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MEMS, Etching, Ab Initio and Monte Carlo based simulation

Published in: Technology
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  1. 1. IntelliEtch Atomistic Etch Simulator
  2. 2. IntelliEtch Validated simulator Speed Detailed experimental backing Fast simulation speed. Results in 5-30 minutes depending upon resolution Ab initio effects First principle based etcher, includes Export to FEA effects of steric interaction, backbond Direct export to IntelliSuite tools weakening, impurity micromasking Validated database Composite processing Database for etching based upon pioneering Effects of multi-masking, multiple work of Dr Sato at U Nagoya process steps
  3. 3. Experimental validation Etched Silicon Sphere Etch Results Simulation Results Dr. Sato et al, U Nagoya Japan