This document lists over 60 publications by James Potzick, a physicist. The publications span from 1990 to present and cover topics related to nanoscale optical measurements, photomask metrology, measurement uncertainty, dimensional metrology standards, and comparisons between international metrology laboratories. Many of the publications were presented at SPIE Advanced Lithography or BACUS Photomask Technology Symposia. Potzick's work focused on improving the accuracy of optical dimensional measurements for photomasks and integrated circuits.

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PUBLICATION LIST
JAMES POTZICK, Physicist
James Potzick and Egon Marx, “Parametric uncertainty in nanoscale optical dimensional
measurements,” Applied Optics, pp 3707-3701, Vol. 51, No. 17, (June 2012)
J. Potzick, “Metrology and process control: dealing with measurement uncertainty,” SPIE Advanced
Lithography, 7638-135 (2010).
Richard Quintanilha, Yeung Joon Sohn, Lowell P. Howard, Michael T. Stocker, Richard M. Silver,
James E..Potzick, “Photomask metrology using a 193-nm scatterfield microscope,” SPIE/BACUS
Photomask Technology Symposium, 7488-55 (2009)
B. Bodermann, D. Bergmann, E. Buhr, W. Häßler-Grohne, H. Bosse, , J. Potzick, , R. Dixson, R.
Quintanilha, M. Stocker, A. Vladar, N. G. Orji, “Results of an international photomask linewidth
comparison between NIST and PTB,” SPIE/BACUS Photomask Technology Symposium, 7488-51
(2009)
Smith, S.; Tsiamis, A.; McCallum, M.; Hourd, A.C.; Stevenson, J.T.M.; Walton, A.J.; Dixson, R.G.;
Allen, R.A.; Potzick, J.E.; Cresswell, M.W.; Orji, N.G., “Comparison of Measurement Techniques
for Linewidth Metrology on Advanced Photomasks,” IEEE Transactions on Semiconductor
Manufacturing, 22, 1, pp. 72-79 (2009)
Egon Marx and James Potzick, “Computational Parameters in Simulation of Microscope Images”,
Progress In Electromagnetics Research Symposium, Beijing, China (2009)
Ronald Dixson, James Potzick, and Ndubuisi Orji, “Re-Calibration Of The SRM 2059 Master Standard
Using Traceable Atomic Force Microscope Dimensional Metrology,” Frontiers of Characterization
and Metrology for Nanoelectronics, Albany, NY (2009)
J. Potzick, “Image library approach to evaluating parametric uncertainty in metrology of isolated feature
width,” Proceedings of SPIE Metrology, Inspection, and Process Control for Microlithography
XXIII, San Jose, Calif. (2009)
J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, E. Buhrb, W. Häßler-Grohne, B.
Bodermann, C. G. Frase, H. Bosse, International photomask linewidth comparison by NIST and
PTB,” Procedings SPIE Photomask (BACUS), 7122-97 (2008)
J.Potzick, “Accuracy of Optical Dimensional Metrology at the Nano-scale”, Microscopy &
Microanalysis 2008 Meeting, Albuquerque, New Mexico (2008)
S. Smith, A.Tsiamis, M. McCallum, A.C. Hourd, J.T.M. Stevenson, A.J. Walton, R.G. Dixson, R.A.
Allen, J.E. Potzick, M.W. Cresswell and N.G. Orji, “Comparison of Measurement Techniques for
Advanced Photomask Metrology”, International Conference on Microelectronic Test Structures,
Edinburgh, Scotland (24-27th March, 2008)
J.Potzick, “Limits of optical dimensional metrology at the nano-scale,” 2nd
Tri-National Workshop on
Standards for Nanotechnology, Gaithersburg, Md. USA (Feb. 6, 2008). (invited)
J.Potzick, B.Grenon, Nanoscale metrology--theory and practice, Course Notes, presented at SPIE
BACUS 2007, BACUS 2008
Ronald Dixson, Ndubuisi G. Orji, James Potzick, Joseph Fu, Michael Cresswell, Richard Allen, Stewart
Smith, Anthony J. Walton, “Photomask Applications of Traceable Atomic Force Microscope

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Dimensional Metrology at NIST,” SPIE Photomask Technology 27th Annual Symposium, vol.
6730-117 (2007).
J.Potzick, “Linewidth Standards and CD Metrology,” Workshop:Critical Dimension Standards: The
Past, Present, and Future, SPIE Symposium on Advanced Lithography (2007) (invited)
J.Potzick, E.Marx, M.Davidson, "Accuracy in Optical Image Modeling," Proceedings of SPIE
Metrology, Inspection, and Process Control Conference for Microlithography XXI, vol. 6518-39
(2007).
