Testing in both the Nanophase Optical Polishing Laboratory and in customer manufacturing facilities has demonstrated the considerable benefits of Nanophase slurries, including faster time to surface finish, improved slurry longevity, reduced sleeks and scratches, and reduced waste. See the data from one of these tests comparing Nanophase Cerium Oxide with a standard, commercially available ceria powder. Learn more: http://nanophase.com/markets/optical-surface-polishing/

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Increasing Your Polishing Slurry’s
Productivity
Abigail Hooper

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Presented By:
Abigail Hooper
Research and Development Chemist at
Nanophase Technologies
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Advantages of Nanophase Technologies’
Plasma Synthesis Process
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Nanophase Technologies Corporation:
• Nanophase manufactures nanocrystalline cerium oxide particles using a
patented plasma process.

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Advantages of Nanophase Technologies’
Plasma Synthesis Process
Nanophase Discrete Crystalline Ceria Typical Calcined and Milled Ceria
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• Particle morphology modified throughout
process by growth and fracture
• Many steps → many sources of variability
• Variable crystallite shape and size
• Variable surface chemistry
• Easily fractured
• Milling processes add metallic impurities
• Particle morphology, crystallinity and size
set during plasma synthesis
• Fewer steps → fewer sources of variability
• Controlled, equi-axed crystallite size
• Uniform surface chemistry
• Non-friable, high density particle
• High purity (surface and bulk)

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Nanophase Maintains High Removal Rate
Longer
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Standard ceria
attrits down
during polishing
process
Nanophase Ceria
maintains its
particle size
throughout the
polishing process
Because of its
particle integrity,
Nanophase Ceria
maintains high
removal rates
over long
polishing runs
while standard
ceria loses its
effectiveness

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Longevity and Productivity – Test Conditions
Controls:
• 3 sets of fused silica discs polished for 11.8 hours each
• 10 kgs of slurry at 5 wt% Ceria solids was used for the entire experiment
• No adjustments or top-offs were made to the slurry during the testing
• Parts pulled periodically to measure material removal rate and roughness
Key Findings:
• Material Removal Rate (MRR)
– Nanophase CE-6752 essentially unchanged over the duration of polishing
– Competitive Slurry MRR dropped to one third of the initial rate
• Surface Quality
– No compromise to surface quality while achieving low peak-to-valley with Nanophase
CE-6752
– Competitive materials achieve equivalent surface finish at the start but display poor
consistency after initial run
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Comparison of Slurry Polishing Performance:
Removal Rate

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Comparison of Slurry Polishing Performance:
Surface Quality

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Comparison of Slurry Polishing Performance
Average Material Removal Rate per “Shift”
CE-6752 Competitor % Higher Rate
Average MRR for 24 hours in study 5,745 3,751 65%
Average MRR – First 8 hours 5,582 5,195 8%
Average MRR – Second 8 hours 5,877 3,384 74%
Average MRR – Third 8 hours 5,777 2,676 116%
MRR Standard Deviation Among
Shifts
149 1,299
Materials Removal Rate (MRR) - Angstroms/min
Key Observations
• Average MRR of Nanophase CE-6752 was 65% > Competitor slurry
• Standard deviation of Nanophase CE-6752 MRR was 1/10th of the Competitor slurry
• MRR performance advantage of Nanophase CE-6752 increases with increasing run time
• MRR of Nanophase CE-6752 beyond 24 hours is STILL over 2X higher than Competitor MRR
during the initial 24 hours
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Implications for Production – MRR*
• Model production scenario
– 100 microns removal per part
– 7.5 hours of operating time
per shift
• Nanophase CE-6752 – 54%
HIGHER productivity per
day
| *Materials Removal Rate10
0
10
20
30
40
50
60
70
80
First Shift Second Shift Third Shift
PolishingRuns
Daily Production Performance Index
CE-6752 Competitor

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Thank you for joining us!
To request a slurry sample, visit
www.nanophase.com/slurry
or call 630-771-6700