2. Background
BLOCK COPOLYMERS (BCP): class of macromolecules produced by covalently
bonding two or more chemically distinct polymer blocks.
S.B. Darling / Prog. Polym. Sci. 32 (2007) 1152–1204
rochester.edu, empirenews.net,brunton.com
Some applications of BCP
thin films:
• Nanolithography
• High-density information
storage media
• Nanofilters
3. Gradient Surface Energy Substrate
UV LIGHT
Si
SAM (F-OTS)
LVNDF
Si
SAM (F-OTS)
o LVNDF – Linear variable neutral density filter
44.09 mJ m-215.26 mJ m-2
o SAM (F-OTS) – Self assembled monolayer
(fluoride octyltrichlorosilane)
o Si – Silicon Wafer
4. STRUCTURE OF STABLE BCP FILMS
- Polystryrene (PS)
- Polymethylmethacrylate (PMMA)
Annealing
DIA/Thermal
Si
SAM (OTS)
Si
SAM (OTS)
5. Direct Immersion Annealing (DIA)
A. Modi, S. M. Bhaway, B. D. Vogt, J. F. Douglas, A. Al-Enizi, A. Elzatahry, A. Sharma, and A. Karim, ACS Appl. Mater. Interfaces ACS Applied Materials &Amp; Interfaces 7,
21639 (2015).
As Cast
Pre-annealed Film
Objective : Use a gradient surface energy to determine stable to unstable transition point of
BCP thin film
14. Conclusions
• PMMA determined as the wetting block of the BCP
• Direct immersion annealing (DIA) is highly dependent of the surface energy of the
substrate and of the solvent mixture
• Correlation found between solvent mixture surface energy and film stability
- Specifically: determined γc = 22.38 mJ m-2 correlated to theoretical γc from solvent
mixture solvent energy,
Future works
• Perform DIA with different solvent mixtures in order to obtain different γc
• Perform optimization studies on DIA by taking in consideration the
dewetting kinetics together with the ordering kinetics.