R. Attota, R. M. Silver, J. E. Potzick, "Optical Illumination and Critical Dimension Analysis Using the
Through-Focus Focus Metric Method," SPIE Optics and Photonics Conference (2007)
J.Potzick, E.Marx, M.Davidson, Parametric Uncertainty in Optical Image Modeling, Proceedings of
BACUS Symposium on Photomask Technology, vol. 6349-187 (2006).
J.Potzick, A benefit/cost model for metrology in manufacturing, Proc. ISMI Symposium on
Manufacturing Effectiveness, SEMATECH, (2005)
Egon Marx and James Potzick, "Simulation of optical microscope images for photomask feature size
measurements," 2005 Digest of the IEEE Antennas and Propagation Society International
Symposium, 2116-9 Vol. 3B pp. 243-246 (2005).
SEMI Standard P35-0704, Terminology for Microlithography Metrology, SEMI International
Standards, 3081 Zanker Rd., San Jose, California 95134
J. Potzick, "Optical photomask CD metrology at NIST," Proceedings of the 188th PTB Seminar on CD
Metrology; H. Bosse, B. Bodermann, W. Mirande` Eds.; Physikalisch-Technische Bundesanstalt
(PTB), Braunschweig, Germany, (Nov. 20, 2003) (invited)
J.M.Pedulla, J.Potzick, and R.Silver, "Improving the Uncertainty of Photomask Linewidth
Measurements", Proceedings of SPIE 29th International Symposium on Microlithography, vol.
5375-31, (2004).
J. Potzick, "Photomask feature metrology," Ch. 21 of A Handbook on Mask Making Technology, Syed
A. Rizvi, Ed., Marcel Dekker Inc. New York (2005). (invited)
J.M. Pedulla, J. Potzick, R. Silver, "Improving the uncertainty of photomask linewidth measurements,"
Proceedings of SPIE 29th International Symposium on Microlithography, vol. 5375-31, (2004)
J. Potzick, J.M. Pedulla, M. Stocker, "Updated NIST Photomask Linewidth Standard," Proceedings of
SPIE 28th International Symposium on Microlithography, vol. 5038-34, pp. 338-349 (2003).
Starikov, et al, "Applications of image diagnostics to metrology quality assurance and process control,"
Proceedings of SPIE 28th International Symposium on Microlithography, vol. 5042-39 (2003).
J. Potzick, J.M. Pedulla, M. Stocker, "New NIST Photomask Linewidth Standard," Proceedings of
BACUS Symposium on Photomask Technology, vol. 4889-37 (2002).
J. Potzick, "The problem with submicrometer linewidth standards, and a proposed solution,"
Proceedings of SPIE 26th International Symposium on Microlithography, vol. 4344-20 (2001).
J. Potzick, "The Neolithography Consortium--a progress report," Proceedings of BACUS Symposium
on Photomask Technology, vol. 4186-73 (2000).
J. Potzick, "The Neolithography Consortium," Proceedings of SPIE 25th International Symposium on

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Microlithography, vol. 3998-54 (2000).
J.Potzick, “Photomask Metrology and Neolithography” Advanced Reticle Symposium, San Jose, Calif.
(2000)
A. E. Vladar, R. M. Silver, J. E. Potzick, J. S. Villarrubia, "Development of Photomask Artifacts and
Metrology for the 65 nm Device Generation with Extensibility Beyond," ISMT Final Report (2004)
J. Potzick, "Measurement uncertainty and noise in nanometrology," Proceedings of the International
Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, pp 5-12 to
5-18, Florianopolis, Brazil (1999).
J. Potzick, "Noise averaging and measurement resolution (or 'A little noise is a good thing')," Review of
Scientific Instruments, vol. 70, no, 4, pp 2038-2040 (1999).
R. Silver, S. Fox, R. Larrabee, M. Davidson, E. Marx, J. Potzick, E. Kornegay, 1997-98
NIST/SEMATECH Collaboration to Improve High-Accuracy Overlay Metrology (1998).
J. Potzick, "Accuracy differences among photomask metrology tools and why they matter," Proceedings
of the 18th Annual BACUS Symposium on Photomask Technology and Management, Redwood
City, Calif., SPIE vol 3546-37, pp 340-348 (September 1998).
R.M. Silver, J.A. Stone, R.G. Dixson, B.S. Faust, J.E. Potzick, M.T. Postek, J. Fu, D.S. Sawyer, T.V.
