Crann lab equipment available for industry - May 2010
Chairman’s Message 4
Directors’ Introduction 5
CRANN Overview 6
Industry Engagement 8
Case Studies 12
— Intel 14
— Hewlett-Packard 16
— Boston Scientific 18
— Cellix 20
— Roche 22
— Eblana Photonics 24
— M/A-Com 26
— Helium Ion Microscope 29
— Scanning Electron Microscopes & Electron Beam Lithography 30
— Focused Ion Beam 31
— Transmission Electron & Scanning Transmission Microscopy 32
— Atomic Force Microscope 33
— CRANN Cleanroom 34
— Femtosecond Laser Systems 35
— Atomic Force Microscopy (AFM), Raman Microscope
& Scanning Near Field Optical Microscopy (SNOM) System 36
— Class II Biohazard Facility 37
1 micron diameter sphere
in a polystyrene mould,
captured by Ronan Daly
using the Zeiss Ultra SEM
4 — INDUSTRY ENGAGEMENT 5 — INDUSTRY ENGAGEMENT
Over the last ten years there has been A driver of this change in our relationship I would encourage all in industry to actively The Centre for Research on Adaptive CRANN is central to all the primary infrastructure within these facilities. In addition
significant investment in developing both with research is the role of universities as consider the benefits from engaging in Nanostructures and Nanodevices nanoscience initiatives in Ireland. CRANN is we have a professional industry interface team
the physical and human infrastructure educators, innovators and most importantly collaborative research with organisations (CRANN) is recognised internationally a Science Foundation Ireland (SFI) Centre for dealing with all issues necessary for effective
necessary to enable Ireland to compete industry collaborators. CRANN now partners such as CRANN and I hope this booklet as a leading institute for nanoscience Science Engineering and Technology (CSET), collaborative research programmes such as
globally in terms of research, development with 30 companies around Europe providing provides clarity on the benefits, the engage- research. CRANN is comprised of a the lead institution in the Higher Education the development and protection of intellectual
and innovation (RD&I). In that time Ireland research and infrastructure expertise. In ment mechanisms and the openness of team of over 250 researchers, led by 17 Authority supported INSPIRE consortium property, finance, secondment of industry
has made significant steps forward from Ireland, multi-national companies such as CRANN to work with your company. Principal Investigators (PIs). CRANN (www.inspirenano.ie) and a co-host (with the researchers and project management.
a research and industrial perspective. Intel, Hewlett-Packard and Boston Scientific PIs are based across many disciplines Tyndall National Institute) of the Enterprise
Trinity College Dublin is now ranked in benefit from harnessing the powerful including the Schools of Physics, Ireland / IDA established Competence Centre CRANN carries out collaborative research
the top 50 universities in the world and combination of leading scientific thinking, Chemistry, Medicine, Engineering and for Applied Nanotechnology (CCAN). programmes with 30 companies both in
Ireland is ranked for the first time in the coupled with excellent infrastructure. In Pharmacy at Trinity College Dublin and Ireland and internationally. CRANN has
top 20 countries globally for the quality addition, many indigenous businesses such University College Cork. CRANN brings together many exceptional active research relations with more than
of its research. In parallel, industry in as Creganna, Aerogen, Cellix and others strengths making the institute a suitable 150 research institutions in numerous
Ireland is now focussed more on research. utilise the capabilities at CRANN as a tool CRANN works across the research partner for industry collaboration. CRANN countries around the world and is the primary
The Industrial Development Agency to make their businesses more competitive Sean Dorgan spectrum from the development of new has two stand-alone research facilities, driver in Ireland’s global ranking of sixth in
(IDA) reported that in 2009 the number of and to accelerate research programmes and Chair, CRANN Institute Board nanomaterials with improved mechanical, the Naughton Institute and the CRANN terms of both the quality of its publications
investments in RD&I equated to 49% of product development. magnetic, electrical or optical properties Advanced Microscopy Laboratory (AML), and the volume output per capita.
all investments secured during the year, and their subsequent application in both of which provide unique infrastructure
with the total being in excess of #500m. electronic or medical devices, sensors, capabilities coupled with specialist expertise. This booklet is designed to provide a window
Enterprise Ireland (EI) reported that the or new drug delivery systems. CRANN is Importantly CRANN has a dedicated team of to industry on the variety of research engage-
indigenous companies who had invested committed to engaging in collaborative technical specialists with extensive industry ments which are possible in partnership with
in research are now performing stronger in research programmes with industry. and research experience who support the CRANN, to describe how these engagements
these tougher economic climates. are initiated and enabled and most importantly
to demonstrate the clear value return to
industry from partnering with CRANN.
