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High energy ion beam masking using nano-apertures
- 1. High energy ion beam masking by nano-apertures Michael Beljaars, BSc Supervisors: David N. Jamieson Peter Johnston Peter Mutsaers Advice and moral support: Andrew Alves Michael L. Taylor
Editor's Notes
- Welcome everyone, most of you probably already know me, but let me introduce myself for those who do not. My name is Michael Beljaars and I am a student in Applied Physics at the Eindhoven University of Technology. A part of my Master program involves an 3 month external traineeship, which basically can be anywhere in the world as long as you can get it arranged and it is scientific enough. I chose to come to Melbourne because of my interests in both Australia and the research on quantum computing. The project I’ve been working on the last three months is summarized in my title: the masking of high energy ions by means of a very small aperture in silicon cantilevers. Before I continue I would like to thank my supervisors David Jamieson and Peter Johnston for giving me this opportunity and for their guidance during the project. Special thanks go out to Michael Taylor and Andrew Alves, who have been working on the project before me. Their compassion with all my frustrations about the setbacks I encountered was very comforting.