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Crann lab equipment available for industry - May 2010


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Crann lab equipment available for industry - May 2010

  1. 1. DELIVERING FOR INDUSTRY Innovating Nanoscience
  2. 2. CONTENTS Chairman’s Message 4 Directors’ Introduction 5 CRANN Overview 6 Industry Engagement 8 Case Studies 12 — Intel 14 — Hewlett-Packard 16 — Boston Scientific 18 — Cellix 20 — Roche 22 — Eblana Photonics 24 — M/A-Com 26 Infrastructure 28 — Helium Ion Microscope 29 — Scanning Electron Microscopes & Electron Beam Lithography 30 — Focused Ion Beam 31 — Transmission Electron & Scanning Transmission Microscopy 32 — Atomic Force Microscope 33 — CRANN Cleanroom 34 — Femtosecond Laser Systems 35 — Atomic Force Microscopy (AFM), Raman Microscope & Scanning Near Field Optical Microscopy (SNOM) System 36 — Class II Biohazard Facility 37 Contact 38 1 micron diameter sphere in a polystyrene mould, captured by Ronan Daly using the Zeiss Ultra SEM
  3. 3. 4 — INDUSTRY ENGAGEMENT 5 — INDUSTRY ENGAGEMENT CHAIRMAN’S DIRECTORS’ MESSAGE INTRODUCTION Over the last ten years there has been A driver of this change in our relationship I would encourage all in industry to actively The Centre for Research on Adaptive CRANN is central to all the primary infrastructure within these facilities. In addition significant investment in developing both with research is the role of universities as consider the benefits from engaging in Nanostructures and Nanodevices nanoscience initiatives in Ireland. CRANN is we have a professional industry interface team the physical and human infrastructure educators, innovators and most importantly collaborative research with organisations (CRANN) is recognised internationally a Science Foundation Ireland (SFI) Centre for dealing with all issues necessary for effective necessary to enable Ireland to compete industry collaborators. CRANN now partners such as CRANN and I hope this booklet as a leading institute for nanoscience Science Engineering and Technology (CSET), collaborative research programmes such as globally in terms of research, development with 30 companies around Europe providing provides clarity on the benefits, the engage- research. CRANN is comprised of a the lead institution in the Higher Education the development and protection of intellectual and innovation (RD&I). In that time Ireland research and infrastructure expertise. In ment mechanisms and the openness of team of over 250 researchers, led by 17 Authority supported INSPIRE consortium property, finance, secondment of industry has made significant steps forward from Ireland, multi-national companies such as CRANN to work with your company. Principal Investigators (PIs). CRANN ( and a co-host (with the researchers and project management. a research and industrial perspective. Intel, Hewlett-Packard and Boston Scientific PIs are based across many disciplines Tyndall National Institute) of the Enterprise Trinity College Dublin is now ranked in benefit from harnessing the powerful including the Schools of Physics, Ireland / IDA established Competence Centre CRANN carries out collaborative research the top 50 universities in the world and combination of leading scientific thinking, Chemistry, Medicine, Engineering and for Applied Nanotechnology (CCAN). programmes with 30 companies both in Ireland is ranked for the first time in the coupled with excellent infrastructure. In Pharmacy at Trinity College Dublin and Ireland and internationally. CRANN has top 20 countries globally for the quality addition, many indigenous businesses such University College Cork. CRANN brings together many exceptional active research relations with more than of its research. In parallel, industry in as Creganna, Aerogen, Cellix and others strengths making the institute a suitable 150 research institutions in numerous Ireland is now focussed more on research. utilise the capabilities at CRANN as a tool CRANN works across the research partner for industry collaboration. CRANN countries around the world and is the primary The Industrial Development Agency to make their businesses more competitive Sean Dorgan spectrum from the development of new has two stand-alone research facilities, driver in Ireland’s global ranking of sixth in (IDA) reported that in 2009 the number of and to accelerate research programmes and Chair, CRANN Institute Board nanomaterials with improved mechanical, the Naughton Institute and the CRANN terms of both the quality of its publications investments in RD&I equated to 49% of product development. magnetic, electrical or optical properties Advanced Microscopy Laboratory (AML), and the volume output per capita. all investments secured during the year, and their subsequent application in both of which provide unique infrastructure with the total being in excess of #500m. electronic or medical devices, sensors, capabilities coupled with specialist expertise. This booklet is designed to provide a window Enterprise Ireland (EI) reported that the or new drug delivery systems. CRANN is Importantly CRANN has a dedicated team of to industry on the variety of research engage- indigenous companies who had invested committed to engaging in collaborative technical specialists with extensive industry ments which are possible in partnership with in research are now performing stronger in research programmes with industry. and research experience who support the CRANN, to describe how these engagements these tougher economic climates. are initiated and enabled and most importantly to demonstrate the clear value return to industry from partnering with CRANN. Dr. Diarmuid O’Brien Executive Director, CRANN Prof. John Boland Director, CRANN
