Suss Micro Optics, Wafer Scale Manufacturing, R. Voelkel, June 2009

3,613 views

Published on

0 Comments
1 Like
Statistics
Notes
  • Be the first to comment

No Downloads
Views
Total views
3,613
On SlideShare
0
From Embeds
0
Number of Embeds
50
Actions
Shares
0
Downloads
110
Comments
0
Likes
1
Embeds 0
No embeds

No notes for slide

Suss Micro Optics, Wafer Scale Manufacturing, R. Voelkel, June 2009

  1. 1. Wafer Scale Manufacturing Processes In Optical Technologies For Illumination Reinhard Völkel SUSS MicroOptics, Neuchâtel www.suss.ch, info@suss.ch
  2. 2. Light Makes The Difference! Egyptian God Ra with Madame Taperet , 1000 BC (Louvre, Paris) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 2
  3. 3. Light Makes The Difference! Thomsas A. Edison (Patent 1880) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 3
  4. 4. Lighting Roadmap 4
  5. 5. Lighting, Illumination: Optics Is Light Work! Light Sources Devices, Systems „Collect all photons and illuminate!“ Performance (brightness, contrast, color, uniformity, efficiency) Size (larger area, smaller device) Costs (manufacturing, energy saving, lifetime) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 5 Source: 3M Vikuiti, ASML, Coherent
  6. 6. Conservation of Etendue – Lagrange Invariant  Etendue is a property of an optical system, which characterizes how "spread out" the light is in area and angle.  Lagrange invariant is a measure of the light propagating through an optical system. For a given optical system, the Lagrange invariant is a constant throughout all space, that is, it is invariant upon refraction and transfer. R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 6
  7. 7. Concepts for Illumination
  8. 8. Optical Design & Illumination  Leonard Euler (1707 – 1783) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 8
  9. 9. Köhler Illumination, Köhler Integrator (Fly‘s Eye) In 1893 August Köhler (1866–1948) from Carl Zeiss in Jena, introduced a new and revolutionary method for uniform illumination of specimen in an optical microscope in his doctoral thesis. The Köhler method allows to adjust the size and the numerical aperture of the object illumination in a microscope independent from each other. August Köhler, Zeitschrift für wissenschaftliche Mikroskopie, Band X, Seite 433-440 (1893) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 9
  10. 10. Köhler Illumination, Köhler Integrator (Fly‘s Eye) In 1893 August Köhler (1866–1948) from Carl Zeiss in Jena, introduced a new and revolutionary method for uniform illumination of specimen in an optical microscope in his doctoral thesis. The Köhler method allows to adjust the size and the numerical aperture of the object illumination in a microscope independent from each other. August Köhler, Zeitschrift für wissenschaftliche Mikroskopie, Band X, Seite 433-440 (1893) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 10
  11. 11. 1946: Microlens Array Homogenizer R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 11
  12. 12. 2005: Nikon Corporation R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 12
  13. 13. Light Sources Today: More Power – Less Energy!  Uniformity  Efficiency  Costs R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 13
  14. 14. Illumination Concepts For Displays Source: 3M Vikuiti R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 14
  15. 15. Richard Ulbricht Invented The Ulbricht Sphere  Dr. Richard Ulbricht (1849 – 1923, Dresden)  Invented the Ulbricht Sphere when he was trying to find the optimium optics for electrical illumination of Dresden„s train stations (≈ 1891) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 15
  16. 16. Tasks for Micro-Optics Intensity LED Plastic, Glass LED Homogenization Reflector Substrate Beam Collimation Beam Shaping R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
  17. 17. RXI Collimator RXI Refraction Reflection Total Internal Refraction • High efficiency LED out-coupling • Etendue limited performance (88% max) • Short (D / L ~ 3) • Bezier curves description (8 surfaces) • Direct optimization R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
