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Thermal and mechanical stress
modelling of smart power switches
under active loading
Bala Karunamurthy, KAI, Villach.
ACUM’14. Vienna
Infineon Technologies AG
65 % of reliability issues are
due to Thermo-mechanical loads
(M Glavanovics, KAI: ESSDRC 2004)
Stressed and Unstressed DMOS
Thermally induced loads cause failures
Electric pulses generate temperature
Delamination, cracks, voids, excessive
plastic deformation, metal crawling etc.
Metal Extrusion & Cracks
(T Smorodin, Infineon: ESSDRC 2007)
(W Kanert, Infineon: Journal of Microelectronics Reliability 2012)
Metal Degradation
Si Ingot Slicing Deposition/Etching
Chip Dicing Die Attach Moulding
Chris Welham, Coventor Inc.
Images: APCMag
How can we test a design/product?
Testing Vs Service conditions
Fundamental understanding
0
500
1000
1500
2000
2500
3000
3500
4000
4500
5000
A B C D
CTF
Design
0
500
1000
1500
2000
2500
3000
3500
4000
4500
5000
A B C D
CTF
Design
-40 to +150 C
0 to +80 C
Prof Peter Borgesen
Stress induced voiding (SIV) – process of diffusion and concentration of vacancies to form
voids
Flux, in atoms per unit area per time,
Mobility ; Where,
Driving Force Flux ,







kT
D
M
r
F H




kT
Q
eDD

 0





N
i i
Hi
i
kT
Q
r
VeD
kTAC
J
1
0 .

FMCAJ 
Where does the stress come from?
E1, ν1, α1
E2, ν2, α2
1. INTRINSIC: Film nucleation and coalescence
2. EXTRINSIC: CTE mismatch
E2, ν2, α2
E1, ν1, α1
Heat
Wafer Fabrication
Die Attach
Moulding
Temperature cycling
0
100
200
300
400
500
600
700
800
900
1000
1 2 3 4 5 6 7 8 9 10
Temperature(C)
Process Steps
1
2
3
4
Activate and deactivate element
Use ANSYS “Birth & Kill” Feature
The 5 Challenges
1. Structural complexity
2. Material Matrix
3. Multi-scale & Multi-physics
4. Computational Effort
5. Experimental Validation
(B Karunamurthy, KAI: Journal of Microelectronics)
(S Eiser, KAI)
Elastic, Elastic-Plastic, viscoelastic and visco-
plastic behaviour
Interface strength
Temperature dependent
Strain-rate dependency
Micro tensile experiments
Nanoindendation
4-point bending
Wafer curvature measurement
Lap shear and HCF/LCF Testing
ANSYS Input: BKIN, MKIN, Chaboche, Anand, Prony series etc. or USER MAT
What we need? Methods used
(V Kosel, KAI: 2011)
(G Kravchenko, 2011)
El.Therm Simulations
0
50
100
150
200
250
300
350
400
450
1 2 3 4 5 6
Power
Time (s)
σxy σyz σxz
¼ of Chip-
package
Die, Die
attach &
Lead frame
In-plane (σxy) and out-of-plane (σxz and σyz) on a chip
70 um
Silicon
Mould
Compound
Sub Model
Silicon
Silicon
Mould
Compound
Lead Frame
Just one surface: Half-a-million
elements!
Nested Sub-Modelling
Homogenization Technique
Micro Model
1
2
3
(B Karunamurthy, KAI: Techconnect, Washington 2013)
Stress peak regions correspond to failure sites
Fracture mechanics simulations
Crack and simulated stress state
Experimental validation
Stress
Modelling
Our ultimate goal?
Acknowledgements:
Funding bodies:
(FFG, Project no. 831163) and the Carinthian Economic
Promotion Fund (KWF, Contract KWF-15212274134186).
KAI & Infineon Technologies AG.
© CADFEM 2014
Produkte, Service und Wissen aus einer Hand
Denn Simulation ist mehr als Software
CADFEM (Austria) GmbH
Wagenseilgasse 14
1120 Wien
Tel. +43 (0)1 587 70 73 – 0
E-Mail. info@cadfem.at
Web. http://www.cadfem.at • http://blog.cadfem.at

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Thermal and mechanical stress modelling of smart power switches under active loading ANSYS