  4. 4. 6 — INDUSTRY ENGAGEMENT 7 — INDUSTRY ENGAGEMENT CRANN OVERVIEW GOVERNANCE & BENCHMARKING: The CRANN institute has been CRANN has developed an organisational CRANN has the capacity to provide industry RESEARCH established to bring together a critical structure to ensure we deliver on both of with a single managed point of contact SCHOOL OF PHYSICS, TCD mass of exceptional researchers our goals. The CRANN Institute Board is to ensure the process of engagement is based across a diversity of Schools comprised of leading figures from industry efficient and straightforward. Our industry SCHOOL OF CHEMISTRY, TCD and Departments within Trinity College and key stakeholders from our university engagement experts will offer clear advice Dublin and University College Cork. partners. Our Board ensures best operational to companies on the most effective model of SCIENTIFIC ADVISORY BOARD DEPARTMENT OF CHEMISTRY, UCC practice and a maintained focus on the dual engagement and map out a pathway which CRANN has two primary complementary nature of our mission. In addition, we have a will provide the best return on investment. PRINCIPAL INVESTIGATORS SCHOOL OF MEDICINE, TCD goals: the development of an international Scientific Advisory Board (SAB) comprised CRANN has personnel who will work with reputation for research excellence as of globally leading nanoscience researchers. industry in managing all issues associated DEPUTY DIRECTOR POSTDOCTORAL RESEARCHERS SCHOOL OF PHARMACY & PHARMACEUTICAL SCIENCES, TCD determined by publications in the highest The SAB acts as a benchmark to ensure with research engagement from a quick rated international peer review journals and CRANN research remains competitive at the response to a specific query, to identifying DIRECTOR RESEARCH FELLOWS BIOSCIENCES/BIOENGINEERING, TCD the development of collaborative research highest international standards. the best characterisation and measurement relations with industry which harness the techniques for your samples or materials, the scientific excellence of our researchers and All CRANN PIs are based within a University preparation of research programme budgets the unique infrastructure and facilities which School and are active in both teaching and and funding proposals, data handling and INSTITUTE BOARD are available within CRANN. research. CRANN has 250 researchers active confidentiality agreements, the implementa- within the institute. These researchers have tion of intellectual property agreements or been attracted to CRANN from all over the the rapid characterisation or failure analysis world with over forty different nationalities of materials or devices. In all cases CRANN EXECUTIVE DIRECTOR INDUSTRY RELATIONS represented. CRANN provides a vibrant and is committed to harnessing the significant exciting environment for researchers to build resources at our disposal to ensure industry COMMERCIALISATION & LICENSING their research careers but also to engage receives the best possible experience from with industry. its engagement with CRANN. INTELLECTUAL PROPERTY MANAGEMENT Coupled with this environment, which CRANN is recognised as the premier institute CENTRAL EQUIPMENT FACILITIES encourages and enables the best academic in Ireland which bridges the divide from research, CRANN has established an effec- leading edge research to focussed solution COOPERATION tive and professional operational interface. orientated collaborative industry research. CRANN has in place leading technical COMMUNICATIONS specialists with many years experience in both industry and research having worked for FINANCE companies like Intel, Hewlett-Packard, Xilinx, Boston-Scientific, Carl-Zeiss, IBM, Siemens, FACILITY MANAGEMENT Infineon and many others. In addition CRANN has exceptional back-office support for EDUCATION & OUTREACH research engagements. OPERATIONAL I.T. SUPPORT
  5. 5. 8 — INDUSTRY ENGAGEMENT 9 — INDUSTRY ENGAGEMENT INDUSTRY ENGAGEMENT 10 REASONS TO PARTNER WITH CRANN CRANN actively engages with all industry types, from small-to-medium enterprises (SMEs) to multinationals in diverse CRANN’s diverse research base, our international reputation and the institute’s world class infrastructure are seen as key CRANN’s commercialisation specialists can identify new opportunities and foster business relationships through varied funding 01 02 03 Provides a competitive Adopts a scalable fixed Provides a scalable human resource model, sectors. We operate a comprehensive enablers, providing an extremely flexible, programmes and agencies, offering and configurable resource that is externally advantage by imaging, asset model for cost giving access to highly trained scientists and engagement model, scalable to your identifying the most appropriate route for organisation’s needs, by identifying each managed to meet each company’s needs. your company. CRANN can drive the full measuring, characterising centres – access to high- engineers using state-of-the-art equipment with company’s key challenges, translating Key elements in-place to enable this engagement process from application to materials and devices end analytical equipment expert post-measurement analysis. these requirements into a work approach are strong institute governance, project submission through to implementation using state-of-the-art without the depreciation programme, identifying and applying for an IP management strategy, the timely and final commercialisation in partnership with analytical facilities that are charge. the appropriate funding and assigning financial and administrative management the company and state agencies. unique nationally. CRANN resources to deliver the solution. of all programmes and the availability of Engagements can be fully collaborative dedicated CRANN staff to manage the As a company your engagement path with or contract research, ranging from industry engagement under direct company CRANN can indeed be varied. It could 04 05 06 07 multi-disciplinary teams based across oversight. be as an industry partner collaborating to both partner sites to a single CRANN drive your research agenda in a European researcher. Programmes can utilise the funded consortium or as a member of full gambit of CRANN capabilities, access the Competence Centre for Applied Offers dedicated EU Proven experience Provides a platform Provides fast turnaround specific infrastructure assets or simply Nanotechnology. You could access CRANN’s funding specialists and working with 30 for researching by using a facility that use one piece of equipment to perform instrumentation under an innovation voucher a platform for EU project industry partners. new commercial is based in Dublin city a single measurement. In every case the or a direct funding model to solve your development. applications for centre and is committed to solution provided is custom designed to immediate production problems, or perhaps your intellectual partnering and servicing address the problem. even develop new processes or products property. industry. under the Enterprise Ireland innovation partnership scheme. Whatever your mode of engagement, CRANN will commit to offering you the best solution to address your business needs. 08 09 10 Provides flexible solutions Allows you to concentrate on core activities Provides access to from training, to material and outsource tasks that tie up capital facilities and people within analysis, to collaborative and labour. Trinity College Dublin, research programmes. Ireland’s highest ranked university.
