Ald2013 ald history_one-slide_puurunen_final

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One-slide announcement of the "Virtual project on the history of ALD", shown as an extra item at the AVS ALD 2013 conference, San Diego, California, July 28-31, 2013. For further info, please look at http://aldpulse.com/node/189 . Everyone interested is welcome to join the effort, which will be open until the end of 2013. A note about the quality: in the conversion from pptx to SlideShare, some spaces have gotten lost. Sorry for this! (pdf to SlideShare worked still less: f became 5.)

Technology

“Virtual project on the history of ALD”
• Goal: generate a common view on the early evolution of ALD
in a collaborative project by the whole ALD community
•“Unknowns” especially in the Molecular Layering work (Soviet Union)
•Invitation to participatepublishedJuly 25, 2013, aldpulse.com
(Riikka Puurunen, AzizAbdulagatov, Jonas Sundqvist and Annina Titoff)
•Everyonewelcome to join, differentbackgroundsbeneficial
• List of early ALD publications will be created
• Participation: read & comment on the significance of at least
one historical publication that interests you (not much work!)
• Result to be published, names of all contributors announced
• Plan: project will be open until the end of 2013
More info: invitation at aldpulse.com; LinkedIn ”ALD History” subgroup; or
Riikka Puurunen at the ALD 2013 conference (Tue: poster 369)

More from Riikka Puurunen

Invited tutorial given by Prof. Riikka Puurunen at the ALD for Industry event, Berlin, 19.3.2019. Video record taken with Panopto, (to be) shared in Youtube, you find the links e.g. through the blog post: https://blogs.aalto.fi/catprofopen/2019/03/19/prof-puurunen-invited-tutorial-at-ald-for-industry-berlin/ Title: ALD Technology – Introduction, History & Principles Abstract: This tutorial keynote will introduce atomic layer deposition (ALD) – a variant of chemical vapor deposition - and fundamental principles and concepts related it from a generic viewpoint applicable to any ALD process and reactor. The early history and current usage of ALD are briefly overviewed: who made the first experiments, when, and why? How has the view on the history of ALD evolved? Where is ALD now used, by whom, and why? ALD relies on repeated chemical adsorption steps from gas phase to surface. The status of understanding the adsorption steps of ALD films will be presented and discussed using mainly the archetype trimethylaluminium-water ALD process as example and 3D conformality modelling as additional vehicle. Plenty of links to further sources of information will be included in this keynote presentation. A related SlideShare: placeholder, where I meant to update the slides afterwards, but this did not succeed as the reupload function has been removed: https://www.slideshare.net/RiikkaPuurunen/ald-for-industry-2019-invited-tutorial-by-prof-riikka-puurunen/RiikkaPuurunen/ald-for-industry-2019-invited-tutorial-by-prof-riikka-puurunen. The update was waiting for the publication of the following review article, which was still in press when giving the presentation: Cremers, Puurunen, Dendooven, Appl. Phys. Rev. (2019), https://doi.org/10.1063/1.5060967. Article published 4.4.2019: Applied Physics Reviews 6, 021302 (2019)

ALD for Industry 2019: Slides of invited tutorial by Prof. Riikka Puurunen

Riikka Puurunen

Oops! Could not update this placeholder with the final presentation as planned: The reupload function that I planned to use, has been removed from SlideShare, see: https://www.slideshare.net/dolaneconslide/bring-back-reupload Slides uploaded separately: https://www.slideshare.net/RiikkaPuurunen/ald-for-industry-2019-slides-of-invited-tutorial-by-prof-riikka-puurunen Originally, this update was waiting for the publication of a review article to be published on ALD conformality: Cremers, Puurunen, Dendooven, Appl. Phys. Rev. (2019), https://doi.org/10.1063/1.5060967. Article published 4.4.2019: Applied Physics Reviews 6, 021302 (2019) Related post in Catalysis Professor's Open: https://blogs.aalto.fi/catprofopen/2019/03/19/prof-puurunen-invited-tutorial-at-ald-for-industry-berlin/

ALD for Industry 2019: Invited tutorial by Prof. Riikka Puurunen

Riikka Puurunen

Adsorption-controlled catalyst preparation by ALD

Riikka Puurunen

<erratum at the bottom / update 3.5.2019> Introductory lecture on Atomic Layer Deposition (ALD) by Prof. Riikka Puurunen, given at Aalto University School of Chemical Engineering on November 8, 2018. Lecture contents: Principles and concepts of ALD; Some history; Applications of ALD; Words on future. In addition to the core lecture contents, discusses where we have ALD layers in our smart mobile phones; mentions (some) faces of ALD in Finland; STG podcasts; Virtual Project on the History of ALD. Corresponding lecture capture by Panopto available at: https://aalto.cloud.panopto.eu/Panopto/Pages/Viewer.aspx?id=bd0aee67-7ca5-4973-8216-a99200e888b1 Erratum! Small errors spotted in the slides are described below. Updated 3.5.2019. * slide 44 Luminescent: ZnS:Mg —> not Mg but Mn! --> ZnS:Mn * slide 54 high-k solution: article not from 2017 but 2007

Introduction to atomic layer deposition (ALD): principles, applications, future

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On the history and future of ALD: VPHA, conformality analysis, mechanisms