Vorburger, Benchmarking the Length Measurement Capabilities of the National Institute of
Standards and Technology, R.M. Silver and J.L. Land, eds., NISTIR 6036 (1998).
J. Potzick, "Accuracy and Traceability in Dimensional Measurements," Proceedings of SPIE 23nd
International Symposium on Microlithography, vol. 3332-57, pp 471-479 (1998). [islands…]
J. Potzick, "Photomask Metrology in the Era of Neolithography," Proceedings of the 17th Annual
BACUS/SPIE Symposium on Photomask Technology and Management, vol 3236, pp 284-292,
Redwood City, Calif. (Sept. 1997).
J. Potzick, "Antireflecting-Chromium Linewidth Standard, SRM 473, for Calibration of Optical
Microscope Linewidth Measuring Systems," NIST Special Publication SP-260-129 (1997).
J. Potzick, "New NIST-Certified Small Scale Pitch Standard," Cal Lab Magazine, May/June 1997,
pp18-24 (reprinted from prize-winning1997 MSC paper).
R. Silver, J.Potzick, F.Scire, C.Evans, M.McLaughlin, E.Kornegay, R. Larrabee, "A Method to
Characterize Overlay Tool Misalignments and Distortions," Proceedings of SPIE 22nd International
Symposium on Microlithography, vol. 3050-09 (1997).
J. Potzick, "New NIST-Certified Small Scale Pitch Standard," 1997 Measurement Science Conference,
Pasadena, Calif. (1997).
J. Potzick, "Strut Structure and Rigid Joint Therefor," U.S. Patent 5,568,993 (1996).
J. Potzick, "New NIST-Certified Length Microscale," Proceedings of the American Society for
Precision Engineering Annual Meeting, Monterey, Calif. (1996)
J. Potzick, "New Certified Length Scale for Microfabrication Metrology," Proceedings of the SPIE
Symposium on Microlithography and Metrology in Micromachining II, vol. 2880-12, (1996)
J. Potzick (NIST), J. Nunn (NPL), "International Comparison of Photomask Linewidth Standards:
United States (NIST) and United Kingdom (NPL)," Proceedings of the SPIE 1996 Annual

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Symposium on Microlithography, Vol. 2725-08, Santa Clara, Calif.
R. Silver, J. Potzick, F. Scire, R. Larrabee, "High Accuracy Overlay Measurements," Proceedings of the
SPIE 1996 Annual Symposium on Microlithography, Vol. 2725-24, Santa Clara, Calif.
M. T. Postek, R. D. Larrabee, L. Linholm, J. E. Potzick, J. Schneir, e. al, "Project Proposal Report to
SEMATECH," SEMATECH Technology Transfer Document; NIST/SEMATECH Proprietary
(1994)
M. T. Postek, J. E. Potzick, J. Schneir, T. Mcwaid, R. D. Larrabee, "SEMATECH Interim Report,"
SEMATECH Transfer Document; NIST/SEMATECH Proprietary (1994)
R. M. Silver, A. Singer, L. Carroll, S. Berg-cross, J. E. Potzick, "Optical Overlay Metrology at NIST,",
Proceedings of KLA Microlithography Seminar (1996)
J. Potzick, "Improved Photomask Metrology through Exposure Emulation," Photomask Japan '95:
Symposium on Photomask and X-Ray Mask Technology II, SPIE, Kawasaki City, Japan, Vol.
2512-61 (20-21 April, 1995).
J. Potzick, "Re-evaluation of the Accuracy of NIST Photomask Linewidth Standards," Proceedings of
the SPIE Symposium on Microlithography, Vol. 2439-20, Santa Clara, Calif., pp232-242 (1995).
R. Silver, J. Potzick, J. Hu, "Metrology with the Ultraviolet Scanning Transmission Microscope,"
Proceedings of the SPIE Symposium on Microlithography, Vol. 2439-46, Santa Clara, Calif.,
pp437-445 (1995).
R. Silver, J. Potzick, R. Larrabee, "Overlay Measurements and Standards," Proceedings of the SPIE
Symposium on Microlithography, Vol. 2439-24, Santa Clara, Calif., pp262-272 (1995).
J. Potzick, "Improving Photomask Linewidth Measurement Accuracy via Emulated Stepper Aerial
Image Measurement," Proceedings of the 14th Annual BACUS Symposium on Photomask
Technology and Management, SPIE Technical Conference 2322, Santa Clara, Calif., pp 353-359
(Sept. 1994).