  6. 6. 10 — INDUSTRY ENGAGEMENT 11 — INDUSTRY ENGAGEMENT DIFFERENT WAYS WE ENGAGE PROVIDING CONFIGURABLE SOLUTIONS WITH INDUSTRY AND IDENTIFYING NEW OPPORTUNITIES UC TS LIFE ROD SCI IA LP EN CE TR S Enterprise Ireland Science Direct Industry European Union IDA Higher Education D US INDUSTR Foundation Ireland Support Authority IN ND RELA IAL D ON I EVE ATI LOP ND ME OU NT C EF A GE Competence PI Fundamental Contract Framework Securing FDI Delivery of I EN NC SC Centres Research Research Programme 7 Infrastructure Access Y IES Opportunities for Direct access to LOG collaborative & contract world class infrastructure, O CHN research programmes. technical specialists & Innovation CSET Industry Rapid Materials Partnering with Promoting Irish Enabling MED DIR research teams. N TE Partnerships Facing Research Analysis Leading Institutes Research Excellence Fundamental Research D ECT ICAL LAN Base CATIO INDU E IRE TEC TION & COMMUNI Innovation Industry Local Manufacturing Leveraging Showcasing the Foundations for delivery ST HNOLOGIES ENTERPRIS Partnership in fundamental Leadership in national RY FUNDING Vouchers Supplements Support EU Funding ‘Best in Class‘ of core research research programmes with research networks, Technologies programmes the option of embedding centres of excellence researchers in residence. CRANN & competence centres. Technology Technology and Consultancy Networking International INFORMA Developments Innovation Development Opportunities Company Engagements Awards (TIDA) Sourcing funding Support for manufacturing, opportunities, proposal rapid materials analysis, submissions, financial & product development & Proof of Concept Specialist Competence project management. consultancy Awards Training Centre ARD BO EU RO CH PE Participation in European AR Business PH AN SE & national funded industry Commercialisation AR RE UN ON focussed collaborations. Y T MA I H AL RG HE CE E EN UT IC LS A ENV CY IRON MENTAL PROTECTION AGEN CLEAN TECHNOLOGIES CRANN has a successful track record in developing industry linkages under state funded TARGET SECTORS support mechanisms and through individual company funded engagements. We actively FUNDING SUPPORT MECHANISMS partner with the Irish state agencies and the European Union in promoting and managing MODES OF ENGAGEMENT knowledge generation initiatives with direct industry impact. CRANN works closely with the agencies to identify and implement the best opportunity and engagement mechanism to CRANN support, fund and administer the research for each company.
  7. 7. 12 — INDUSTRY ENGAGEMENT 13 — INDUSTRY ENGAGEMENT CASE STUDIES CRANN partners with a wide range of clients across diverse industrial sectors, both nationally and internationally. Engagement modes vary and are tailored to meet the company’s technical requirements, administered by CRANN and leveraged on established funding support mechanisms. These case studies illustrate typical industry interactions ranging from short targeted projects, addressing an immediate production or product issue, to larger research programmes that integrate into the company’s own product development roadmap. Intel Researcher in Residence working on SEM in the AML
  8. 8. 14 — INDUSTRY ENGAGEMENT 15 — INDUSTRY ENGAGEMENT INTEL INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD The semiconductor roadmap, driven by CRANN has world leading experts and Advanced e-beam capability is enabling Moore’s Law, requires the density of semicon- infrastructure in a diverse range of research the contacting of these nanometre devices, ductor devices to double every 18 months. areas, which when combined, has enabled which are being electrically tested to confirm This drum beat of miniaturisation presents significant breakthroughs in understanding performance and reliability. many challenges for transistors to halve in size and providing potential solutions to this through each new generation of technology. challenge. This capability to use novel materials to pattern, create and contact nanometre A key challenge associated with the semi- CRANN’s material expertise enabled the scale devices is internationally leading and conductor roadmap is the requirement to utilisation of block copolymers to create harnesses the unique infrastructure and develop new techniques for patterning the scalable thin film templates at the required capability at CRANN. 300 mm silicon wafer controllably down to sub 20nm dimensions. The development of sub 20 nm dimensions. these materials required expertise in the pre CRITICAL CRANN ENABLERS and post processing of these materials via — Nanomaterial processing and characterisation. spin-coating techniques, thermal annealing — Cleanroom facilities which enable and environmental control. controlled thin film lithography, etching and processing. Using state-of the art cleanroom facilities and — E-beam lithography to contact sub 20nm processes, the block-copolymer thin films devices and features. were then preferentially etched to enable the — Scanning electron microscopy (SEM), creation of a nanometre dimension mask on scanning tunnelling microscopy (STM) and silicon which was subsequently transferred transmission electron microscopy (TEM) to directly to the silicon substrate. The silicon image, contact and characterise nanowires nanowires were characterised using scanning and devices at the sub 20 nm dimension. and transmission electron microscopy. — Electrical contacting and testing of nanoscale devices. “ The Advanced Microscopy Laboratory will greatly enhance CRANN’s ability to perform leading edge work in pursuing further miniaturisation of electronic components, deep into the nanotechnology era.” SEM image of an etched block-copolymer on a silicon substrate and the transfer of the pattern to the silicon Leonard Hobbs, Head of Research at Intel Ireland substrate – creating wires of a sub 20nm dimension.
