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This paper explains the fabrication of thin film using modified Physical Vapor Deposition (PVD) Module. Physical Vapor Deposition (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces. The surface morphology of various such as Titanium Dioxide and Aluminum thin film has been studied. The Titanium Dioxide and Aluminum thin film has been fabricated on Silicon (Si) substrate using modified Physical Vapor Deposition (PVD) module system. The process started with the establishment of process flow, process modules, and process parameters. Two modules were developed. The characteristics prior to the thin film fabrication namely surface morphology, metal thickness characterization and V-I characteristic were recorded. The samples were characterized by Optical Microscope, Atomic Force Microscope (AFM),X-ray diffraction (XRD) and I - V characterization. The result and data were analyzed and applied in the fabrication of thin film using various materials. The thin film fabrication process used Titanium Dioxide (TiO2) nanopowder and Aluminum (Al2O3) nanopowder for the coating process. The result for each processes are presented in this paper.
FabricationofThin FilmUsing Modified Physical Vapor Deposition (PVD) Module
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IJRES Journal
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