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Abstract                                                                                         Introduction
              STUDIES ON STRUCTURAL, SURFACE MORPHOLOGY                                                                                                                                                                                                                                             CMR: 1993
                   AND MAGNETOTRANSPORT PROPERTIES OF                                                                                                                                                        The manganese oxides of general formula RE1-                                            MR (%)=[ρ(H)-ρ(0)]/ρ(H)*100
                                                                                                                                                                                                  xMxMnO3 (RE = La, Nd, Pr….rare earth, M = Ca,
              Nd0.7Ca0.3MnO3 THIN FILMS PREPARED BY CHEMICAL
                         SOLUTION DEPOSITION METHOD
                                                                                                                                                                                                  Sr….alkaline metal ions) have remarkable interrelated
                                                                                                                                                                                                                                                                                                    Phenomena Exhibited by the
                                                                                                                                                                                                  structural, magnetic and transport properties. Thin films of                                       Manganites
           Jessica R. Chocha, Pooja A. Chhelavda, V. Ganesan, R.                                                                                                                                  Nd0.7Ca0.3MnO3 (NCMO) have been fabricated by Chemical
                         Rawat and J. A. Bhalodia                                                                                                                                                 Solution Deposition method. The CSD grown films have                                              Colossal Magnetoresistance (CMR)
                                                                                                                                                                                                                                                                                                    MI transition concurrent with FM-PM transition
                                                                                                                                                                                                  electronic and magnetotransport properties which are                                              Charge Ordering , Orbital Ordering
            1Department of Physics, Saurashtra University, Rajkot                                                                                                                                 comparable to those of films prepared by the Pulsed Laser                                         Phase Separation
             2UGC-DAE Consortium for Scientific Research, Indore                                                                                                                                  Deposition (PLD) technique and to those of the bulk single
                                                                                                                                                                                                  crystal samples. NCMO films annealed at various
      Experimental Method                                                                                                                                                                        temperatures were grown on LAO (LaAlO3) (100) substrate
                                                                                                                                                                                                  and their structural, surface morphological and magneto
                                                                                                                                                                                                  transport properties were studied through X-ray diffraction
                                                                          • Starting element: Nd, Ca, Mn                                                                                          (XRD), Atomic Force Microscopy (AFM) and Magneto R-                                              Atomic force microscopy
                                                                            acetates
                                                                          • Mixing with 1.5ml acetic acid + DI
                                                                                                                                                                                                  T measurements.                                                                                                                                        NCMO800ºC
              mixture
                                                                            water                                                                                                                                                                                                                                                                       RMS 18.52nm
                                                                                                                                                                                                                                                                                                                                                        Z Amplitude
                                                                                                                                                                                                  Results & Discussions                                                                                                                                 151.26
                                                                          • Heating on stirrer at 80ºC                                                                                                                                                                                                                                                  Max. nm- 95.6
                                                                          • Spin coating unit 6000 rpm, 20s                                                                                       X-ray Diffraction                                                                                                                                      NCMO1000ºC
                      Stirrer
                                                                                                                                                                                                                                           320000
                                                                                                                                                                                                                                           300000
                                                                                                                                                                                                                                                                                                                                                        RMS 18.42nm




                                                                                                                                                                                                                                                                              LAO(200)
                                                                                                                                                                                                  Nd0.7Ca0.3MnO3                           280000   NCMO1000                                                                                            Z Amplitude
                                                                                                                                                                                                                                                    NCMO800
                                                                                                                                                                                                                                           260000                                                                                                       112.66
                                                                                                                                                                                                    LAO (100) Cubic                        240000                                                                                                       Max. nm-40.2
                      • Put the film in a boat for the drying at                                                                                                                                    a=b=c=3.7891Å                          220000
                        120ºC ,30min                                                                                                                                                                                                       200000
                                                                                                                                                                                                   NCMO 800                                                                                        Fourier Transform
                      • Put into furnace for pyrolysis 350ºC,
                                                                                                                                                                                                                               Intensity




              Furnace
                                                                                                                                                                                                                                           180000
                        30 min
                                                                                                                                                                                                                                                         LAO(100)




                                                                                                                                                                                                   Grain size 16nm                         160000
                                                                                                                                                                                                                                                                                                                Average events 655.36
                                                                                                                                                                                                                                           140000
                                                                                                                                                                                                   NCMO 1000                               120000
                                                                                                                                                                                                                                                                                                                     Roughness events                Roughness events
                                                                                                                                                                                                   Grain size 17nm                         100000
                       • Put into furnace for annealed at                                                                                                                                                                                                                                                            714.886                          642.189
                                                                                                                                                                                                                                           80000
                         different temp.,9h with oxygen air                                                                                                                                                                                                                                                          Average slope                    Average slope
                                                                                                                                                                                                  Full Width at Half Max.
                                                                                                                                                                                                                                                         LAO(100)