  9. 9. 16 — INDUSTRY ENGAGEMENT 17 — INDUSTRY ENGAGEMENT HEWLETT-PACKARD INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD HP is looking to develop a low-cost flexible, CRANN has internationally leading expertise The CRANN-HP partnership has led to transparent, thin-film electrode. This is a in the synthesis, functionalisation and charac- significant programme funding from HP critical component in the development of new terisation of nanomaterials and the processing in the US and SFI, which will lead to the electronic flexible displays that can be used of these nanomaterials to fabricate devices. commercialisation of cutting edge products. for laptops, e-books and other electronic To respond to the HP challenge, through SFI The collaboration has already produced devices which are ultra thin, flexible, light- funding, CRANN brought together a team outstanding results leading to both research weight and have low power consumption. of twenty researchers in partnership with publications and the filing of intellectual four HP researchers. This team combined a property at both CRANN and HP. The diverse range of expertise from nanomaterial CRANN-HP team is now the international synthesis and characterisation, thin film lead in terms of the thin film electrodes it can processing and characterisation, mechanical, produce. These electrodes have been used optical and electric testing and the integration to manufacture prototype displays from a of the electrode into prototype devices. range of different technologies across the HP organisation. The programme integrates the research activity at CRANN and HP Ireland with HP’s This research will transfer to HP over technology roadmap to develop flexible the course of this programme to enable transparent displays utilising low cost new products, process improvements manufacturing. This strategy has enabled HP and commercially relevant technological Ireland to partner with, and directly harness, advancements. This programme will continue the ongoing research capability at CRANN to ensure high quality sustained research and to develop its mandate as a leading activity in Ireland, a key factor in enabling HP solution provider within HP globally. activities both locally and globally. CRITICAL CRANN ENABLERS — Nanomaterial synthesis, processing and “ This partnership with CRANN provides a characterisation. — Mechanical, optical and electrical testing platform to grow research activity within of thin films. — Scanning electron microscopy (SEM), HP Ireland.” scanning tunnelling microscopy (STM) and atomic force microscopy (AFM) Pat Harnett, R & D Manager, HP Ireland to provide insight into nanotube and nanowire interactions. — Spray, filter and spin-coating deposition SEM image of a forest of carbon nanotubes grown of thin films from solutions. and characterised at CRANN.
  10. 10. 18 — INDUSTRY ENGAGEMENT 19 — INDUSTRY ENGAGEMENT BOSTON SCIENTIFIC INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD CRITICAL CRANN ENABLERS Precise understanding and control of novel CRANN used their expertise to characterise — Clustering of FIB tools for device coronary stent coating properties, such the biodegradable polymer coatings on sectioning with high resolution as thickness, chemical composition, and Boston Scientific stents using novel imaging Scanning Electron Microscopy adhesion, is essential for device prototyping, and Focused Ion Beam [FIB] cross sectioning (SEMs) for imaging and analytics. product development and formal FDA techniques. Previously, Boston Scientific used — Extensive experience in control, submissions. overseas research institutes, such as the modification, characterisation and testing Fraunhofer Institute in Germany, to perform of a wide variety of polymer based and Boston Scientific recently announced a €90 this type of investigation. composite materials. million strategic investment, enabling their — World leading experience in scanning Galway plant to become involved at an earlier The project resulted in a detailed analysis probe microscopy, such as the Atomic stage of the research, development and of the polymer coating dimensions and Force Microscope [AFM], and nano- innovation process. Boston Scientific/Labcoat established defined methods of repeating indentation within the Principal has developed a novel technology in Ireland, highly accurate measurements on curved Investigator base. for dispensing and controlling biodegradable surfaces using methods not available inter- — Dedicated human capital and industrial polymer and drug coatings on drug-eluting nally to the customer. experience in tool sets such as the FIB. coronary stents. This innovation is an exciting development, in a market recently valued at The initial project has now been broadened $1.8 billion annually in the U.S. alone. in scope and duration to include the charac- terisation of the propriety technology using other techniques, such as nano-indentation. “ Boston Scientific Galway has advanced the next generation of cardiovascular technology by leveraging the scientific know-how and research infrastructure of CRANN.” Dr. Fergal Horgan, R&D Engineer at Boston Scientific Mixture of bare metal stents and polymer coated stents cross sectioned using a focussed ion beam for layer thickness measurements.
