Invited tutorial given by Prof. Riikka Puurunen at the ALD for Industry event, Berlin, 19.3.2019.
Video record taken with Panopto, (to be) shared in Youtube, you find the links e.g. through the blog post: https://blogs.aalto.fi/catprofopen/2019/03/19/prof-puurunen-invited-tutorial-at-ald-for-industry-berlin/
Title: ALD Technology – Introduction, History & Principles
Abstract: This tutorial keynote will introduce atomic layer deposition (ALD) – a variant of chemical vapor deposition - and fundamental principles and concepts related it from a generic viewpoint applicable to any ALD process and reactor. The early history and current usage of ALD are briefly overviewed: who made the first experiments, when, and why? How has the view on the history of ALD evolved? Where is ALD now used, by whom, and why? ALD relies on repeated chemical adsorption steps from gas phase to surface. The status of understanding the adsorption steps of ALD films will be presented and discussed using mainly the archetype trimethylaluminium-water ALD process as example and 3D conformality modelling as additional vehicle. Plenty of links to further sources of information will be included in this keynote presentation.
A related SlideShare: placeholder, where I meant to update the slides afterwards, but this did not succeed as the reupload function has been removed: https://www.slideshare.net/RiikkaPuurunen/ald-for-industry-2019-invited-tutorial-by-prof-riikka-puurunen/RiikkaPuurunen/ald-for-industry-2019-invited-tutorial-by-prof-riikka-puurunen. The update was waiting for the publication of the following review article, which was still in press when giving the presentation: Cremers, Puurunen, Dendooven, Appl. Phys. Rev. (2019), https://doi.org/10.1063/1.5060967. Article published 4.4.2019: Applied Physics Reviews 6, 021302 (2019)