Cleaning of the substrate surface is not possible.
  • 53. • PVD is used tofabricate of microelectronic devices, Interconnects, battery and fuel cell electrodes, Diffusion barriers, Optical and conductive coatings, Surface modifications. • PVD is applied in fabrication of electronic devices • PVD is also used in Reflectors and optics APPLICATIONS:
  • 54. Precipitation method Among various strategies in the development of nanoparticles, chemical precipitation serves as one of the promising methods to develop the Nano catalysts, since it allows the complete precipitation of the metal ions. Also, nanoparticles of higher surface areas are commonly prepared by using this method. Principle: The principle involved in the precipitation of precursor materials at constant pH via cond Precipitation method can be used to prepare nanoparticles of metal oxides, metal sulphides and metals.
  • 56.  The precursors are solid, chemical vapour deposition (CVD) involves depositing a solid material from a gaseous phase, with the material to be deposited being vapourized from a solid target and deposited onto the substrate.  The term "CVD" refers to a variety of techniques, including photochemical vapour deposition, chemical vapour infiltration, chemical beam epitaxy, metal-organic CVD, low pressure CVD,plasma- assisted CVD,and laser CVD (LCVD).  Among them, thermal CVD, plasma-enhanced CVD (PECVD), and laser CVD (LCVD) are the three primary CVD methods.  Although all of these methods require volatile precursors, whose chemical composition is changed throughout the deposition process.
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  • 59.  The precursors must have sufficient vapour pressure to produce a stable, controllable flow to the process chamber.  High pressure gases such as silane, hydrogen, ammonia, etc. meet this criterion and are easily delivered to the process using mass flow controllers (MFCs). Many liquids also have sufficient vapour pressure to produce stable, controllable flows using MFCs.  In practice, a substrate is loaded into the process chamber and heated to the required process temperature under inert gas flow. Once the substrateis at temperature,the precursor/diluent gas mixture is introduced to the process chamber and it used to deposit onto the substrate.
  • 60.  Ex: CVD for tungsten is achieved from tungsten hexafluoride (WF6), which may be deposited in two ways: WF6→W+3F2 WF6+3H2→W+6HF  By using CVD,copper and aluminum, can also be deposited. It is common practice to employ CVD for refractorymetals like molybdenum, tantalum, niobium, as well as titanium and nickel. When deposited on silicon, these metals can create useful silicides at temperaturesas high as 1373 K.
  • 61. CHARACTERIZATI ONOF NANO- PARTICLES USING X-RAY DIFFRACTION ABHIRAM AND ADITYA
  • 62. Characterization of Nano-particles: Characterization refers to the study of material features such as its composition, structure and its properties like physical, electrical, magnetic etc. For characterization of Nano particles both 1) X-ray diffraction (XRD) and 2) electron microscope are the most widely used techniques Characterization of Nanoparticles Using XRD: XRD is the main method for crystallographic characterization for nano and thin film materials. The characterization of the nanoparticles through XRD requires a source, a detector, and a sample. Thin films of nanoparticles are prepared for XRD analysis, Nanoparticle samples of different orientations are placed on a suitable goniometer, where several reflections are evaluated. However, a sample of random orientation scan through a diffraction angle of2θ as shone in the fig.
  • 63. • Nanoparticles characterization from XRD in the sample is determined through a search- match process, where the peaks of high • intensities are observed. The various atom arrangements result different XRD peak patterns as shone in the figure Crystal size, crystalline phase, shape anisotropy, strain, texture can be obtained from the evaluation of width, shape, and position of the diffraction peaks. • In an XRD technique, the interference occurs when the light of a designated wavelength illuminates a periodic structure having a predefined spacing. • The XRD principle follows Bragg’s law, nλ = 2dsinθ • Where λ is wavelength of x rays, n is an integer, d is inter planar spacing, and θ is diffraction PRESENTATION TITLE
  • 64. PRESENTATION TITLE Since nanoparticles have a large surface to volume ratio, their properties are significantly altered with their size The above line tell us that Nanoparticles due to their large surface-to-volume ratio, exhibit size- dependent properties. As their size decreases, their physical and chemical characteristics, such as reactivity and optical behavior can undergo significant alterations distinguishing them from bulk materials.
  • 65. Effect of Polymer-Based Nanoparticles on the Assay of Antimicrobial Drug Delivery Systems EXAMPLE ON X-RAY DIFFRACTION The output from this instrument is generally called a diffractogram, where the y-axis presents as intensity, and the x-axis is illustrated as a function of scanning angle. The result of a diffractogram gives us some information about: the crystalline structure, qualitative phase information, and space group symmetry from the peak positions. On the other hand, peak intensities present point symmetry and quantitative phase fractions. Peak shapes and width of the peaks illustrate crystallite size and stacking faults, and antiphase boundaries
  • 66. Conclusion: In summary, XRD is crucial for exploring tiny particle structures without causing damage. Its accuracy and continuous improvements drive discoveries in science and technology, making it an invaluable tool. Additionally, XRD's ability to provide precise measurements and non-invasive insights further enhances its significance. It's a key player in understanding the distinctive properties of small materials.