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Hitachi FT150 XRF Analyzer: for ultra thin measurements

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Authorized distributor, Eastern Applied, presents an introduction to the industry leading Hitachi FT-150 X-ray fluorescence (XRF) analyzer. High precision is achieved in ultra thin measurements and micro-spot analysis needs. Learn More at http://www.easternapplied.com/hitachi-FT150-xrf-analyzer

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Hitachi FT150 XRF Analyzer: for ultra thin measurements

  1. 1. Hitachi High-Tech Science Corporation’s FT-150 XRF for Ultra Thin Measurements (Eastern Applied Research, Inc. is responsible for the contents of this presentation. Certain material is used with the permission of Hitachi High-Tech Science Corporation.) Authorized Distributor; United States and Mexico
  2. 2. What is Ultra Thin? Can be considered a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. Quality control of ultra thin coatings with XRF is commonly seen in the printed circuit board industry but may also be utilized in semiconductor wafer fabrication facilities for process control. Applications are not limited to these industries. Benefits (may vary to application) Flat surface Through-put efficiencies Uniform plating Lead (Pb) free Ideal soldering surfaces Common Methods to create thin films Electro-Plating Immersion Coating Vapor Deposition Methods PVD, physical vapor deposition CVD, chemical vapor deposition
  3. 3. Common Examples Immersion Silver 5~16 micro-inches (0.12~0.40µm) Typical: 8~12 micro-inches (0.2~0.3µm) ENIG (Au/Eni): Immersion Au: 5 micro-inches (0.127µm) Electroless Ni: 150 micro-inches (3.8µm) ENEPIG (Au/Pd/Ni): Au: 2 micro-inches (0.05µm) Min. Immersion Gold Pd: 3~8 micro-inches (0.076~0.2µm) Electroless Palladium Ni: 120~240 micro-inches (3~6µm) Electroless Nickel On Silicon Substrates: SiO2, AlSi, Ti, TiN, Pt, Al, and BPSG
  4. 4. The Answer: FT-150 -Printed Circuit Boards (PCBs) -Ultra Small Chips -Wafer Bumps -Metal Film Stacks -Data Interconnects -Lead Frames The Hitachi FT-150 XRF analyzer combines industry leading detector technology with poly-capillary optics to offer high performance and repeatability of ultra thin film measurements. The poly-capillary optics achieve a 30uM beam (FWHM: 17uM), allowing for enhanced performance of ultra thin measurements in small regions.
  5. 5. Analyzer Evolution Even greater performance from Hitachi FT-150 High performance from Seiko SFT-9500 series
  6. 6. Improved RSD% FT9500X FT150 Avg SD RSD% Avg SD RSD% Au (uM) 0.0129 0.00040 3.1% 0.0131 0.00016 1.3% Pd (uM) 0.0118 0.00031 2.6% 0.0111 0.00019 1.7% Ni (uM) 0.4940 0.00116 0.2% 0.4676 0.00047 0.1% Standards: Au (0.013 uM) Pd (0.012 uM) Ni (0.5 uM) Cu substrate Repeated 30 times FT9500X FT150 Avg SD RSD% Avg SD RSD% Au (uM) 0.0061 0.00018 2.9% 0.0062 0.00010 1.5% Pd (uM) 0.0176 0.00058 3.3% 0.0180 0.00034 1.9% Ni (uM) 0.9042 0.00164 0.2% 0.9045 0.00078 0.1% Lead frames Repeated 10 times Note: RSD% is relative standard deviation; the absolute value of the coefficient of variation…CV is defined as the ratio of the standard deviation to the mean. It shows the extent of variability in relation to mean.
  7. 7. FT-150 Highlights • High Precision Measurements at Micro-Spots • Poly-Capillary Optics • Enhanced Visibility of Sample and Measurement Spots • Variation of Application Capabilities • Ease of Use, New Graphical User Interface • Redesigned Chamber/Door for Ease of Operation
  8. 8. Vortex Detector High Performance Silicon Drift Detector (SDD): Vortex Detector Benefits: Faster Measurement Times, Greater Resolution Resolution compared to predecessor (SFT9500’s) Vortex is a registered trademark of Hitachi High-Tech Science Corporation Registered trademark number 5184003 High Energy Resolution High Count Rate Detector
  9. 9. Poly-Capillary Optics Poly-capillary: an optical element that works like a convex lens to focus x-rays onto a micro spot and is composed of several thousands of glass capillary tubes. Benefit: Greater performance at micro-spots (under 100uM) Example: Au/Pd/Ni/Cu multi-layer coatings in circuit boards or connectors Important to Note: Spot size lists at 30uM, but FWHM is 17uM
  10. 10. Chamber Design An innovative chamber door design provides an enhanced opening Benefits: Enhanced sample visibility Simple and efficient sample positioning Easier access than competitive systems The higher resolution camera provides a clearer image of samples FT150 SFT9500
  11. 11. Software Functions Newly developed software results in greater ease of use Register various measurement methods by creating “apps” Benefits: Streamlined…results and conditions are automatically saved into the database. Secure verification and data management Increased operator efficiency and throughput
  12. 12. Three Variations FT150 FT150H Mo Target W Target 17 keV 30-40 keV Max Sample: 15.7 x 11.8 x 3.9 inches (WxDxH) Stage Travel: 15.7 x 11.8 inches (W-D) Major Difference: Mo and W tube targets. Tungsten (W) is for when higher excitation is required (ie Tin). Mo for when lower excitation is required (ie Gold). FT150L Mo Target 17keV Max Sample: 23.6 x 23.6 x 0.78 inches (WxDxH) Stage Travel: 11.8 x 11.8 inches (W-D)
  13. 13. Specifications Element Range Aluminum (13) to Uranium (92) X-ray Source 45kV, (varied targets, Mo and W) Detector Silicon Drift Detector (SDD) X-ray Focusing Optics Poly-Capillary Sample Observation CCD Camera, 1 million pixels Focus Adjustment Laser focus, Auto focus Max Sample Size, base model Two Options (see variations) Stage Travel Two Options (see variations) Measurement Software Thin Film FP (5 layers, 10 elements) Thin Film Calibration Curve Method Qualitative Analysis Data Process Microsoft Excel and Word
  14. 14. Contact Info FT-150 Info and Literature: http://www.easternapplied.com/hitachi-FT150-xrf-analyzer Contact Eastern Applied Research Inc for literature, demonstrations, discussions: http://www.easternapplied.com/ 716-201-1115 ~ sales@easternapplied.com

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