1. Electrodeposition of indium
by Fouda, A.S.; Ahmed, A.I. (Mansoura Univ. (Egypt)); Madkour, L.H. (Tanta Univ. (Egypt))
[en] Metallic indium was deposited from aqueous solutions of indium trichloride containing also, acetate, thiocyanate, chloride, iodide, sulphate, oxalate, ethanol,
acetamide and citrate of sodium or potassium. The optimum conditions are: pH 2-5, current density 2-25 mA cm-2, temperature 30OC and metal ion concentration O.2
mol l-1. Deposits have been obtained on a platinum sheet cathode. Chemical analysis reveals that the purity of the indium is better than 99%. The rate of deposition is
also determined. 15 refs
Subject MATERIALS SCIENCE (B2210)
Source/Report Bulletin de la Societe Chimique de France; (no.2) p. 270-272; ISSN 0037-8968; CODEN BSCFA; Mar-Apr 1987
Record Type Journal article
Country/Org. France
DEC DEPOSITION; DISPERSIONS; ELECTROLYSIS; ELEMENTS; HOMOGENEOUS MIXTURES; METALS; MIXTURES; SOLUTIONS; SURFACE
COATING
DEI AQUEOUS SOLUTIONS; CURRENT DENSITY; ELECTRODEPOSITION; INDIUM; MEDIUM TEMPERATURE; PH VALUE; QUANTITY RATIO
Ref. Number 18098130
Publ. Year 1987
INIS Volume 18
INIS Issue 24