  18. 18. Wafer-Scale Manufacturing Is Quite Sucessful!  Wafer-based „SEMI“ technology changed our world dramatically in the last 50 years!  Manufacturing concepts from SEMI are adapted for other products.  Computers, digital cameras, displays, LED, OLED, high-power switches, wafer-level cameras, ...  Wafer-based „SEMI“ technology for Optics is very successful.  Question: Is it now possible to integrate Optics on the LED using Wafer-Level Packaging? 18
  19. 19. Wafer-Level Camera (WLC) Microlens Imprint Lithography (SMILE)
  20. 20. Example: Mobile Phone Cameras R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 20
  21. 21. Example: Mobile Phone Cameras Wafer-Level Solutions R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 21
  22. 22. Microlens Replication on Wafer Level 1. Lens Imprinting 2. Lens Transfer Stamp Holder PDMS Stamp on glass baker Loaded PDMS Stamp UV epoxy Wafer Chuck with glass inlay Fabricated lens wafer with residual layer Fabricated lens wafer with transferred lenses R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 22
  23. 23. Wafer-Level Packaging of Lens Wafer Process equipment:  Substrate holder with glass inlay to hold buffer and lens wafers by vacuum Substrate holder  Edge handling chuck or buffer plate avoids lens damages on lens surfaces  Assisted Alignment for highly precise alignment of Opto wafers prior to UV bonding  High intensity UV exposure for short process times Substrate VAC 1 Holder VAC 2 Edge Handling Chuck Loaded buffer wafer with double sided lens wafer on edge handling chuck Edge handling chuck for lens stacking with loaded buffer wafer SUSS MA/BA8 Gen3 Opto wafer stack with UV bonded lens wafer R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 23
  24. 24. BMBF-VDI COMIKA: Wafer Level Camera UV Bond: Delo Katiobond AD VE18499 100µm Schott B33, 8” Basic concept of WLC sample UV Bond: Delo PHOTOBOND 4302 MA/BA8 Gen3 Micro Lens replication on 200mm wafer Material: Delo Katiobond 18499 R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 24
  25. 25. Micro-Optics on Wafer-Level Unwrapped phase / lambda Refractive Microlens Arrays (ROE) Binary Optics Diffractive Optical Elements (DOE) Wafer-Level Camera for disposable endoscopes (Photo: AWAIBA) Random Diffusers, Homogenizer Wafer-Level Camera, Fiber Arrays, Sensors R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 25 252.15 504.31 756.46 1008.62 1260.77
  26. 26. Micro-Optics on Wafer-Level Unwrapped phase / lambda Refractive Microlens Arrays (ROE) Binary Optics Diffractive Optical Elements (DOE) Random Diffusers, Homogenizer Wafer-Level Camera, Fiber Arrays, Sensors R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 26 252.15 504.31 756.46 1008.62 1260.77
  27. 27. Wafer-Based Manufacturing Technology For MicroOptics
  28. 28. SUSS MicroOptics – We Set The Standards  World leading supplier of high-quality Micro-Optics  8‟‟ Wafer Technology, Wafer-Level Packaging, SUSS Imprint Lithography  More than 200 active customers, e.g. to SEMI equipment manufacturers, Laser & Optics industry, Sensors & Metrology and Medical  Part of the SUSS MicroTec Group (www.suss.com) Neuchâtel, Swiss Watch Valley SMO is “Preferred Supplier” for Carl Zeiss SMT AG: DUV Laser Beam Shaping Solutions (ASML Steppers) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 28
  29. 29. SUSS MicroOptics – 8’’ Wafer Fab Cleanroom facility (Class 1 – 1000) for the wafer-based manufacturing of high-quality Micro-Optics Fully established 8‘‘ technology based on SEMI processes  200 mm wafer size (8‟‟)  Fused silica, Borofloat, Silicon and CaF2  Refractive Microlenses: Spheres, aspheres  Diffractive Optical Elements (16-level)  Random diffusers, hybride Micro-Optics  Double sided arrays, stops, coatings  Wafer-Level Packaging, Bonding  Master Lens Arrays for Replication and Imprint Lithography 29 R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