  11. 11. 20 — INDUSTRY ENGAGEMENT 21 — INDUSTRY ENGAGEMENT CELLIX INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD Cellix develops and commercialises Nanotechnology plays a prominent role in the This approach aims to deliver a custom instrumentation in the area of microfluidics for development of new materials and methods designed library of antibodies, each cell-based assays. The development of novel for the early diagnosis and treatment of recognising and tagging a required molecule early diagnostics platforms, using microfluidic inflammatory conditions, infectious diseases with a specific barcode signature. Analysis technology for reliable, high-sensitivity and cancer. Researchers in CRANN used can be performed in real time with single screening and detection of small amounts of magnetic barcode systems for enhanced moiety sensitivity which means a very informative biomarker molecules of human molecular detection. This technology is high throughput, cost effective, targeted diseases, has strong commercial benefits. a novel recognition system for identifying diagnostic assay system. biomolecules in a liquid environment (e.g. blood or serum samples). This work has CRITICAL CRANN ENABLERS resulted in the development of patentable — Multi-disciplined approach to problem technologies. solving. — Access to Type II biological laboratory, CRANN adopted a multi-disciplinary cleanroom and materials deposition and approach with several parallel research processing toolsets. trends working in close coordination: — Nanoparticle synthesis and segmented nanowire production, the generation of magnetic nanowires development. a prototype microfluidics system, the — Biocompatibility and toxicology analysis. functionalisation of magnetic nano-particles — Size selective labelling – nanoparticles with antibodies and the design of prototype ingested by cells. magnetic sensor arrays for incorporating into — Advanced high content screening analysis. the microfluidics device. — Fundamental understanding of the design and modification of bio-interfaces. — The design and integration of a prototype magnetic sensor system. — IP Protection of a platform technology with “Working with CRANN has enabled Cellix multi-sector applications (Health, Food and Security). to undertake research to accelerate the development of our next generation of diagnostics platforms.” Vivienne Williams, CEO Cellix Ltd. Prototype magnetic sensor
  12. 12. 22 — INDUSTRY ENGAGEMENT 23 — INDUSTRY ENGAGEMENT ROCHE INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD Fast Microbiological Growth Detection: CRANN researchers are developing a Roche discovers, develops and provides In the bio-medical industry, there is a strong platform technology for the fast detection innovative diagnostic, therapeutic products need to develop fast, low cost, microorganism of microbial systems for commercial and services that deliver significant growth detection systems that will shorten exploitation in the food, medical, health and benefits to both patients and healthcare the time and detection thresholds required pharmaceutical sectors. Prof Martin Hegner professionals. They engage with CRANN in to identify potentially hazardous microbes or and a team of international colleagues are the area of RNA interference (RNAi) assay contamination. developing micro-cantilever arrays which development using the microcantilever assay vibrate and bend in response to mass loading platform. The technical challenge is focussed forces. Forces are exerted when the arrays, on the development of a fast assay for RNAi which are coated with membrane proteins, drug delivery and efficacy tests. bind to viruses in fluids. By measuring changes in the frequencies at which these CRITICAL CRANN ENABLERS tiny sensors vibrate, researchers use them as — Team of internationally recognised super-sensitive virus-weighing scales. researchers. — System and method for rapid detection and characterisation of bacterial colonies. — Access to a microbiological biosafety type II laboratory and instrumentation (e.g. spectrometers, turbidity meter). — Scanning electron microscopy (SEM), scanning tunnelling microscopy (STM) and atomic force microscopy (AFM). — Cleanroom, micro fabrication, precision drop techniques and 3D rapid prototyping. CRANN researchers are developing a platform technology for the fast detection of microbial systems for commercial exploitation in the food, medical, health and pharmaceutical sectors. This page_Ink-jet spotter being worked at Crann. Opposite_Rapid detection of microorganisms
  13. 13. 24 — INDUSTRY ENGAGEMENT 25 — INDUSTRY ENGAGEMENT EBLANA PHOTONICS INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD CRITICAL CRANN ENABLERS Eblana Photonics is an Irish company, Eblana has adopted a fabless manufac- — Scanning electron microscopy (SEM). founded in 2001, that designs and manufac- turing model and has strategic alliances — Energy Dispersive X-ray Spectroscopy tures laser diodes emitting at near-infrared with partners of proven excellence allowing (EDS). wavelengths for high speed optical commu- the company to focus on its key areas of — Dual beam Focussed ion beam (FIB). nications, sensing, measurement and other expertise. To support its commitment to — Training of industry staff. applications. quality products, Eblana leverages the device — Access to expensive instrumentation. analysis capabilities available at CRANN. Eblana has developed a proprietary method for the manufacture of multi-quantum well CRANN possesses a world leading micros- laser diodes using etched photonic inter- copy facility that has a unique combination of faces at a sub-micron scale. Capabilities for advanced analysis techniques. CRANN staff in-depth physical and elemental analysis of provided Eblana with training on how to use these features as well as of the layer structure the required equipment to a high