This document summarizes research on the growth and oxidation of indium thin films. X-ray diffraction and atomic force microscopy were used to examine how the crystallinity of indium thin films changes when heated due to oxidation, resulting in an indium oxide film. The goal was to determine if indium oxide could be produced through a simpler and more cost efficient method involving vacuum deposition of indium followed by oxidation, as an alternative to typical sputtering techniques used for indium oxide growth.

1. Amanda M. Landcastle
Department of Physics
Title:
Growth and Oxidation of Indium Thin Films
Abstract:
The crystallinity of indium thin films alters when heated due to oxidation, resulting in an
indium oxide film. X-ray diffraction (XRD) and atomic force microscopy (AFM) are
used to examine the change in crystallinity of the indium thin films under different
heating conditions. Indium oxide is typically grown via sputtering techniques. If indium
oxide could be produced by vacuum deposition of indium with subsequent oxidation, it
could provide an easier and more cost efficient method of growth for future applications.