AccuSputter AW 4450 Sputter Deposition EquipmentPeter Chen
Allwin21 Corp. is a leading supplier of sputter deposition equipment for high technology applications for Semiconductor III-V, II-VI, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. The AccuSputter AW 4450 is designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new real time AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. Every AccuSputter AW 4450 sputtering system is supported by years of technological experience and backed by a worldwide sales and service organization dedicated to prompt courteous service
The University of Sydney is an Australian public university in Sydney. Founded in 1850, it is Australia's first university and is regarded as one of its most prestigious, ranked as the world's 27th most reputable university.
The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabrication. The AW-105R is in direct response to manufacturer’s concerns for wafer uniformity, uptime, reliability and production-proven technology.
AW-105R Applications:
GaAs, InP, GaN, SiC wafer Strip (Mainly)
GaAs, InP, GaN, SiC wafer Descum (Mainly)
Thin Film Head Resist Cleaning
Opto-Electronic Devices Cleaning
MEMS
Photoresist Stripping
High dose implant (As+, B+, P+)
Rework
Post-polysilicon
Post-metal
Post-oxide
Controlled Resist Removal
Post-develop descum
Uniformity capability (<5% 1σ)
AW-105R Key Features:
Production-proven plasma Asher/Descum system.
Integrated solid robotic wafer handling, Single wafer process.
Up to 3%-5% Uniformity. Best for III-V Materials.
Frontside and backside isotropic removal.
Consistent wafer-to-wafer process cycle repeatability.
Element heating for up to 250oC.
50mm-150mm wafer capability. Up to 6.25” substrate.
Up to 4 wafer size capability without hardware change.
Fixed cassette station and wafer aligner/cooling station.
Can handle 50um thickness wafer.
PC controller with Advanced Allwin21 Software.
Endpoint detection (EOP) with Allwin21 SLOPE technology (Optional).
Up to 3 gas lines with MFC.
Air-Cooled 600W MKS 13.56 MHz RF Generator (300W Option).
Pressure control with Throttle Valve.
15-inch Touch screen monitor GUI.
EMO, Interlocks, and Watchdog function.
GEM/SECS II (optional).
Small Footprint: 27”W x 40”D x 59”H (280LBs)
Made in U.S.A.
AccuSputter AW 4450 Sputter Deposition EquipmentPeter Chen
Allwin21 Corp. is a leading supplier of sputter deposition equipment for high technology applications for Semiconductor III-V, II-VI, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. The AccuSputter AW 4450 is designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new real time AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. Every AccuSputter AW 4450 sputtering system is supported by years of technological experience and backed by a worldwide sales and service organization dedicated to prompt courteous service
The University of Sydney is an Australian public university in Sydney. Founded in 1850, it is Australia's first university and is regarded as one of its most prestigious, ranked as the world's 27th most reputable university.
The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabrication. The AW-105R is in direct response to manufacturer’s concerns for wafer uniformity, uptime, reliability and production-proven technology.
AW-105R Applications:
GaAs, InP, GaN, SiC wafer Strip (Mainly)
GaAs, InP, GaN, SiC wafer Descum (Mainly)
Thin Film Head Resist Cleaning
Opto-Electronic Devices Cleaning
MEMS
Photoresist Stripping
High dose implant (As+, B+, P+)
Rework
Post-polysilicon
Post-metal
Post-oxide
Controlled Resist Removal
Post-develop descum
Uniformity capability (<5% 1σ)
AW-105R Key Features:
Production-proven plasma Asher/Descum system.
Integrated solid robotic wafer handling, Single wafer process.
Up to 3%-5% Uniformity. Best for III-V Materials.
Frontside and backside isotropic removal.
Consistent wafer-to-wafer process cycle repeatability.
Element heating for up to 250oC.
50mm-150mm wafer capability. Up to 6.25” substrate.
Up to 4 wafer size capability without hardware change.
Fixed cassette station and wafer aligner/cooling station.
Can handle 50um thickness wafer.
PC controller with Advanced Allwin21 Software.
Endpoint detection (EOP) with Allwin21 SLOPE technology (Optional).
Up to 3 gas lines with MFC.
Air-Cooled 600W MKS 13.56 MHz RF Generator (300W Option).
Pressure control with Throttle Valve.
15-inch Touch screen monitor GUI.
EMO, Interlocks, and Watchdog function.
GEM/SECS II (optional).
Small Footprint: 27”W x 40”D x 59”H (280LBs)
Made in U.S.A.
HCM Global Projects/Process. Whether you are thinking about a new HCM system, gone live with a new implementation or looking to make the most of your current HCM system, STG can help with it!
The challenges to proper corporate governance emanating from a fast-changing regulatory world and the requirement for timely and accurate performance reporting and disclosure by both shareholders and the competitive market landscape means that corporate leadership is underenormous pressure to deliver within a tightly-confined space.
Making Too Many Responses To Hotel Reviews Is Worse Than Offering No Response...Francesco Canzoniere
The study re-confirmed an earlier estimate that an increase in a hotel’s TripAdvisor rating is reflected in an increase in revenue. Most interesting, the study found that revenue improvements based on review responses are limited in two ways. First, revenue levels increase as the number responses increases, but only to a point. After about a 40-percent response rate, hotels seem to reach a point of diminishing returns, and making too many responses is worse than offering no response at all. Second, consumers seem to be most appreciative of responses to negative reviews, rather than positive reviews, as indicated by the fact that ratings improve more substantially in connection with constructive responses to negative reviews than simple acknowledgment of positive comments.
Download at: http://scholarship.sha.cornell.edu/chrreports/10/
HCM Global Projects/Process. Whether you are thinking about a new HCM system, gone live with a new implementation or looking to make the most of your current HCM system, STG can help with it!
The challenges to proper corporate governance emanating from a fast-changing regulatory world and the requirement for timely and accurate performance reporting and disclosure by both shareholders and the competitive market landscape means that corporate leadership is underenormous pressure to deliver within a tightly-confined space.
Making Too Many Responses To Hotel Reviews Is Worse Than Offering No Response...Francesco Canzoniere
The study re-confirmed an earlier estimate that an increase in a hotel’s TripAdvisor rating is reflected in an increase in revenue. Most interesting, the study found that revenue improvements based on review responses are limited in two ways. First, revenue levels increase as the number responses increases, but only to a point. After about a 40-percent response rate, hotels seem to reach a point of diminishing returns, and making too many responses is worse than offering no response at all. Second, consumers seem to be most appreciative of responses to negative reviews, rather than positive reviews, as indicated by the fact that ratings improve more substantially in connection with constructive responses to negative reviews than simple acknowledgment of positive comments.
Download at: http://scholarship.sha.cornell.edu/chrreports/10/
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