standard. of the laser are key to ongoing product devel- Eblana engineers and scientists have thus opment at Eblana. become self-sufficient users who can book and use the required equipment as needed. This arrangement has enabled speed of response to the acquisition of device details, while also ensuring confidentiality. Eblana currently uses the facilities to image and generate elemental composition maps of very small structures in the laser emitting diode. Above_Shows a packaged Laser Diode chip “ Working with the AML Team we have been able to (smallest rectangular object in centre image). Left & Opposite_Shows detail of the laser surface develop advanced analysis techniques that support our with etched photonic structure. product life cycle. Also using this facility we have the ability to produce information promptly.” Dr Brian Kelly, Director of Manufacturing at Eblana Photonics
  14. 14. 26 — INDUSTRY ENGAGEMENT 27 — INDUSTRY ENGAGEMENT M/A-COM INDUSTRY PROBLEM STATEMENT CRANN VALUE ADD M/A-COM Technology Solutions is a leading CRANN has world leading experts and temperatures. Numerical finite elements supplier of semiconductor components and infrastructure in a diverse range of research models were developed for circulator subassemblies for use in radio frequency (RF), areas including magnetics. The research structures with accuracy sufficient for 120 microwave and millimetre wave applications. group of Prof. Michael Coey is active in many commercial device design and optimisation, RF circulators are an integral component fundamental areas of research in magnetism revealing two different dominating sources of in wireless infrastructure base stations. To and magnetic materials. field in homogeneity in the final assemblies facilitate M/A-Com in the development of next – local variations of the orientation, and generation devices and insure commercial M/A-Com provided CRANN with device composition of the ceramic magnets and 85 success, the continual optimisation and components and material samples. CRANN small angular deviations between the top and improvement of the circulator device in all performed the characterisation of both bottom cylindrical faces. parameters is critical. soft and hard magnetic materials, utilised in the circulators’ construction; conducted Work is ongoing with M/A-COM to further theoretical modelling and numerical develop these techniques and new device 50 simulations; and experiments to verify the field designs and materials selection. profiles produced by various magnetic circuits. CRITICAL CRANN ENABLERS Magnetisation profiles of circulator — Access to leading researchers in a 0 components in external magnetic fields of specialised area. up to 5 Tesla, have been obtained against — Access to materials expertise, literature 15 temperatures permitting two dimensional and patent databases. -10 interpolation for arbitrary fields and — Use of a wide range of advanced toolsets for magnetic materials characterisation. — Computational analysis numerical models -20 and finite element analysis. -20 -20 “ The expertise and test facilities at CRANN enabled M/A COM Cork -10 to use key scientific data to resolve a critical materials performance issue with our vendor, allowing us to meet our manufacturing 0 requirements for a major OEM.” Rick O’Donovan, Prinicpal Engineer at M/A-COM 10 Magnetic field coil response from a pulse magnetic stimulator (TMS stimulator). 20
  15. 15. 28 — INDUSTRY ENGAGEMENT 29 — INDUSTRY ENGAGEMENT INFRASTRUCTURE HELIUM ION MICROSCOPE (HeIM) LOCATION: CRANN AML / CONTACT: MICROSCOPY@TCD.IE TECHNICAL SPECIFICATIONS With the proliferation of imaging and analytical BASIC DESCRIPTION Surface topographical information is provided — Carl Zeiss Orion Plus with an ultra-bright The Helium Ion Microscope provides high- techniques it can often be confusing to determine resolution imaging of sample surfaces. It is by imaging with secondary electrons (SE), ion source. — Probe sizes 0.75–0.8 nm & typical beam the most appropriate analysis method. The CRANN the only such tool in Ireland and one of a The high SE yield produced by ions gives images that are rich in contrast enabling currents 0.5–10 pA. dozen units globally. CRANN is working with infrastructure contains a family of techniques that covers Carl Zeiss, the tool vendor, to optimise and easy differentiation of materials. We are also — Imaging with secondary electrons and backscattered helium ions. the entire resolution range from transmission electron develop this unique instrument. able to image using backscattered helium ions which provide strong material contrast. — Flood gun for charge neutralisation. microscopy, electron energy loss spectroscopy to bulk The HeIM is similar to a Scanning Electron Backscattered ions can also be used to give — Rutherford Backscattered Spectroscopy. analysis techniques with very low detection limits. Microscope (SEM) but it uses a probe of helium ions rather than an electron probe. channelling contrast which can provide crys- tallographic information. This enables higher resolution images to be 01 / 02_ Helium Ion Microscope at the AML. Many of these microscopy techniques not only support generated when compared to a SEM. An advantage compared to a TEM is that the HeIM is ideally suited to imaging samples such as polymers, coatings, membranes, 03_ High Resolution imaging of gold on carbon sample. Different grains and surface features are analysis systems but also can be used for fabrication low beam current and scanning nature of the biological systems. clearly visible in the image. purposes in the nanoscale range. A key component beam allows enhanced imaging of soft or biological materials. to supporting nanoscale fabrication in CRANN is a modern cleanroom facility. All these processes are 01 02 03 managed by a dedicated team of trained staff with many years of academic and industrial experience.
