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Thin films

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this shows how the thin films are related to our day to day life this helps u while taking seminar

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Thin films

  1. 1. LET ME BEGIN MY SEMINAR NOW
  2. 2. WE ARE GOING TO KNOW SOMETHING ABOUT ?
  3. 3. THIN FILMS
  4. 4. WHAT IS A THIN FILM ? • A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness.
  5. 5. CLASSIFICATION OF THIN FILMS (a) single crystals (b) epitaxial (c) polycrystalline (d) amorphous.
  6. 6. PROPERTIES OF THIN FILMS (a) High surface to volume ratio (b) Geometrical control (dictated by substrate) (c) Compact (d) Single crystal like properties
  7. 7. USES OF THIN FILMS  Microelectronic devices  Telecommunication devices  Decorative coatings  Optical coatings (windows, solar cells, etc.)  Sensors  Catalysts
  8. 8. LIQUID PHASE DEPOSITION PROCESS, LPD)
  9. 9. SEM IMAGES OF THE DEPOSITED H-FEOOH FILMS AT VARIOUS CONCENTRATIONS. CONCENTRATION OF H3BO3: (A) 0.30, (B) 0.40, (C) 0.45, (D) 0.50, (E) 0.55, AND (F) 0.60 MOL DM-3.
  10. 10. CHEMICAL BATH DEPOSITION (CBD)
  11. 11. SOME PRINCIPLES INVOLVED • while the water itself provides oxygen, initially in the form of OH- ions. • Hydrolysis can occur even in acidic solutions when the metal cation is easily hydrolysable, as with Fe3+ , Ti4+ , Zr4+ , and Al3+ • CBD requires supersaturated solutions, i.e. the concentrations must exceed the solubility product • In a closed system, growth cannot continue once the reactants have been depleted below this point, which determines the thickness of the film
  12. 12. CHEMICAL VAPOR DEPOSITION Involves one or more gas phase species which react on a solid surface (substrate) to deposit a solid film. Typically, the reaction is initiated by heating the substrate. Other mechanisms of supplying the activation energy necessary to initiate reactions include: laser CVD, photo CVD, and plasma enhanced CVD.
  13. 13. DISADVANTAGES • High operating temperatures • Toxic Gases • Generally applicable to binary and elemental films • Not suitable for production of metastable products
  14. 14. ADVANTAGES • High deposition rates • Capable of accurate stoichiometry control • High quality films (low defect concentration) • No need for high vacuum components • Favored in industrial settings
  15. 15. REQUIREMENTS FOR PRECURSOR • High Purity (No unwanted doping) • Good Vapor Pressure • Stability • Clean Decomposition on Surface
  16. 16. DO YOU KNOW ?
  17. 17. HOW THE THIN FILMS ARE PRESENT IN OUR DAY 2 DAY LIFE ?
  18. 18. THIN FILMS & YOU
  19. 19. Thank you
  20. 20. 

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