Dr. Diarmuid O’Brien
Executive Director, CRANN
Prof. John Boland
6 — INDUSTRY ENGAGEMENT 7 — INDUSTRY ENGAGEMENT
OVERVIEW GOVERNANCE & BENCHMARKING:
The CRANN institute has been CRANN has developed an organisational CRANN has the capacity to provide industry RESEARCH
established to bring together a critical structure to ensure we deliver on both of with a single managed point of contact SCHOOL OF PHYSICS, TCD
mass of exceptional researchers our goals. The CRANN Institute Board is to ensure the process of engagement is
based across a diversity of Schools comprised of leading figures from industry efficient and straightforward. Our industry SCHOOL OF CHEMISTRY, TCD
and Departments within Trinity College and key stakeholders from our university engagement experts will offer clear advice
Dublin and University College Cork. partners. Our Board ensures best operational to companies on the most effective model of SCIENTIFIC ADVISORY BOARD DEPARTMENT OF CHEMISTRY, UCC
practice and a maintained focus on the dual engagement and map out a pathway which
CRANN has two primary complementary nature of our mission. In addition, we have a will provide the best return on investment. PRINCIPAL INVESTIGATORS SCHOOL OF MEDICINE, TCD
goals: the development of an international Scientific Advisory Board (SAB) comprised CRANN has personnel who will work with
reputation for research excellence as of globally leading nanoscience researchers. industry in managing all issues associated DEPUTY DIRECTOR POSTDOCTORAL RESEARCHERS SCHOOL OF PHARMACY & PHARMACEUTICAL SCIENCES, TCD
determined by publications in the highest The SAB acts as a benchmark to ensure with research engagement from a quick
rated international peer review journals and CRANN research remains competitive at the response to a specific query, to identifying DIRECTOR RESEARCH FELLOWS BIOSCIENCES/BIOENGINEERING, TCD
the development of collaborative research highest international standards. the best characterisation and measurement
relations with industry which harness the techniques for your samples or materials, the
scientific excellence of our researchers and All CRANN PIs are based within a University preparation of research programme budgets
the unique infrastructure and facilities which School and are active in both teaching and and funding proposals, data handling and INSTITUTE BOARD
are available within CRANN. research. CRANN has 250 researchers active confidentiality agreements, the implementa-
within the institute. These researchers have tion of intellectual property agreements or
been attracted to CRANN from all over the the rapid characterisation or failure analysis
world with over forty different nationalities of materials or devices. In all cases CRANN EXECUTIVE DIRECTOR INDUSTRY RELATIONS
represented. CRANN provides a vibrant and is committed to harnessing the significant
exciting environment for researchers to build resources at our disposal to ensure industry COMMERCIALISATION & LICENSING
their research careers but also to engage receives the best possible experience from
with industry. its engagement with CRANN. INTELLECTUAL PROPERTY MANAGEMENT
Coupled with this environment, which CRANN is recognised as the premier institute CENTRAL EQUIPMENT FACILITIES
encourages and enables the best academic in Ireland which bridges the divide from
research, CRANN has established an effec- leading edge research to focussed solution COOPERATION
tive and professional operational interface. orientated collaborative industry research.
CRANN has in place leading technical COMMUNICATIONS
specialists with many years experience in
both industry and research having worked for FINANCE
companies like Intel, Hewlett-Packard, Xilinx,
Boston-Scientific, Carl-Zeiss, IBM, Siemens, FACILITY MANAGEMENT
Infineon and many others. In addition CRANN
has exceptional back-office support for EDUCATION & OUTREACH
OPERATIONAL I.T. SUPPORT
8 — INDUSTRY ENGAGEMENT 9 — INDUSTRY ENGAGEMENT
INDUSTRY ENGAGEMENT 10 REASONS TO PARTNER WITH CRANN
CRANN actively engages with all industry
types, from small-to-medium enterprises
(SMEs) to multinationals in diverse
CRANN’s diverse research base, our
international reputation and the institute’s
world class infrastructure are seen as key
CRANN’s commercialisation specialists
can identify new opportunities and foster
business relationships through varied funding
01 02 03
Provides a competitive Adopts a scalable fixed Provides a scalable human resource model,
sectors. We operate a comprehensive enablers, providing an extremely flexible, programmes and agencies, offering and
configurable resource that is externally advantage by imaging, asset model for cost giving access to highly trained scientists and
engagement model, scalable to your identifying the most appropriate route for
organisation’s needs, by identifying each managed to meet each company’s needs. your company. CRANN can drive the full measuring, characterising centres – access to high- engineers using state-of-the-art equipment with
company’s key challenges, translating Key elements in-place to enable this engagement process from application to materials and devices end analytical equipment expert post-measurement analysis.
these requirements into a work approach are strong institute governance, project submission through to implementation using state-of-the-art without the depreciation
programme, identifying and applying for an IP management strategy, the timely and final commercialisation in partnership with analytical facilities that are charge.
the appropriate funding and assigning financial and administrative management the company and state agencies. unique nationally.
