6th Industrial Symposium on Nanoimprint Lithography 23 May 2012 | 0900-1400 | IMRE SR1 Confirmed Invited InternationalSCOPE OF SYMPOSIUM Speakers from:The past five annual industry symposia on nanoimprintlithography have been excellent sources of information forcorporate attendees of all stripes, from potential end-users tovalue-chain enterprises, seeking to stay abreast of the latestdevelopments in the field. The 6th Industrial Symposium onNanoimprint Lithography, 2012 will emphasize commercialapplications that are closest to production. Internationalspeakers from companies with interests in nanoimprinttechnology will emphasize this theme, as well as convey recentdevelopments in their respective businesses. Furthermore,there will be corporate exhibits showcasing the latest productsproduced by and for nanoimprint technology. The symposiumis intended as a platform to foster partnership and explore newcollaborations with industry.Chair Hong Yee LOW Institute of Materials Research and Engineering, SingaporeCo-chair & Jaslyn LAWCorrespondence Institute of Materials Research and Engineering, Singapore 3 Research Link, Singapore 117602 Tel: (65) 6874 7902; Email: firstname.lastname@example.orgREGISTRATION Organized by:Register online by 21 May 2012 at:http://www.imre.a-star.edu.sg/events.php?id=B531O538N534Registration is free, however pre-registration is compulsory.