  16. 16. 30 — INDUSTRY ENGAGEMENT 31 — INDUSTRY ENGAGEMENT SCANNING ELECTRON MICROSCOPES (SEM) FOCUSED ION BEAM (FIB) & ELECTRON BEAM LITHOGRAPHY (EBL) LOCATION: CRANN AML / CONTACT: MICROSCOPY@TCD.IE LOCATION: CRANN AML / CONTACT: MICROSCOPY@TCD.IE BASIC DESCRIPTION 01_ Ultra plus / scanning electron microscope. BASIC DESCRIPTION 01_ Focused Ion Beam at the AML. Electron microscopes are indispensable SEM is a platform for many other techniques 02_ EBL pattern used to contact a carbon Focused Ion Beam (FIB) is a technique that two Dual Beam FIBs with different capabilities 02_ Silicon based devices thinned by FIB to tools for today’s nanotechnology develop- one of which is Electron Beam Lithography nanotube bundle for electrical testing. uses ions to both image, analyse and modify and its staff has experience in handling a create a 100nm slices for analysis ment and production. Scanning electron (EBL). Our staff can create leading edge samples. Combining a FIB and SEM into variety of samples. microscopes (SEM) deliver high resolution patterns on substrates using a variety of EBL one machine (dual beam) enhances the down to the nanometre range. They also processes. capabilities of a FIB enabling real-time micro- TECHNICAL SPECIFICATIONS provide detailed surface information along machining. The Auriga FIB is the only system — Zeiss Auriga & FEI Strata 235 are with elemental microanalysis and particle TECHNICAL SPECIFICATIONS in Europe and has the narrowest beam versatile dual-beam FIB systems. characterisation. SEMs are widely used in — Field emission SEM’s have a superb width of any FIB instrument on the market. — Electron/Ion beam lithography, many applications such as: critical dimen- resolution to the nm at 0.1kV, using the The dual beam FIB can be used for device (Raith Elphy Quantum). sion measurements in the semiconductor high, using the high efficiency of the modification, cross-sectioning, localised — Transmission Electron Microscope industry, high resolution imaging of metal- in-lens detectors. substrate modification, failure analysis, and in sample preparation with in situ sample lography samples in the materials industry, — Energy and angle selective backscattered situ-transmission electron microscope sample manipulation capability. investigating healthy and unhealthy tissue detector (EsB). preparation. FIB is a dry, resistless, processing — Energy Dispersive X-ray (EDX) elemental samples in the life science sector. — X-ray material analysis and mapping. technique, ideal for rapid device proto-typing analysis system (Silicon Drift Detector) — Lithography attachment for creating and feature modification, for industrial sectors — Imaging resolution of 2.4 nm (ion beam) features and test structures on as diverse as integrated circuits, MEMS, & 1 nm (electron beam). nanometre scale. medical devices and photonics. The ion beam — Sequential cross sectioning for three gives good grain contrast and can be used for dimensional image construction. 01 02 techniques such as voltage contrast imaging — Reactive gas injection system for reactive 02 of electron devices. CRANN has a selection of ion etching and Pt/SiO2/W deposition. 01
  17. 17. 32 — INDUSTRY ENGAGEMENT 33 — INDUSTRY ENGAGEMENT TRANSMISSION ELECTRON & ATOMIC FORCE MICROSCOPE SCANNING TRANSMISSION MICROSCOPY LOCATION: CRANN AML / CONTACT: MICROSCOPY@TCD.IE LOCATION: CRANN LAB 2.19 / CONTACT: MICROSCOPY@TCD.IE BASIC DESCRIPTION TECHNICAL SPECIFICATIONS 01_ Dr. Markus Boese, CRANN Technical BASIC DESCRIPTION 01_ Atomic Force Microscope. The Transmission & Scanning Transmission — FEI TITAN is a field emission TEM with Specialist, working on the TITAN TEM in the AML. The Atomic Force Microscope (AFM) is The benefits of the AFM can be best realised 02_ Surface topography of a colon Electron Microscopy (S/TEM) system at accelerating voltages of 80–300kV capable 02_ Stacking fault pattern in a 10nm diameter a scanning probe microscope, i.e. an when operated by CRANN’s highly skilled adenocarcinoma cell imaged by AFM. CRANN is the most advanced tool of this of atomic resolution, unique in Ireland. germanium nanowire. extremely sharp tip at the end of a cantilever AFM specialists. type in Ireland. This tool is ideally suited — Energy Filtering system for Electron which scans over the surface and by ‘feeling for imaging, metrology, device testing and Energy Loss Spectroscopy which the surface’ records its topography. It TECHNICAL SPECIFICATIONS material characterisation from the millimeter to identifies elements within the samples, can be used in liquid (biological samples, — Vertical resolution of less than 1 nm. 02 sub-nanometre level. Crystallographic analysis similar to EDX but with nm resolution. electro-chemistry) and the tip can be coated — Scanning range = 80 μm. and ultra high resolution elemental mapping — An Energy Dispersive X-ray (EDX) with different materials in order to probe a — Nanolithography available. is possible. TEM is a widely used technique in elemental analysis