CRANN resources to deliver the solution. of all programmes and the availability of
Engagements can be fully collaborative dedicated CRANN staff to manage the As a company your engagement path with
or contract research, ranging from industry engagement under direct company CRANN can indeed be varied. It could
04 05 06 07
multi-disciplinary teams based across oversight. be as an industry partner collaborating to
both partner sites to a single CRANN drive your research agenda in a European
researcher. Programmes can utilise the funded consortium or as a member of
full gambit of CRANN capabilities, access the Competence Centre for Applied Offers dedicated EU Proven experience Provides a platform Provides fast turnaround
specific infrastructure assets or simply Nanotechnology. You could access CRANN’s funding specialists and working with 30 for researching by using a facility that
use one piece of equipment to perform instrumentation under an innovation voucher a platform for EU project industry partners. new commercial is based in Dublin city
a single measurement. In every case the or a direct funding model to solve your development. applications for centre and is committed to
solution provided is custom designed to immediate production problems, or perhaps your intellectual partnering and servicing
address the problem. even develop new processes or products
under the Enterprise Ireland innovation
partnership scheme. Whatever your mode
of engagement, CRANN will commit to
offering you the best solution to address your
08 09 10
Provides flexible solutions Allows you to concentrate on core activities Provides access to
from training, to material and outsource tasks that tie up capital facilities and people within
analysis, to collaborative and labour. Trinity College Dublin,
research programmes. Ireland’s highest ranked
10 — INDUSTRY ENGAGEMENT 11 — INDUSTRY ENGAGEMENT
DIFFERENT WAYS WE ENGAGE PROVIDING CONFIGURABLE SOLUTIONS
WITH INDUSTRY AND IDENTIFYING NEW OPPORTUNITIES
UC TS LIFE
IA LP EN
TR S Enterprise Ireland Science Direct Industry European Union IDA Higher Education
D US INDUSTR Foundation Ireland Support Authority
RELA IAL D
ON I EVE
C EF A GE Competence PI Fundamental Contract Framework Securing FDI Delivery of
I EN NC
SC Centres Research Research Programme 7 Infrastructure Access
Opportunities for Direct access to
collaborative & contract world class infrastructure,
research programmes. technical specialists & Innovation CSET Industry Rapid Materials Partnering with Promoting Irish Enabling
Partnerships Facing Research Analysis Leading Institutes Research Excellence Fundamental Research
TION & COMMUNI
Innovation Industry Local Manufacturing Leveraging Showcasing the Foundations for delivery
Partnership in fundamental Leadership in national
Vouchers Supplements Support EU Funding ‘Best in Class‘ of core research
research programmes with research networks,
the option of embedding centres of excellence
researchers in residence. CRANN & competence centres.
Technology Technology and Consultancy Networking International
Developments Innovation Development Opportunities Company Engagements
Sourcing funding Support for manufacturing,
opportunities, proposal rapid materials analysis,
submissions, financial & product development & Proof of Concept Specialist Competence
project management. consultancy Awards Training Centre
Participation in European
& national funded industry Commercialisation
ON focussed collaborations.
MENTAL PROTECTION AGEN
CLEAN TECHNOLOGIES CRANN has a successful track record in developing industry linkages under state funded
TARGET SECTORS support mechanisms and through individual company funded engagements. We actively
FUNDING SUPPORT MECHANISMS partner with the Irish state agencies and the European Union in promoting and managing
MODES OF ENGAGEMENT knowledge generation initiatives with direct industry impact. CRANN works closely with the
agencies to identify and implement the best opportunity and engagement mechanism to
support, fund and administer the research for each company.
12 — INDUSTRY ENGAGEMENT 13 — INDUSTRY ENGAGEMENT
CRANN partners with a wide range of clients
across diverse industrial sectors, both nationally
and internationally. Engagement modes vary and
are tailored to meet the company’s technical
requirements, administered by CRANN and leveraged
on established funding support mechanisms. These
case studies illustrate typical industry interactions
ranging from short targeted projects, addressing
an immediate production or product issue, to
larger research programmes that integrate into the
company’s own product development roadmap.
Intel Researcher in Residence
working on SEM in the AML
14 — INDUSTRY ENGAGEMENT 15 — INDUSTRY ENGAGEMENT
INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD
The semiconductor roadmap, driven by CRANN has world leading experts and Advanced e-beam capability is enabling
Moore’s Law, requires the density of semicon- infrastructure in a diverse range of research the contacting of these nanometre devices,
ductor devices to double every 18 months. areas, which when combined, has enabled which are being electrically tested to confirm
This drum beat of miniaturisation presents significant breakthroughs in understanding performance and reliability.
many challenges for transistors to halve in size and providing potential solutions to this
through each new generation of technology. challenge. This capability to use novel materials to
pattern, create and contact nanometre
A key challenge associated with the semi- CRANN’s material expertise enabled the scale devices is internationally leading and
conductor roadmap is the requirement to utilisation of block copolymers to create harnesses the unique infrastructure and
develop new techniques for patterning the scalable thin film templates at the required capability at CRANN.
