This document lists materials and equipment for semiconductor fabrication and metrology. It includes silicon wafers, crystals, SOI wafers, glass wafers, SU8, III-V compounds, targets, high purity elements, CdTe, TeO2, GaN, graphene, nanopores, membranes, CVD materials like CNTs and SiNWs, photo masks, and blanks. It also lists metrology equipment such as an optical profiler, AFM/STM probes, a VertiSense AFM thermal probe, thickness measurement tools, CVD and ALD systems, cleaning tanks, thermal baths, BET/pycnometer/gas sorption analyzers, crystal growth and machining equipment, and particle

1. Si Wafers c Crystals c SOI c Si-Si c Glass Wafers c SU8 c
III-IV c Targets c High purity materials c Cd c Zn c Te c Se c
CdTe c TeO2 c GaN c Graphene c Nanopores c Membranes c
CVD materials – CNT, SiNW c Photo Masks c Blanks
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Metrology c Optical Profiler c AFM / STM Probes c VertiSense AFM thermal probe c Coatings
thickness measurments c CVD, ALD c Megasonic / Ultrasonic cleaning tanks c Thermal controlled
baths c BET / Pycnometer / Gas Sorption Analyzers c Crystals growth & machining c Particles and
Aerosol Technology, Filters testing, Clean rooms approval
9398a
Wafers &
Substrates