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Abstract of the presentation: Atomic layer deposition (ALD) is a thin film growth method generally applicable for the growth of conformal, highquality inorganic material layers down to the nanometer thickness range. ALD is indifferent to the morphology of the underlying substrate and covers even most complex 3-D shapes with a uniform film; as a consequence, ALD is used in an ever-increasing field of applications from catalysts to photovoltaics to microelectronics and beyond. ALD belongs to the general class of chemical vapour deposition (CVD) techniques. The speciality of ALD is the use of repeated self-terminating (saturating, irreversible) gassolid reactions of at least two reactants for the film growth; ALD is therefore non-continuous in nature, as opposed to the continuous CVD processes. In this presentation, I will discuss some challenges related to understanding the surface chemistry of ALD. The commonly-used trimethylaluminium-water ALD process to deposit Al2O3 is used as case example, as it is often presented as model case for ALD. I will also discuss the characteristics of ALD film conformality, as detected by using microscopic lateral high-aspect-ratio structures ("VTT μLHAR") [J. Vac. Sci. Technol. A 33, 010601 (2015)]. Here, the gap height is in the range of 100 nm's and the aspect ratio (AR) can be extremely challenging, e.g. up to 25 000:1. Finally, I will briefly introduce the on-going international volunteer-based Virtual Project on the History of ALD (http://vph-ald.com), where new participants are still welcome. Acknowledgement: The author thanks Finnish Centre of Excellence in Atomic Layer Deposition for funding.

Invited talk at 98th CSC: Surface chemistry of ALD: mechanisms and conformality

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PillarHall basic concept SlideShare

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Puurunen_invited-talk_ALD-modelling_ALD2005_050805

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Puurunen invited lecture AVS-ALD 2009 090719

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EuroCVD-16-2007_Puurunen

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History of ald riikka puurunen 15.11.2013 final

Riikka Puurunen

R. L. Puurunen, H. Kattelus, ALD ATO nanolaminates with adjustable electrical properties, 9th International Conference on Atomic Layer Deposition “ALD 2009”, Monterey, California, July 19-22, 2009. Poster presentation. Acknowledgement (from the Abstract): Acknowledgements: The authors are grateful to Ari Häärä for making the electrical measurements and to Sari Sirviö for supervising part of the sample fabrication and for initial interpretations of the results of the electrical measurements. This work was performed within the “ALDKOMP” project funded by Tekes (Finnish Funding Agency for Technology and Innovation).

ALD ATO nanolaminates with adjustable electrical properties, poster published...

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ALDhistory tutorial in Kyoto ALD 2014

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Poster presented at the AVS ALD 2005 conference. This contains Al2O3 solubility data in deionized water and a report on the "bubbles" which form on ALD Al2O3 when heated. This work has been cited sometimes especially for the bubble formation, and now I want to make it easily accessible for all. --- Controlling the Solubility of ALD Aluminium Oxide in Deionised Water Riikka L. Puurunen, Jyrki Kiihamäki and Hannu Kattelus VTT Technical Research Centre of Finland

Puurunen ald2005 poster-al2_o3-solubility-and-bubbles

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ALD for Industry 2019: Slides of invited tutorial by Prof. Riikka Puurunen

ALD for Industry 2019: Invited tutorial by Prof. Riikka Puurunen

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Puurunen_invited-talk_ALD-modelling_ALD2005_050805

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Ald2013 ald history_one-slide_puurunen_final

1. “Virtual project on the history of ALD” • Goal: generate a common view on the early evolution of ALD in a collaborative project by the whole ALD community •“Unknowns” especially in the Molecular Layering work (Soviet Union) •Invitation to participatepublishedJuly 25, 2013, aldpulse.com (Riikka Puurunen, AzizAbdulagatov, Jonas Sundqvist and Annina Titoff) •Everyonewelcome to join, differentbackgroundsbeneficial • List of early ALD publications will be created • Participation: read & comment on the significance of at least one historical publication that interests you (not much work!) • Result to be published, names of all contributors announced • Plan: project will be open until the end of 2013 More info: invitation at aldpulse.com; LinkedIn ”ALD History” subgroup; or Riikka Puurunen at the ALD 2013 conference (Tue: poster 369)

Editor's Notes

ALD is a fantastic technique that changes, for its part, the world we live in. As for any important technological invention, it is important and interesting to know, where ALD has come from. Most people present today are probably familiar with the invention by TuomoSuntola on Atomic Layer Epitaxy. This started the Finnish branch of ALD in 1974. In the first experiments, zinc sulfide was made from elemental precursors, in a rotary reactor (nowadays called “spacial ALD”). But how many are familiar with the work made by Aleskovskii and Kol’tsov on Molecular Layering in the Soviet Union, which started the Russian branch of ALD? These researchers worked in 1960’s, and they were there before Suntola. When exactly was ALD demonstrated there, and which was the first process? This is currently under discussion. Some people have also recently proposed that actually the nobelist Irvin Langmuir would have done ALD, much earlier – when and how, I think the details have not been brought up. Discussion on the history is popping up every now and then, because the history is poorly described. It would be valuable for the whole scientific ALD community, to have a widely accepted description of the early development of ALD. Creating such a description is a task is larger than any single individual can do, because we all look at the facts from our own background and narrow perspective. To create a common view on the history of ALD, we have started a totally open, collaborative project, where we hope to get scientists from different backgrounds participate and work together.We have been thinking how to realize such a project, and we think we have found a way that works. An open invitation to participate has recently been published at the internet site aldpulse.com.

Ald2013 ald history_one-slide_puurunen_final

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