300 mm silicon wafer controllably down to sub 20nm dimensions. The development of
sub 20 nm dimensions. these materials required expertise in the pre CRITICAL CRANN ENABLERS
and post processing of these materials via — Nanomaterial processing and characterisation.
spin-coating techniques, thermal annealing — Cleanroom facilities which enable
and environmental control. controlled thin film lithography, etching
Using state-of the art cleanroom facilities and — E-beam lithography to contact sub 20nm
processes, the block-copolymer thin films devices and features.
were then preferentially etched to enable the — Scanning electron microscopy (SEM),
creation of a nanometre dimension mask on scanning tunnelling microscopy (STM) and
silicon which was subsequently transferred transmission electron microscopy (TEM) to
directly to the silicon substrate. The silicon image, contact and characterise nanowires
nanowires were characterised using scanning and devices at the sub 20 nm dimension.
and transmission electron microscopy. — Electrical contacting and testing of
“ The Advanced Microscopy Laboratory will
greatly enhance CRANN’s ability to perform
leading edge work in pursuing further
miniaturisation of electronic components,
deep into the nanotechnology era.” SEM image of an etched block-copolymer on a silicon
substrate and the transfer of the pattern to the silicon
Leonard Hobbs, Head of Research at Intel Ireland
substrate – creating wires of a sub 20nm dimension.
16 — INDUSTRY ENGAGEMENT 17 — INDUSTRY ENGAGEMENT
INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD
HP is looking to develop a low-cost flexible, CRANN has internationally leading expertise The CRANN-HP partnership has led to
transparent, thin-film electrode. This is a in the synthesis, functionalisation and charac- significant programme funding from HP
critical component in the development of new terisation of nanomaterials and the processing in the US and SFI, which will lead to the
electronic flexible displays that can be used of these nanomaterials to fabricate devices. commercialisation of cutting edge products.
for laptops, e-books and other electronic To respond to the HP challenge, through SFI The collaboration has already produced
devices which are ultra thin, flexible, light- funding, CRANN brought together a team outstanding results leading to both research
weight and have low power consumption. of twenty researchers in partnership with publications and the filing of intellectual
four HP researchers. This team combined a property at both CRANN and HP. The
diverse range of expertise from nanomaterial CRANN-HP team is now the international
synthesis and characterisation, thin film lead in terms of the thin film electrodes it can
processing and characterisation, mechanical, produce. These electrodes have been used
optical and electric testing and the integration to manufacture prototype displays from a
of the electrode into prototype devices. range of different technologies across the
The programme integrates the research
activity at CRANN and HP Ireland with HP’s This research will transfer to HP over
technology roadmap to develop flexible the course of this programme to enable
transparent displays utilising low cost new products, process improvements
manufacturing. This strategy has enabled HP and commercially relevant technological
Ireland to partner with, and directly harness, advancements. This programme will continue
the ongoing research capability at CRANN to ensure high quality sustained research
and to develop its mandate as a leading activity in Ireland, a key factor in enabling HP
solution provider within HP globally. activities both locally and globally.
CRITICAL CRANN ENABLERS
— Nanomaterial synthesis, processing and
“ This partnership with CRANN provides a characterisation.
— Mechanical, optical and electrical testing
platform to grow research activity within of thin films.
— Scanning electron microscopy (SEM),
HP Ireland.” scanning tunnelling microscopy (STM)
and atomic force microscopy (AFM)
Pat Harnett, R & D Manager, HP Ireland
to provide insight into nanotube and
— Spray, filter and spin-coating deposition
SEM image of a forest of carbon nanotubes grown
of thin films from solutions.
and characterised at CRANN.
18 — INDUSTRY ENGAGEMENT 19 — INDUSTRY ENGAGEMENT
INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD CRITICAL CRANN ENABLERS
Precise understanding and control of novel CRANN used their expertise to characterise — Clustering of FIB tools for device
coronary stent coating properties, such the biodegradable polymer coatings on sectioning with high resolution
as thickness, chemical composition, and Boston Scientific stents using novel imaging Scanning Electron Microscopy
adhesion, is essential for device prototyping, and Focused Ion Beam [FIB] cross sectioning (SEMs) for imaging and analytics.
product development and formal FDA techniques. Previously, Boston Scientific used — Extensive experience in control,
submissions. overseas research institutes, such as the modification, characterisation and testing
Fraunhofer Institute in Germany, to perform of a wide variety of polymer based and
Boston Scientific recently announced a €90 this type of investigation. composite materials.
million strategic investment, enabling their — World leading experience in scanning
Galway plant to become involved at an earlier The project resulted in a detailed analysis probe microscopy, such as the Atomic
stage of the research, development and of the polymer coating dimensions and Force Microscope [AFM], and nano-
innovation process. Boston Scientific/Labcoat established defined methods of repeating indentation within the Principal
has developed a novel technology in Ireland, highly accurate measurements on curved Investigator base.
for dispensing and controlling biodegradable surfaces using methods not available inter- — Dedicated human capital and industrial
polymer and drug coatings on drug-eluting nally to the customer. experience in tool sets such as the FIB.
coronary stents. This innovation is an exciting
development, in a market recently valued at The initial project has now been broadened
$1.8 billion annually in the U.S. alone. in scope and duration to include the charac-
terisation of the propriety technology using
other techniques, such as nano-indentation.
