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Muhammad afitah bin awang
Ap090086
900411-03-6299
NANOFABRICATION
 Nanofabrication terbahagi kepada dua iaitu “top
dowm” dan “bottom up”.
 Contoh “top down” adalah optical, x-ray, EUV,
Ebeam,SPM,imprinting,etc.
 Contoh “bottom up” adalah Self-assembly, Langmuir-
Blodgett, etc.
KAEDAH-KAEDAH “TOP-DOWN”
 Pemindahan Corak (litografi)
 Pemendapan (atau pertumbuhan filem)
 Punaran (atau penyingkiran bahan)
1. Pemindahan Corak (litografi)
 Menambah satu bahan yang sensitif kepada cahaya yang
dipangil photoresist kepada permukaan bahan substrat
 Meletakan photomask selari dengan bahan substrat
 Pengunaan photomask adalah untuk menentukan bahagian-
bahagian terkena pancaran UV atau tidak
-Diperbuat daripada kaca atau kuarza dengan corak krom
- Walaupun topeng perlu dibuat dengan litografi
 Dengan itu bahagian yang terkena sinaran UV akan
“membentuk”
 Terdapat dua jenis photoresists
-positive resists
-negative resists
2. Pemendapan (atau
pertumbuhan filem)
 Dilakukan dalam keadaan vacum
 Menggunakan suhu yang tinggi untuk mencairkan
logam
 Berlaku proses penyejatan logam
 Bahan akan menjadi mendakan
 Terdapat dua jenis mendakan wap kimia
-Mendakan kimia bertekanan tinggi
-Mendakan kimia bertekanan rendah
3. Pengasingan (atau penyingkiran
bahan)
 Penggunaan bahan cecair yang bertindakbalas dengan
bahan substrat(tujuan):
-Untuk membasahkan corak bahan amorfus bagi
menghasilkan bentuk isotropi
-Isotropi akan besar jika dalam
 Penyingkiran ion aktif
 Mendakan kimia bertekanan tinggi(ciri-cirinya)
 Mendakan kimia bertekanan rendah(ciri-cirinya)
KAEDAH-KAEDAH “BOTTOM-UP”
 Kimia pertumbuhan wap: pertumbuhan wap pepejal-
cecair
 Bertindak balas sendiri (kimia klorida)
1. Kimia pertumbuhan wap:
pertumbuhan wap pepejal-cecair
 Kaedah perkembangan wap-cecair –pepejal
 -Penggunaan pemangkin diperlukan untuk berlakunya
tindak balas
 -Pemangkin membentuk titisan cecair yang bertindak
sebagai tapak penukleusan untuk berlakunya tindak
balas perkembangan
 -pemangkin dijual dalam bentuk tepu
2. Bertindak balas sendiri (kimia
klorida)
 Berlaku pemanasan sendiri kerana bertindak balas
dengan ion lain.
 Hasil daripada tindak balas terhasilah substrak
 Klorida: merujuk kepada keadaan Pecah Sempadan
dalam satu-satu larutan.
 Contoh bahan-bahan yang biasanya berlaku koloid:-
- Krim putar
- Susu
- Kabus
- Asap
SIAPAKAH ANTARA ORANG YANG
TERAWAL YANG MENKAJI TENTANG
NANOFABRICATION
 Byron D. Gates
 Declan Ryan
 Qiaobing Xu
 Michael D. Stewart
 C. Grant Willson

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Nanofabrication

  • 1. Muhammad afitah bin awang Ap090086 900411-03-6299
  • 2. NANOFABRICATION  Nanofabrication terbahagi kepada dua iaitu “top dowm” dan “bottom up”.  Contoh “top down” adalah optical, x-ray, EUV, Ebeam,SPM,imprinting,etc.  Contoh “bottom up” adalah Self-assembly, Langmuir- Blodgett, etc.
  • 3. KAEDAH-KAEDAH “TOP-DOWN”  Pemindahan Corak (litografi)  Pemendapan (atau pertumbuhan filem)  Punaran (atau penyingkiran bahan)
  • 4. 1. Pemindahan Corak (litografi)  Menambah satu bahan yang sensitif kepada cahaya yang dipangil photoresist kepada permukaan bahan substrat  Meletakan photomask selari dengan bahan substrat  Pengunaan photomask adalah untuk menentukan bahagian- bahagian terkena pancaran UV atau tidak -Diperbuat daripada kaca atau kuarza dengan corak krom - Walaupun topeng perlu dibuat dengan litografi  Dengan itu bahagian yang terkena sinaran UV akan “membentuk”  Terdapat dua jenis photoresists -positive resists -negative resists
  • 5. 2. Pemendapan (atau pertumbuhan filem)  Dilakukan dalam keadaan vacum  Menggunakan suhu yang tinggi untuk mencairkan logam  Berlaku proses penyejatan logam  Bahan akan menjadi mendakan  Terdapat dua jenis mendakan wap kimia -Mendakan kimia bertekanan tinggi -Mendakan kimia bertekanan rendah
  • 6. 3. Pengasingan (atau penyingkiran bahan)  Penggunaan bahan cecair yang bertindakbalas dengan bahan substrat(tujuan): -Untuk membasahkan corak bahan amorfus bagi menghasilkan bentuk isotropi -Isotropi akan besar jika dalam  Penyingkiran ion aktif  Mendakan kimia bertekanan tinggi(ciri-cirinya)  Mendakan kimia bertekanan rendah(ciri-cirinya)
  • 7. KAEDAH-KAEDAH “BOTTOM-UP”  Kimia pertumbuhan wap: pertumbuhan wap pepejal- cecair  Bertindak balas sendiri (kimia klorida)
  • 8. 1. Kimia pertumbuhan wap: pertumbuhan wap pepejal-cecair  Kaedah perkembangan wap-cecair –pepejal  -Penggunaan pemangkin diperlukan untuk berlakunya tindak balas  -Pemangkin membentuk titisan cecair yang bertindak sebagai tapak penukleusan untuk berlakunya tindak balas perkembangan  -pemangkin dijual dalam bentuk tepu
  • 9. 2. Bertindak balas sendiri (kimia klorida)  Berlaku pemanasan sendiri kerana bertindak balas dengan ion lain.  Hasil daripada tindak balas terhasilah substrak  Klorida: merujuk kepada keadaan Pecah Sempadan dalam satu-satu larutan.  Contoh bahan-bahan yang biasanya berlaku koloid:- - Krim putar - Susu - Kabus - Asap
  • 10. SIAPAKAH ANTARA ORANG YANG TERAWAL YANG MENKAJI TENTANG NANOFABRICATION  Byron D. Gates  Declan Ryan  Qiaobing Xu  Michael D. Stewart  C. Grant Willson