J. Potzick, "Photomask Linewidth Measurement Uncertainty: an alternative approach via stepper
emulation," SPIE BACUS Newsletter (July, 1994).
J. Potzick, "Accuracy in Integrated Circuit Dimensional Measurements," Ch 3, Handbook of Critical
Dimension Metrology and Process Control, Vol TR52, SPIE, Bellinhgam, Wash., pp 120-132
(Sept. 1993).
Allen, Troccolo, Owen, Potzick, Postek, Linholm, "Comparisons of Measured Linewidths of Sub-
Micrometer Lines using Optical, Electrical, and SEM Metrologies," Proceedings of the SPIE
Symposium on Microlithography, San Jose, Calif., Vol 1926-04, pp 34-42 (1993).
J. Potzick, "A Metrology Model for Submicrometer Dimensional Measurements," Proceedings of the
1993 Measurement Science Conference, Anaheim, Calif. (1993).
Vezzetti, Varner, Potzick, "Antireflecting-Chromium Linewidth Standard, SRM 473, for Calibration of
Optical Microscope Linewidth Measuring Systems," NIST Special Publication SP-260-119 (1992).
Vezzetti, Varner, Potzick, "Antireflecting-Chromium Linewidth Standard, SRM 475, for Calibration of
Optical Microscope Linewidth Measuring Systems," NIST Special Publication SP-260-117 (1992).
J. Potzick, "A Fundamental View of Submicron Dimensional Metrology," Proceedings of the New
England Combined Chapter of the American Vacuum Society Annual Symposium (1992)

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Vezzetti, Varner, Potzick, "Bright-Chromium Standard Reference Material, SRM 476, for Calibration of
Optical Microscope Linewidth Measuring Systems," NIST Special Publication SP-260-114 (1991).
J. Potzick, "Practical Photomask Linewidth Measurements," Proceedings of the SPIE Symposium on
Microlithography, San Jose, Calif., Vol. 1261-13, pp 114-122 (1990).
J. Potzick, "Automated Calibration of Optical Photomask Linewidth Standards at the National Institute
of Standards and Technology," Proceedings of the SPIE Symposium on Microlithography, San
Jose, Calif., Vol. 1087-34, pp 165-178 (1989).
J. Potzick, "On the Accuracy of Low Flowrate Gas Calibrations at the National Bureau of Standards,"
ISA Transactions, 25, 2, p 19 (1986).
J. Potzick and B. Robertson, "Synchronous Phase Marker and Amplitude Detector," U.S. Patent No.
4,520,320 (1985).
J. Potzick, "Performance Evaluation of the NBS Longwave Acoustic Flowmeter," Rev. Sci. Instrum.,
55, 7, p 1173 (1984).
J. Potzick and B. Robertson, "Longwave Acoustic Flowmeter," U.S. Patent No. 4,445,389 (1984).
J. Potzick and B. Robertson, "Longwave Acoustic Flowmeter," ISA Transactions, 22, 3, pp 9-15 (1983).
J. Potzick and B. Robertson, "Longwave Acoustic Flowmeter," Proceedings of the Instrument Society of
America International Conference and Exhibit, C.I. 82-107 (1982).
J. Potzick and B. Robertson, "Flow Measured Acoustically," Physics Bulletin, 33, 9, London (1982).
J. Potzick and B. Robertson, "Voltage Controlled Phase Shifter for Measuring Transfer Function in the
Presence of Noise," Rev. Sci. Instrum., 52 (1981).
B. Robertson and J. Potzick, "Synchronous Marker for Measuring Phase in the Presence of Noise," Rev.
Sci. Instrum., 48, 10 (1977).
J. Potzick and B. Robertson, J. Acoust. Soc. Am., 59, S78 (1976).
J. Potzick, "A New Method for Generating Waterdrops of Specified Mass," NBS Technical Note 776
(1973).
J. Potzick, "A Method for Determining the Dynamic Response of an Elastic Load Cell Element," Rev.
Sci. Instrum., 41, 12 (1970).
Bloss, Melton, Trumbo, Steel, Potzick, "An Extensometer for Use as a Laboratory Standard at
Temperatures of 1500 C," presented at ISA Conference, Philadelphia (1970).
J. Potzick, "Low Frequency Sinewave Oscillator," EEE, Matier Pub. Corp., N.Y. 18, 3 (1970).
J. Potzick, "Ac-dc Regulator-Modulator," Rev. Sci. Instrum., 39, 8 (1968).
Spitznagel, Potzick, Catanese, "New Impedance Method for Determining Viscoelastic Constants," Rev.
Sci. Instrum., 35, 5 (1964).