“ Boston Scientific Galway has advanced the
next generation of cardiovascular technology
by leveraging the scientific know-how and
research infrastructure of CRANN.”
Dr. Fergal Horgan, R&D Engineer at Boston Scientific
Mixture of bare metal stents and polymer coated stents
cross sectioned using a focussed ion beam for layer
20 — INDUSTRY ENGAGEMENT 21 — INDUSTRY ENGAGEMENT
INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD
Cellix develops and commercialises Nanotechnology plays a prominent role in the This approach aims to deliver a custom
instrumentation in the area of microfluidics for development of new materials and methods designed library of antibodies, each
cell-based assays. The development of novel for the early diagnosis and treatment of recognising and tagging a required molecule
early diagnostics platforms, using microfluidic inflammatory conditions, infectious diseases with a specific barcode signature. Analysis
technology for reliable, high-sensitivity and cancer. Researchers in CRANN used can be performed in real time with single
screening and detection of small amounts of magnetic barcode systems for enhanced moiety sensitivity which means a very
informative biomarker molecules of human molecular detection. This technology is high throughput, cost effective, targeted
diseases, has strong commercial benefits. a novel recognition system for identifying diagnostic assay system.
biomolecules in a liquid environment (e.g.
blood or serum samples). This work has CRITICAL CRANN ENABLERS
resulted in the development of patentable — Multi-disciplined approach to problem
— Access to Type II biological laboratory,
CRANN adopted a multi-disciplinary cleanroom and materials deposition and
approach with several parallel research processing toolsets.
trends working in close coordination: — Nanoparticle synthesis and segmented
nanowire production, the generation of magnetic nanowires development.
a prototype microfluidics system, the — Biocompatibility and toxicology analysis.
functionalisation of magnetic nano-particles — Size selective labelling – nanoparticles
with antibodies and the design of prototype ingested by cells.
magnetic sensor arrays for incorporating into — Advanced high content screening analysis.
the microfluidics device. — Fundamental understanding of the design
and modification of bio-interfaces.
— The design and integration of a prototype
magnetic sensor system.
— IP Protection of a platform technology with
“Working with CRANN has enabled Cellix multi-sector applications (Health, Food and
to undertake research to accelerate the
development of our next generation of
diagnostics platforms.” Vivienne Williams, CEO Cellix Ltd.
Prototype magnetic sensor
22 — INDUSTRY ENGAGEMENT 23 — INDUSTRY ENGAGEMENT
INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD
Fast Microbiological Growth Detection: CRANN researchers are developing a Roche discovers, develops and provides
In the bio-medical industry, there is a strong platform technology for the fast detection innovative diagnostic, therapeutic products
need to develop fast, low cost, microorganism of microbial systems for commercial and services that deliver significant
growth detection systems that will shorten exploitation in the food, medical, health and benefits to both patients and healthcare
the time and detection thresholds required pharmaceutical sectors. Prof Martin Hegner professionals. They engage with CRANN in
to identify potentially hazardous microbes or and a team of international colleagues are the area of RNA interference (RNAi) assay
contamination. developing micro-cantilever arrays which development using the microcantilever assay
vibrate and bend in response to mass loading platform. The technical challenge is focussed
forces. Forces are exerted when the arrays, on the development of a fast assay for RNAi
which are coated with membrane proteins, drug delivery and efficacy tests.
bind to viruses in fluids. By measuring
changes in the frequencies at which these CRITICAL CRANN ENABLERS
tiny sensors vibrate, researchers use them as — Team of internationally recognised
super-sensitive virus-weighing scales. researchers.
— System and method for rapid detection
and characterisation of bacterial colonies.
— Access to a microbiological biosafety
type II laboratory and instrumentation
(e.g. spectrometers, turbidity meter).
— Scanning electron microscopy (SEM),
scanning tunnelling microscopy (STM)
and atomic force microscopy (AFM).
— Cleanroom, micro fabrication, precision
drop techniques and 3D rapid prototyping.
CRANN researchers are developing a platform
technology for the fast detection of microbial
systems for commercial exploitation in the food,
medical, health and pharmaceutical sectors.
This page_Ink-jet spotter being worked at Crann.
Opposite_Rapid detection of microorganisms
24 — INDUSTRY ENGAGEMENT 25 — INDUSTRY ENGAGEMENT
INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD CRITICAL CRANN ENABLERS
Eblana Photonics is an Irish company, Eblana has adopted a fabless manufac- — Scanning electron microscopy (SEM).
founded in 2001, that designs and manufac- turing model and has strategic alliances — Energy Dispersive X-ray Spectroscopy
tures laser diodes emitting at near-infrared with partners of proven excellence allowing (EDS).
wavelengths for high speed optical commu- the company to focus on its key areas of — Dual beam Focussed ion beam (FIB).
nications, sensing, measurement and other expertise. To support its commitment to — Training of industry staff.
applications. quality products, Eblana leverages the device — Access to expensive instrumentation.
analysis capabilities available at CRANN.
