ON OPTIMIZATION OF MANUFACTURING OF FIELD-EFFECT HETEROTRANSISTORS FRAMEWORK A VOLTAGE REFERENCE TO INCREASE THEIR DENSITY. INFLUENCE OF MISS-MATCH INDUCED STRESS AND POROSITY OF MATERIALS ON TECHNOLOGICAL PROCESS
ANALYSIS OF POSSIBILITY OF GROWTH OF SEVERAL EPITAXIAL LAYERS SIMULTANEOUSLY IN GAS PHASES FRAMEWORK ONE TECHNOLOGICAL PROCESS. ON POSSIBILITY TO CHANGE PROPERTIES OF EPITAXIAL LAYERS