  • 1. Thermal and mechanical stress modelling of smart power switches under active loading Bala Karunamurthy, KAI, Villach. ACUM’14. Vienna
  • 3. 65 % of reliability issues are due to Thermo-mechanical loads (M Glavanovics, KAI: ESSDRC 2004) Stressed and Unstressed DMOS
  • 4. Thermally induced loads cause failures Electric pulses generate temperature Delamination, cracks, voids, excessive plastic deformation, metal crawling etc. Metal Extrusion & Cracks (T Smorodin, Infineon: ESSDRC 2007) (W Kanert, Infineon: Journal of Microelectronics Reliability 2012) Metal Degradation
  • 5. Si Ingot Slicing Deposition/Etching Chip Dicing Die Attach Moulding Chris Welham, Coventor Inc. Images: APCMag
  • 6. How can we test a design/product? Testing Vs Service conditions Fundamental understanding 0 500 1000 1500 2000 2500 3000 3500 4000 4500 5000 A B C D CTF Design 0 500 1000 1500 2000 2500 3000 3500 4000 4500 5000 A B C D CTF Design -40 to +150 C 0 to +80 C Prof Peter Borgesen
  • 7. Stress induced voiding (SIV) – process of diffusion and concentration of vacancies to form voids Flux, in atoms per unit area per time, Mobility ; Where, Driving Force Flux ,        kT D M r F H     kT Q eDD   0      N i i Hi i kT Q r VeD kTAC J 1 0 .  FMCAJ 
  • 8. Where does the stress come from? E1, ν1, α1 E2, ν2, α2 1. INTRINSIC: Film nucleation and coalescence 2. EXTRINSIC: CTE mismatch E2, ν2, α2 E1, ν1, α1 Heat
  • 9. Wafer Fabrication Die Attach Moulding Temperature cycling 0 100 200 300 400 500 600 700 800 900 1000 1 2 3 4 5 6 7 8 9 10 Temperature(C) Process Steps 1 2 3 4 Activate and deactivate element Use ANSYS “Birth & Kill” Feature
  • 10. The 5 Challenges 1. Structural complexity 2. Material Matrix 3. Multi-scale & Multi-physics 4. Computational Effort 5. Experimental Validation (B Karunamurthy, KAI: Journal of Microelectronics) (S Eiser, KAI)
  • 11. Elastic, Elastic-Plastic, viscoelastic and visco- plastic behaviour Interface strength Temperature dependent Strain-rate dependency Micro tensile experiments Nanoindendation 4-point bending Wafer curvature measurement Lap shear and HCF/LCF Testing ANSYS Input: BKIN, MKIN, Chaboche, Anand, Prony series etc. or USER MAT What we need? Methods used
  • 12. (V Kosel, KAI: 2011) (G Kravchenko, 2011) El.Therm Simulations 0 50 100 150 200 250 300 350 400 450 1 2 3 4 5 6 Power Time (s)
  • 13. σxy σyz σxz ¼ of Chip- package Die, Die attach & Lead frame In-plane (σxy) and out-of-plane (σxz and σyz) on a chip
  • 14. 70 um Silicon Mould Compound Sub Model Silicon Silicon Mould Compound Lead Frame Just one surface: Half-a-million elements! Nested Sub-Modelling Homogenization Technique Micro Model 1 2 3
  • 15. (B Karunamurthy, KAI: Techconnect, Washington 2013) Stress peak regions correspond to failure sites Fracture mechanics simulations Crack and simulated stress state
  • 17. Acknowledgements: Funding bodies: (FFG, Project no. 831163) and the Carinthian Economic Promotion Fund (KWF, Contract KWF-15212274134186). KAI & Infineon Technologies AG.
  • 18. © CADFEM 2014 Produkte, Service und Wissen aus einer Hand Denn Simulation ist mehr als Software CADFEM (Austria) GmbH Wagenseilgasse 14 1120 Wien Tel. +43 (0)1 587 70 73 – 0 E-Mail. info@cadfem.at Web. http://www.cadfem.at • http://blog.cadfem.at

Editor's Notes

  1. Hinweis: Die Notizen geben nur Orientierungshilfen. Sie müssen nicht eins zu eins erzählt werden. Jeder spricht in seiner eigenen Sprache. Auf die einzelnen Punkte kann man nach Bedarf mehr oder weniger eingehen. Die CADFEM-Angebote sind so aufgebaut, dass zuerst der Nutzen für den Kunden kommt und dann das Angebot von CADFEM. Z. B.: Bedarf an Simulationskapazität und Expertise  Simulation im Auftrag Die Notizen der Trennerfolien 6, 7, 10, 13 und 17 sollten entweder eins zu eins wiedergegeben werden oder sehr nah an der Textvorgabe sein. Diese Folien enthalten die Kernaussagen, die bei den Kunden haften bleiben sollen. Diese Kernaussagen sind konsistent mit den Botschaften auf allen anderen Medien (Internetseite, CADFEM-Profil etc.).