Eblana has developed a proprietary method
for the manufacture of multi-quantum well CRANN possesses a world leading micros-
laser diodes using etched photonic inter- copy facility that has a unique combination of
faces at a sub-micron scale. Capabilities for advanced analysis techniques. CRANN staff
in-depth physical and elemental analysis of provided Eblana with training on how to use
these features as well as of the layer structure the required equipment to a high standard.
of the laser are key to ongoing product devel- Eblana engineers and scientists have thus
opment at Eblana. become self-sufficient users who can book
and use the required equipment as needed.
This arrangement has enabled speed of
response to the acquisition of device details,
while also ensuring confidentiality.
Eblana currently uses the facilities to
image and generate elemental composition
maps of very small structures in the laser
Above_Shows a packaged Laser Diode chip
“ Working with the AML Team we have been able to (smallest rectangular object in centre image).
Left & Opposite_Shows detail of the laser surface
develop advanced analysis techniques that support our with etched photonic structure.
product life cycle. Also using this facility we have the
ability to produce information promptly.”
Dr Brian Kelly, Director of Manufacturing at Eblana Photonics
26 — INDUSTRY ENGAGEMENT 27 — INDUSTRY ENGAGEMENT
INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD
M/A-COM Technology Solutions is a leading CRANN has world leading experts and temperatures. Numerical finite elements
supplier of semiconductor components and infrastructure in a diverse range of research models were developed for circulator
subassemblies for use in radio frequency (RF), areas including magnetics. The research structures with accuracy sufficient for
microwave and millimetre wave applications. group of Prof. Michael Coey is active in many commercial device design and optimisation,
RF circulators are an integral component fundamental areas of research in magnetism revealing two different dominating sources of
in wireless infrastructure base stations. To and magnetic materials. field in homogeneity in the final assemblies
facilitate M/A-Com in the development of next – local variations of the orientation, and
generation devices and insure commercial M/A-Com provided CRANN with device composition of the ceramic magnets and
success, the continual optimisation and components and material samples. CRANN small angular deviations between the top and
improvement of the circulator device in all performed the characterisation of both bottom cylindrical faces.
parameters is critical. soft and hard magnetic materials, utilised
in the circulators’ construction; conducted Work is ongoing with M/A-COM to further
theoretical modelling and numerical develop these techniques and new device
simulations; and experiments to verify the field designs and materials selection.
profiles produced by various magnetic circuits.
CRITICAL CRANN ENABLERS
Magnetisation profiles of circulator — Access to leading researchers in a 0
components in external magnetic fields of specialised area.
up to 5 Tesla, have been obtained against — Access to materials expertise, literature 15
temperatures permitting two dimensional and patent databases. -10
interpolation for arbitrary fields and — Use of a wide range of advanced toolsets
for magnetic materials characterisation.
— Computational analysis numerical models -20
and finite element analysis. -20
“ The expertise and test facilities at CRANN enabled M/A COM Cork
to use key scientific data to resolve a critical materials performance
issue with our vendor, allowing us to meet our manufacturing 0
requirements for a major OEM.” Rick O’Donovan, Prinicpal Engineer at M/A-COM
Magnetic field coil response from
a pulse magnetic stimulator (TMS stimulator).
28 — INDUSTRY ENGAGEMENT 29 — INDUSTRY ENGAGEMENT
INFRASTRUCTURE HELIUM ION MICROSCOPE (HeIM)
LOCATION: CRANN AML / CONTACT: MICROSCOPY@TCD.IE
With the proliferation of imaging and analytical BASIC DESCRIPTION
Surface topographical information is provided — Carl Zeiss Orion Plus with an ultra-bright
The Helium Ion Microscope provides high-
techniques it can often be confusing to determine resolution imaging of sample surfaces. It is by imaging with secondary electrons (SE), ion source.
— Probe sizes 0.75–0.8 nm & typical beam
the most appropriate analysis method. The CRANN the only such tool in Ireland and one of a The high SE yield produced by ions gives
images that are rich in contrast enabling currents 0.5–10 pA.
dozen units globally. CRANN is working with
infrastructure contains a family of techniques that covers Carl Zeiss, the tool vendor, to optimise and easy differentiation of materials. We are also — Imaging with secondary electrons and
backscattered helium ions.
the entire resolution range from transmission electron develop this unique instrument. able to image using backscattered helium
ions which provide strong material contrast. — Flood gun for charge neutralisation.
microscopy, electron energy loss spectroscopy to bulk The HeIM is similar to a Scanning Electron Backscattered ions can also be used to give — Rutherford Backscattered Spectroscopy.
analysis techniques with very low detection limits. Microscope (SEM) but it uses a probe of
helium ions rather than an electron probe.
channelling contrast which can provide crys-
This enables higher resolution images to be 01 / 02_ Helium Ion Microscope at the AML.