system. wide range of physical properties. AFM can — Heating fluid cell, temperature the semi-conductor, data-storage industries — Alignments at 80 kV suited for the measure angstrom-scale surface roughness. up to 80°C. and material related industries. For example, study of carbon based materials. It is an exceptionally versatile tool and can it is used to measure the gate oxide thickness be used in multiple industries, for example of a transistor or image the grain structure of determining manufacturing defects on thin film coatings on a substrate. Manual and coated stents and other biomedical surfaces, focused ion beam samples can be prepared correlating surface roughness to adhesion in-house by the experienced specialists of the and measuring patterned shapes. CRANN AML Team. 01 02 01
  18. 18. 34 — INDUSTRY ENGAGEMENT 35 — INDUSTRY ENGAGEMENT CRANN CLEANROOM FEMTOSECOND LASER SYSTEMS LOCATION: CRANN / CONTACT: CRANN-CLEANROOM@TCD.IE LOCATION: CRANN PHOTONICS LAB / CONTACT: CRANN-PHOTONICS@TCD.IE The CRANN cleanroom comprises approxi- Planarization: A Logitech CMP tool is used This facility is enabling world class research BASIC DESCRIPTION TECHNICAL SPECIFICATIONS mately 100m2 of cleanroom space divided for planarisation. to be carried out. It is available to research The Femtosecond Laser System provides — Z-scan technique is a useful tool to — Femtosecond laser ablation and up into class 100, class 1000 and class communities both internally and externally as an understanding of ultrafast photodynamic measure the non-linear index n2 and the deposition: When a high power pulsed 10,000 areas. Lithography: An OAI mask aligner is well as offering high value technical support processes in physics, chemistry and biology. non-linear absorption coefficient by using laser beam is focused on the target suitable for dimension down to approx to our industrial partners. It supports many techniques, such as Z-scan the “open” (without aperture) and “closed” inside a vacuum chamber, tiny controlled This multi-material facility can produce 1um. There is also an NIL module, as well techniques, spectroscopy and pulsed laser (with aperture) methods respectively. amounts of material can be vaporised and devices on substrates up to 100mm in as front and backside alignment capability. Industrial customers can avail of trial runs ablation and deposition. — The pump-probe uses two laser pulses to ejected from the surface in the form of diameter. The facility has processing A Heidelberg DWL system provides mask using new and innovative materials on the excite and measure the electronic structure a vapour. This vapour can be deposited capabilities in the areas of silicon, compound making capability as well as direct writing toolset. Novel processing techniques and of materials via the relaxation of the excited in the form of a thin film on a reference semiconductors, polymers and glass and capability down to approx 0.8um. sequences can also be developed without electron and vibration states in materials. sample. The process of removing material can be used to develop prototypes for a taking up valuable tool time in an industrial — It is one of the most powerful tools for from the target surface is called laser variety of industrial partners, for example Deposition: A Temescal evaporator provides environment. Using these resources, new investigating energy and charge transfer ablation. The process of depositing the electronic, solar, medical etc. film deposition capability using either e-beam materials can be characterised and tested processes. It couples the electronic and ablated materials on a substrate to form a or thermal evaporation. There is also an for suitability of purpose. vibrational degrees of freedom, vibrational thin film is called pulsed laser deposition. The installed toolset provides process integrated RIE process to clean the surface and conformational relaxation and The process can take place under capability as follows: prior to film deposition. An Edwards evapo- isomerisation. vacuum, or in the presence of a gas, such rator is another ebeam evaporator which is Intel Researcher in Residence in as oxygen which is commonly used, for Thermal processing: An ATV furnace mainly used for dielectric film deposition. CRANN’s class 100 cleanroom. example, when depositing thin oxide films. provides a full range of atmospheric processing such as annealing, wet and dry Measurement: A nanospec is available for 01 oxidation. A Heatpulse RTP system also transparent film thickness measurements provides anneal and dry oxidation processes and a Dektak profilometer is available for 01_ Femtosecond Laser System at CRANN. with a ramp rate up to 100 C/s. step height measurements. Etch: An Oxford instruments ICP etcher has been installed to provide silicon, oxide, nitride and polymer etching. A Diener Pico plasma system also provides surface preparation capability. An Arias wet bench provides BOE and hot phosphoric etching of silicon dioxide and silicon nitride.