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2. What Is Thermal
Oxidation?
• Thermal oxidation is a process that alters
the
chemical composition of a silicon wafer.
Through this process, the surface of
the wafer is
converted into silicon-dioxide (SiO2),
which has
different mechanical and electrical
properties than raw silicon.
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3. Process
Details
• In its simplest form, thermal oxide is
grown by
heating a wafer to high temperature in the
presence
of either
oxygen
oxide)
.
Film
thickness is
specifies
process
(dry oxide) or water vapor
(wet
• controlled via the recipe,
which
time, temperature, and
other key• After oxide is grown, the wafer is
inspected to
4. Application
s
• Thermal oxidation is a key process in a
variety of
industries and applications.
SiO2 is an excellent insulator
(dielectric) and is
removed easily with hydrofluoric acid
(HF).
It can be used as a mask, a thermal or
electrical isolator, a sacrificial layer,
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