                                                                                                                                                                                                                                           60000
                       • Then repeat IV-VI for another layer                                                                                                                                      (FWHM)                                   40000                                                                     (events/nm) -11.62              (events/nm )11.6
             Annealing
                         repeating this we can deposit                                                                                                                                            (a) 0.3564 (b) 0.5338                    20000
                                                                                                                                                                                                                                               0
                                                                                                                                                                                                                                                    20              30   40              50   60      70        80
                                                                                                                                                                                                                                                                              2

      Resistivity & Magnetotransport Properties                                                                                                                                                   Conclusion                                                                                       References
                                                                                                                                                                                                                                                                                                    [1] Shaowei Jin, Wenbin Wu, H M Weng, B J Ye and X Y
           0.0005
                                         120000
                                                                                                                                        0T                  M-I Transition                         The present investigation shows that it is possible to grow good quality oriented
                                                                                                                                                                                                                                                                                                           Zhou J. Phys. D: Appl.Phys.39 (2006)
                                                                                                                 0T
                                                                                                                 1T
                                         100000                                                                  5T
                                                                                                                 8T                                                                               films using a low cost technique like the CSD method which does not require
                              (mho cm)




           0.0004                            80000

                                                                                                                                             1T
                                                                                                                                                                                                  complicated instrumentation.
                                             60000                                                                                                        Magnetic field       Curie
           0.0003                            40000

                                                                                                                                             5T
                                                                                                                                                                               Temperatures        The Nd0.7Ca0.3MnO3 (Annealing temperatures 800ºC & 1000ºC) films with good                      [2]    In-Bo SHIM, Young-Jai at, Se-Young Choi J K
 cm)




                                                                                                                                                                  0T           277K
                                             20000




           0.0002
                                                0
                                                     0         50   100        150           200       250        300                          8T
                                                                                                                                                                                                  (100) orientation have been successfully prepared on LAO (100) single crystal
                                                                                                                                                                                                  substrate by the CSD method. The XRD results revealed that no impurity phases
                                                                                                                                                                                                                                                                                                           Phys.Soc. Vol. 37, Oct (2000)
                                                                                                                                                                  1T           288K
                                                                         Temperature K


                                                                                                                                                                                                  existed and very good crystalline. The intensity of the (100) peaks increased with
           0.0001
                                                                                                                                                                  5T           295K               the annealing temperature.                                                                        [3]    H. Y. Hwang, S.-W. Cheong, N. P. O N. p. and
           0.0000
                            0                                 50            100                    150                  200       250           300
                                                                                                                                                                  8T           300K UP             The NCMO were composed of uniformly distributed grains rounded shape in                                Batlogg. Phys. Rev. Lett. 77, 2041
                                                                                     Temperature (K)
                                                                                                                                                                                                  nanometer range and the clear grain growth was observed with increasing
                           950                                                                                                                 0.16
                                                                                                                                                                                                  annealing temperature. Surface roughness values suggest that the surface
                           900
                                                                                                                                               0.14
                                                                                                                                                                                           1T
                                                                                                                                                                                                  morphologies are very smooth for all the films and its scaling with length show that              [4] Goodenough J B 1997 J. Appl. Phys. 81
                                                                                                                                               0.12
                                                                                                                                                                                                  the surface of the films are self affine.
                                                                                                                                                                                           5T
              Resistance




                           850                                                                                                                 0.10



                                                                                                                                                                                                   All the films show large MR and the expected shift to metal-insulator transition
                                                                                                                                                                                                                                                                                                   Acknowledgement
                                                                                                                                         MR%




                                                                                                                                               0.08

                           800
                                                                                                                                               0.06
                                                                                                                                                                                                  towards higher temperature. The MR data suggested that the films are physically
                           750                                                                                                                 0.04
                                                                                                                                                                                           8T
                                                                                                                                                                                                  homogeneous that is the insulator behavior not to poor film quality.
                                                                                                                                                                                                                                                                                                     This work is supported by the UGC-DAE Scientific Research centre Indore and
                                                                                                                                               0.02                                                                                                                                                author is also thankful to Dr. N. P. Lalla for XRD measurements data
                           700
                                   -10                   -8    -6   -4        -2         0         2         4          6     8   10           0.00
                                                                           H(T)                                                                       0      50    100   150   200   250    300

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Studied on structural, surface morphology and magnetotransport properties of NCMO thin films prepared by csd method

