James Potzick has over 45 years of experience working at the National Institute of Standards and Technology (NIST), where he currently works as an Associate Researcher. He has a Bachelor's and Master's degree in Physics from Xavier University. At NIST, he has led numerous projects involving measurement standards and metrology for properties like photomask linewidth and nanoscale measurements. He has also developed metrology models and measurement techniques for submicrometer objects. Potzick has received several awards for his technical papers and inventions from the Department of Commerce and NIST.

1. Curriculum vitae
CONTACT INFORMATION
James Potzick
National Institute of Standards and Technology
Semiconductor and Dimensional Metrology Division
Metr A117
Gaithersburg, Md. 20899
301-975-3481
potzick@nist.gov
j.potzick@verizon.net
OBJECTIVE
To improve business and manufacturing processes by ensuring measurements of physical properties
are correctly interpreted and have accuracy appropriate to the application of the measurement data.
A measurement and its uncertainty can be compared with a specification and its tolerance to determine
the probability a part is truly in or out of tolerance. Better yet, they can be compared with the
cost/benefit consequences of an incorrect or correct decision based on the measurement. In addition,
the desired property usually can only be measured indirectly, requiring analysis to link the measured
quantity to the desired property.
EDUCATION
Xavier University, Cincinnati, Ohio
B.S., Physics, magna cum laude (1963)
M.S., Physics (1965)
Additional graduate studies in physics at Princeton and Johns Hopkins Universities (1964, 1966)
Additional professional short courses in electronics, physics, optics, electron microscopy, computer
programming, integrated circuit manufacturing, and others
EMPLOYMENT HISTORY
2011-present: National Institute of Standards and Technology (NIST) Associate Researcher
July 31, 2011: retired from Federal service
1966–2011: US National Institute of Standards and Technology (NIST, formerly National Bureau of Standards),
Gaithersburg, Md. 20899
2008-2010: member NIST Research Advisory Committee. Codeveloper and instructor, Nanoscale metrology--theory and
practice, short course presented at SPIE BACUS Photomask symposia 2007, 2008. Member Program Committee BACUS
2009, 2010.
2006-2011: Coordinated international comparison of linewidth nanometrology for the Bureau International des Poids et
Mesures (BIPM). National measurement laboratories from nine countries around the world participating.
1999-2002: Created the Neolithography Consortium, a semiconductor industry group for integrating process modeling into
integrated circuit lithography.
1998-present: Member SEMI Standards Microlithography Committee (Semiconductor Equipment and Materials
International), task force convener and leader Terminology for Microlithography Metrology (SEMI Standard P35)
1995-1999: Precision Engineering Division Measurement Services Quality Team; previously, Division Quality Council.

2. 1993-present: Project leader for Photomask Dimensional Metrology. Responsible for the production and integrity of the
NIST photomask linewidth standards SRM 475, 476, 473, and 2059 (NIST Special Publications 260-117, 260-129).
Designed and developed SRM 2059. Developed and produced new NIST microscope calibration pitch standard (SRM
2800); conceived and designed artifact standard, designed calibration protocol, obtained funding for development and
production.
1990-present: Project leader for development of the NIST UV scanning microscope. Analyzed traditional microscope
design, devised novel structure for improved performance. Developed code for automatic calibration of aforementioned
SRMs.
1987-present: Precision Engineering Div. Project leader for developing improved optical techniques for measuring the
sizes of submicrometer objects. Created conceptual metrology model for better understanding of the measurement process.
Proposed exposure aerial image emulation technique of photomask metrology, and later expanded that idea into the
Neolithography concept for microlithography.
Project leader responsible for the calibration and integrity of national submicrometer photomask linewidth standards and
the promotion of their effective use in industry. Designed and produced improved photomask linewidth standards.
Improved and automated the national linewidth calibration system, leading to greater data integrity and higher throughput.
Thoroughly analyzed and documented calibration uncertainty budget.
1985-1987: Precision Engineering Div. Research on threadwire diameter calibration and laser wavelength correction.
Prior to 1985: Chemical Process Metrology Div. Project Leader, acoustic thermometer for application in the NBS low
flowrate gas flow calibration facility.
Project Leader and co-developer of the NBS Longwave Acoustic Flowmeter.
Technical staff in the Hydraulics, Humidity, and Engineering Mechanics sections of the National Bureau of Standards.
Proctored or taught and undergraduate courses in general and modern physics while in graduate school.
EDUCATION FELLOWSHIPS
Undergraduate scholarship; Woodrow Wilson and National Science Foundation Graduate Fellowships
AWARDS and HONORS
Dept. of Commerce Silver Medal (2006); Dept. of Commerce Bronze Medal (1999); Best Technical Paper, 1997
Measurement Science Conference; NIST Measurement Services Award, 1994; U.S. Dept. of Commerce Inventor's Award
(1984); National Bureau of Standards Certificates of Recognition, (three in 1982, one in 1984).
PROFESSIONAL AFFILIATIONS
Member SPIE since 1994. Elected SPIE Fellow in 2009.
SEMI Standards Microlithography Committee; task force convener and leader Terminology for Microlithography
Metrology (SEMI Standard P35)
PUBLICATIONS / BOOKS
More than 75 published papers and presentations, including 3 patents. Bibliography available on request.
OTHER INTERESTS
Photography, graphic design, high fidelity music, woodworking.