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Perkin elmer-4480


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Perkin elmer-4480

  1. 1. Perkin Elmer 4480 Sputtering System Page 1 of 3 20 Years Proven True "Work Horse" Sputter Home | Products | Services | Spare Parts | Wanted | Contact Us | Site Map AccuSputter AW 4450 | Perkin-Elmer 4480 | Perkin-ELmer 4450 | Perkin-ELmer 4410 | Perkin-ELmer 4400 | Perkin-ELmer 2400- 8SA | Perkin-Elmer 2400-8L Sputtering Equipment Perkin-Elmer PE 4480 Sputtering Systems AccuSputter AW 4450 - Brand New We have been focusing on providing solutions and Perkin-Elmer 4480 enhancements to Perkin-Elmer Sputtering Systems including Perkin-Elmer PE 4400, PE 4410, PE 4450, PE 4480, PE Perkin-ELmer 4450 2400 Series. These OEM Sputter Coating systems have been used in production and R&D since 1980"s and 1990s. They have been proven to be a true "work horse". Perkin-ELmer 4410 Please contact us by e-mail ( sales@perkin-elmer- Perkin-ELmer 4400 ) to check whether the fully refurbished and upgraded Perkin-ELmer PE 4480 Sputter Deposition is Perkin-ELmer 2400-8SA available. Perkin-Elmer 2400-8L Perkin-Elmer Sputtering Deposition Download Information PDFWORD Versatile Systems For Any Sputtering Need The Perkin-ELmer 4400 Series Sputter Deposition Systems, designed specially for high throughput production environments, features a high capacity load lock and a broad range of operating models to accommodate virtually any thin film coating requirement. High Throughput The 4400 Series fast cycle load lock, cryogenic pump, and full flood Meissner trap ensures quick turnaround on batch loads. High throughput are achieved for a full range of substrate sizes and shapes. High Yield A rotating substrate table for multi-pass deposition helps assure high uniformity and run-to-run repeatability. Simplicity of mechanical design with a minimum number of moving parts in the process chamber minimizes the generation of defect-causing. Easy loading pallet designs reduce wafer breakage. Consistently clean vacuum conditions assure reproducible high quality films. Optimum Process Control The 4400 Series provides a broad choice of target materials, machine operating models, pressure and gas controls, cathode configurations and power levels. Operating models include DC magnetron, RF magnetron, RF diode, bias sputter, reactive sputter, co-sputter and RF etch. Total Control of Critical Film Characteristics The 4400 Series systems yield excellent films for a wide variety of 12/14/2012