Many of these microscopy techniques not only support generated when compared to a SEM. An
advantage compared to a TEM is that the
HeIM is ideally suited to imaging samples
such as polymers, coatings, membranes,
03_ High Resolution imaging of gold on carbon
sample. Different grains and surface features are
analysis systems but also can be used for fabrication low beam current and scanning nature of the biological systems. clearly visible in the image.
purposes in the nanoscale range. A key component beam allows enhanced imaging of soft or
to supporting nanoscale fabrication in CRANN is a
modern cleanroom facility. All these processes are 01 02 03
managed by a dedicated team of trained staff with
many years of academic and industrial experience.
30 — INDUSTRY ENGAGEMENT 31 — INDUSTRY ENGAGEMENT
SCANNING ELECTRON MICROSCOPES (SEM) FOCUSED ION BEAM (FIB)
& ELECTRON BEAM LITHOGRAPHY (EBL)
LOCATION: CRANN AML / CONTACT: MICROSCOPY@TCD.IE LOCATION: CRANN AML / CONTACT: MICROSCOPY@TCD.IE
BASIC DESCRIPTION 01_ Ultra plus / scanning electron microscope. BASIC DESCRIPTION 01_ Focused Ion Beam at the AML.
Electron microscopes are indispensable SEM is a platform for many other techniques 02_ EBL pattern used to contact a carbon Focused Ion Beam (FIB) is a technique that two Dual Beam FIBs with different capabilities 02_ Silicon based devices thinned by FIB to
tools for today’s nanotechnology develop- one of which is Electron Beam Lithography nanotube bundle for electrical testing. uses ions to both image, analyse and modify and its staff has experience in handling a create a 100nm slices for analysis
ment and production. Scanning electron (EBL). Our staff can create leading edge samples. Combining a FIB and SEM into variety of samples.
microscopes (SEM) deliver high resolution patterns on substrates using a variety of EBL one machine (dual beam) enhances the
down to the nanometre range. They also processes. capabilities of a FIB enabling real-time micro- TECHNICAL SPECIFICATIONS
provide detailed surface information along machining. The Auriga FIB is the only system — Zeiss Auriga & FEI Strata 235 are
with elemental microanalysis and particle TECHNICAL SPECIFICATIONS in Europe and has the narrowest beam versatile dual-beam FIB systems.
characterisation. SEMs are widely used in — Field emission SEM’s have a superb width of any FIB instrument on the market. — Electron/Ion beam lithography,
many applications such as: critical dimen- resolution to the nm at 0.1kV, using the The dual beam FIB can be used for device (Raith Elphy Quantum).
sion measurements in the semiconductor high, using the high efficiency of the modification, cross-sectioning, localised — Transmission Electron Microscope
industry, high resolution imaging of metal- in-lens detectors. substrate modification, failure analysis, and in sample preparation with in situ sample
lography samples in the materials industry, — Energy and angle selective backscattered situ-transmission electron microscope sample manipulation capability.
investigating healthy and unhealthy tissue detector (EsB). preparation. FIB is a dry, resistless, processing — Energy Dispersive X-ray (EDX) elemental
samples in the life science sector. — X-ray material analysis and mapping. technique, ideal for rapid device proto-typing analysis system (Silicon Drift Detector)
— Lithography attachment for creating and feature modification, for industrial sectors — Imaging resolution of 2.4 nm (ion beam)
features and test structures on as diverse as integrated circuits, MEMS, & 1 nm (electron beam).
nanometre scale. medical devices and photonics. The ion beam — Sequential cross sectioning for three
gives good grain contrast and can be used for dimensional image construction.
01 02 techniques such as voltage contrast imaging — Reactive gas injection system for reactive 02
of electron devices. CRANN has a selection of ion etching and Pt/SiO2/W deposition.
32 — INDUSTRY ENGAGEMENT 33 — INDUSTRY ENGAGEMENT
TRANSMISSION ELECTRON & ATOMIC FORCE MICROSCOPE
SCANNING TRANSMISSION MICROSCOPY
LOCATION: CRANN AML / CONTACT: MICROSCOPY@TCD.IE LOCATION: CRANN LAB 2.19 / CONTACT: MICROSCOPY@TCD.IE
BASIC DESCRIPTION TECHNICAL SPECIFICATIONS 01_ Dr. Markus Boese, CRANN Technical BASIC DESCRIPTION 01_ Atomic Force Microscope.
The Transmission & Scanning Transmission — FEI TITAN is a field emission TEM with Specialist, working on the TITAN TEM in the AML. The Atomic Force Microscope (AFM) is The benefits of the AFM can be best realised 02_ Surface topography of a colon
Electron Microscopy (S/TEM) system at accelerating voltages of 80–300kV capable 02_ Stacking fault pattern in a 10nm diameter a scanning probe microscope, i.e. an when operated by CRANN’s highly skilled adenocarcinoma cell imaged by AFM.