  30. 30. Micro-Optics Solutions SEMI  Semiconductor Technology Technology 18% Divers  Industrial Optics & Vision Research 9% 7%  Healthcare & Life Science Metrology 7%  Metrology Laser & Health Care & Life Material Science  Laser & Material Processing Processing 9% 28% Information  Information Technology Techn. 8% Unwrapped phase / lambda Industrial 1 2 60 .7 7 Mean -0.10 RMS 0.34 Optics,  Research P-V 2.94 Vision 14% 1 0 08 .6 2 0.72 7 5 6.4 6 0.13 y / no rm. rad iu s Ph ase / lamb d a -0.46 5 0 4.3 1 -1.04 -1.63 2 5 2.1 5 -2.22 0 .0 0 0.00 252.15 504.31 756.46 1008.62 1260.77 x / norm. radius R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 10.02.2005 Zeiss Diffusor 6101 HH, 10-02-05 RV 14:49:32 SUSS MicroOptics
  31. 31. Wafer-Based Manufacturing of Microlens Arrays (ROE)  SUSS MicroOptics uses standard manufacturing technologies from Semiconductor Industry, like resist coating, lithography, resist melting, reactive ion etching, deposition, sputtering and lift-off  Excellence in quality, array uniformity, and lateral dimension accuracy R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 31
  32. 32. High-Quality Diffractive Optical Elements  8„„ wafer scale  Binary, 8-level, 16-level  SiO2, B33, Si, CaF2  0.5 μm min feature size  < 50nm overlay accuracy  190nm to 5µm wavelength R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 32
  33. 33. Laser Beam Shaping and Homogenizing
  34. 34. Laser Beam Shaping Excimer Flat-Top Flat-Top (2D Flat-Top (1D) Spot-Generator Line-Generator Ablation (borosilicate) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
  35. 35. Diffuser for Köhler Integrator No diffuser Diffuser (rotating) Uniformity: > 10 % Uniformity: << 5 % Experiment: Laser Diode, 670 nm, condenser lens ƒFL = 40 mm R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 35
  36. 36. SEM – Images of Diffusers Ground Glass 10° E Diffuser (SMO) HT Diffuser 1° (SMO) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 36
  37. 37. Shaping of Random Diffusers Ground Glass Diffuser 1  300 m 1  160 m 1  500 m  2  100 m  2  70 m  2  160 m Shaped Random Diffuser (2D) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 37
  38. 38. Improved Diffuser Plates (Fused Silica) Encircled Energy  Gauss, Super-Gauss, IFlat-Top, … 1 Rotational  No zero order, sharp cut-off, nosymmetric loss in large angles Gaussian like intensity HWHM shape >1.34 2.52° Encircled Energy 1.23° ° -5 -4 -3 -2 -1 0 1 2 3 4 5 R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 38
  39. 39. Static 1D Random Diffuser R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 39
  40. 40. MO-Optics: Customized Illumination for SUSS Mask Aligner
  41. 41. MO-Optics – YIELD IMPROVEMENT MO-Optics  Better uniformity (± 2%)  More light (up to 25%)  Flexible illumination settings  Higher resolution for proximity, steeper sidewalls  Optimized illumination for specific mask pattern R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
  42. 42. Example: 480 µm Proximity GAP  Aligner: MA150 @SMO, Angle Defining Element: Small Ring  Proximity Gap: 480µm  Photoresist: AZ 1.3µm dick (Silizium-Wafer) 20µm Lines & Spaces (MO-Optics, Ring) 20µm Vias (MO-Optics, Ring) R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
  43. 43. MO-Optics: Gray-Level with Customized Illumination (Proximity Lithography at Fraunhofer IOF, Jena) #2588 Malteser 0°IFP LV1.0 #2589 Ring IFP LV0.5 #2590 Malteser 45°IPF LV1.0 #2591 ohne Blende R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
  44. 44. Substrate Conformal Imprint Lithography (SCIL) Marc A. Verschuuren, Robert van de Laar, Hans van Sprang Philips Research
  45. 45. 45
  46. 46. 46
  47. 47. 47
  48. 48. R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009 48
  49. 49. Future: Light Sources and Collimation Optics on Wafer-Level?
  50. 50. SUSS. Our Solutions Set Standards SUSS MicroOptics www.suss.ch SUSS MicroTec www.suss.com R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009

×