  • 1. Abstract Introduction STUDIES ON STRUCTURAL, SURFACE MORPHOLOGY CMR: 1993 AND MAGNETOTRANSPORT PROPERTIES OF The manganese oxides of general formula RE1- MR (%)=[ρ(H)-ρ(0)]/ρ(H)*100 xMxMnO3 (RE = La, Nd, Pr….rare earth, M = Ca, Nd0.7Ca0.3MnO3 THIN FILMS PREPARED BY CHEMICAL SOLUTION DEPOSITION METHOD Sr….alkaline metal ions) have remarkable interrelated Phenomena Exhibited by the structural, magnetic and transport properties. Thin films of Manganites Jessica R. Chocha, Pooja A. Chhelavda, V. Ganesan, R. Nd0.7Ca0.3MnO3 (NCMO) have been fabricated by Chemical Rawat and J. A. Bhalodia Solution Deposition method. The CSD grown films have Colossal Magnetoresistance (CMR) MI transition concurrent with FM-PM transition electronic and magnetotransport properties which are Charge Ordering , Orbital Ordering 1Department of Physics, Saurashtra University, Rajkot comparable to those of films prepared by the Pulsed Laser Phase Separation 2UGC-DAE Consortium for Scientific Research, Indore Deposition (PLD) technique and to those of the bulk single crystal samples. NCMO films annealed at various Experimental Method temperatures were grown on LAO (LaAlO3) (100) substrate and their structural, surface morphological and magneto transport properties were studied through X-ray diffraction • Starting element: Nd, Ca, Mn (XRD), Atomic Force Microscopy (AFM) and Magneto R- Atomic force microscopy acetates • Mixing with 1.5ml acetic acid + DI T measurements.  NCMO800ºC mixture water RMS 18.52nm Z Amplitude Results & Discussions 151.26 • Heating on stirrer at 80ºC Max. nm- 95.6 • Spin coating unit 6000 rpm, 20s X-ray Diffraction  NCMO1000ºC Stirrer 320000 300000 RMS 18.42nm LAO(200) Nd0.7Ca0.3MnO3 280000 NCMO1000 Z Amplitude NCMO800 260000 112.66 LAO (100) Cubic 240000 Max. nm-40.2 • Put the film in a boat for the drying at a=b=c=3.7891Å 220000 120ºC ,30min 200000 NCMO 800 Fourier Transform • Put into furnace for pyrolysis 350ºC, Intensity Furnace 180000 30 min LAO(100) Grain size 16nm 160000 Average events 655.36 140000 NCMO 1000 120000 Roughness events Roughness events Grain size 17nm 100000 • Put into furnace for annealed at 714.886 642.189 80000 different temp.,9h with oxygen air Average slope Average slope Full Width at Half Max. LAO(100) 60000 • Then repeat IV-VI for another layer (FWHM) 40000 (events/nm) -11.62 (events/nm )11.6 Annealing repeating this we can deposit (a) 0.3564 (b) 0.5338 20000 0 20 30 40 50 60 70 80 2 Resistivity & Magnetotransport Properties Conclusion References [1] Shaowei Jin, Wenbin Wu, H M Weng, B J Ye and X Y 0.0005 120000 0T M-I Transition  The present investigation shows that it is possible to grow good quality oriented Zhou J. Phys. D: Appl.Phys.39 (2006) 0T 1T 100000 5T 8T films using a low cost technique like the CSD method which does not require  (mho cm) 0.0004 80000 1T complicated instrumentation. 60000 Magnetic field Curie 0.0003 40000 5T Temperatures  The Nd0.7Ca0.3MnO3 (Annealing temperatures 800ºC & 1000ºC) films with good [2] In-Bo SHIM, Young-Jai at, Se-Young Choi J K  cm) 0T 277K 20000 0.0002 0 0 50 100 150 200 250 300 8T (100) orientation have been successfully prepared on LAO (100) single crystal substrate by the CSD method. The XRD results revealed that no impurity phases Phys.Soc. Vol. 37, Oct (2000) 1T 288K Temperature K existed and very good crystalline. The intensity of the (100) peaks increased with 0.0001 5T 295K the annealing temperature. [3] H. Y. Hwang, S.-W. Cheong, N. P. O N. p. and 0.0000 0 50 100 150 200 250 300 8T 300K UP  The NCMO were composed of uniformly distributed grains rounded shape in Batlogg. Phys. Rev. Lett. 77, 2041 Temperature (K) nanometer range and the clear grain growth was observed with increasing 950 0.16 annealing temperature. Surface roughness values suggest that the surface 900 0.14 1T morphologies are very smooth for all the films and its scaling with length show that [4] Goodenough J B 1997 J. Appl. Phys. 81 0.12 the surface of the films are self affine. 5T Resistance 850 0.10  All the films show large MR and the expected shift to metal-insulator transition Acknowledgement MR% 0.08 800 0.06 towards higher temperature. The MR data suggested that the films are physically 750 0.04 8T homogeneous that is the insulator behavior not to poor film quality. This work is supported by the UGC-DAE Scientific Research centre Indore and 0.02 author is also thankful to Dr. N. P. Lalla for XRD measurements data 700 -10 -8 -6 -4 -2 0 2 4 6 8 10 0.00 H(T) 0 50 100 150 200 250 300