CRANN is the most advanced tool of this of atomic resolution, unique in Ireland. germanium nanowire. extremely sharp tip at the end of a cantilever AFM specialists.
type in Ireland. This tool is ideally suited — Energy Filtering system for Electron which scans over the surface and by ‘feeling
for imaging, metrology, device testing and Energy Loss Spectroscopy which the surface’ records its topography. It TECHNICAL SPECIFICATIONS
material characterisation from the millimeter to identifies elements within the samples, can be used in liquid (biological samples, — Vertical resolution of less than 1 nm. 02
sub-nanometre level. Crystallographic analysis similar to EDX but with nm resolution. electro-chemistry) and the tip can be coated — Scanning range = 80 μm.
and ultra high resolution elemental mapping — An Energy Dispersive X-ray (EDX) with different materials in order to probe a — Nanolithography available.
is possible. TEM is a widely used technique in elemental analysis system. wide range of physical properties. AFM can — Heating fluid cell, temperature
the semi-conductor, data-storage industries — Alignments at 80 kV suited for the measure angstrom-scale surface roughness. up to 80°C.
and material related industries. For example, study of carbon based materials. It is an exceptionally versatile tool and can
it is used to measure the gate oxide thickness be used in multiple industries, for example
of a transistor or image the grain structure of determining manufacturing defects on
thin film coatings on a substrate. Manual and coated stents and other biomedical surfaces,
focused ion beam samples can be prepared correlating surface roughness to adhesion
in-house by the experienced specialists of the and measuring patterned shapes.
CRANN AML Team.
01 02 01
34 — INDUSTRY ENGAGEMENT 35 — INDUSTRY ENGAGEMENT
CRANN CLEANROOM FEMTOSECOND LASER SYSTEMS
LOCATION: CRANN / CONTACT: CRANN-CLEANROOM@TCD.IE LOCATION: CRANN PHOTONICS LAB / CONTACT: CRANN-PHOTONICS@TCD.IE
The CRANN cleanroom comprises approxi- Planarization: A Logitech CMP tool is used This facility is enabling world class research BASIC DESCRIPTION TECHNICAL SPECIFICATIONS
mately 100m2 of cleanroom space divided for planarisation. to be carried out. It is available to research The Femtosecond Laser System provides — Z-scan technique is a useful tool to — Femtosecond laser ablation and
up into class 100, class 1000 and class communities both internally and externally as an understanding of ultrafast photodynamic measure the non-linear index n2 and the deposition: When a high power pulsed
10,000 areas. Lithography: An OAI mask aligner is well as offering high value technical support processes in physics, chemistry and biology. non-linear absorption coefficient by using laser beam is focused on the target
suitable for dimension down to approx to our industrial partners. It supports many techniques, such as Z-scan the “open” (without aperture) and “closed” inside a vacuum chamber, tiny controlled
This multi-material facility can produce 1um. There is also an NIL module, as well techniques, spectroscopy and pulsed laser (with aperture) methods respectively. amounts of material can be vaporised and
devices on substrates up to 100mm in as front and backside alignment capability. Industrial customers can avail of trial runs ablation and deposition. — The pump-probe uses two laser pulses to ejected from the surface in the form of
diameter. The facility has processing A Heidelberg DWL system provides mask using new and innovative materials on the excite and measure the electronic structure a vapour. This vapour can be deposited
capabilities in the areas of silicon, compound making capability as well as direct writing toolset. Novel processing techniques and of materials via the relaxation of the excited in the form of a thin film on a reference
semiconductors, polymers and glass and capability down to approx 0.8um. sequences can also be developed without electron and vibration states in materials. sample. The process of removing material
can be used to develop prototypes for a taking up valuable tool time in an industrial — It is one of the most powerful tools for from the target surface is called laser
variety of industrial partners, for example Deposition: A Temescal evaporator provides environment. Using these resources, new investigating energy and charge transfer ablation. The process of depositing the
electronic, solar, medical etc. film deposition capability using either e-beam materials can be characterised and tested processes. It couples the electronic and ablated materials on a substrate to form a
or thermal evaporation. There is also an for suitability of purpose. vibrational degrees of freedom, vibrational thin film is called pulsed laser deposition.
The installed toolset provides process integrated RIE process to clean the surface and conformational relaxation and The process can take place under
capability as follows: prior to film deposition. An Edwards evapo- isomerisation. vacuum, or in the presence of a gas, such
rator is another ebeam evaporator which is Intel Researcher in Residence in as oxygen which is commonly used, for
Thermal processing: An ATV furnace mainly used for dielectric film deposition. CRANN’s class 100 cleanroom. example, when depositing thin oxide films.
provides a full range of atmospheric
processing such as annealing, wet and dry Measurement: A nanospec is available for 01
oxidation. A Heatpulse RTP system also transparent film thickness measurements
provides anneal and dry oxidation processes and a Dektak profilometer is available for 01_ Femtosecond Laser System at CRANN.
with a ramp rate up to 100 C/s. step height measurements.
Etch: An Oxford instruments ICP etcher
has been installed to provide silicon, oxide,
nitride and polymer etching. A Diener
Pico plasma system also provides surface
preparation capability. An Arias wet bench
provides BOE and hot phosphoric etching of
silicon dioxide and silicon nitride.