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FCIPT & Plasma Processing

FCIPT & Plasma Processing

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  • 1. Facilitation Center for Industrial Plasma Technologies Institute for Plasma Research (An Autonomous Institute of DAE, Govt. of India) ISO 9000:2001 Center A Brief Overview of FCIPT Project Leader: Dr. S. Mukherjee (mukherji@ipr.res.in) Established by Institute for Plasma Research in 1997 Dedicated to environment friendly industrial plasma applications Concept to Commercialization Approach Transfers IPR’s knowledgebase to benefit Indian industries: plasma processes, instrumentation development & technology transfer Transferred Plasma Pyrolysis (for Hospital Waste) to M/S Bhagwati Pyrocast (Ahmedabad) & Plasma Nitriding to M/S Milman Thin Films (Pune)
  • 2. FCIPT and It’s Competence Surface Environment Modelling * Contract Technology Service (Processes, Engg. Remediation Research Development Devices, & Life time prediction Dielectric Plasma Plasma PECVD Barrier Nitriding Pyrolysis Discharge Instrumentation Plasma Process PSII & plasma Etching Development sources Material Analysis Jobbing & Demonstration
  • 3. Low Pressure Industrial Application of Plasmas (also known as Plasma Surface Eng.) Modification Modification on surface below surface SURFACE •PEPVD •PECVD •Nitriding •Etching •Implantation
  • 4. Plasma Etching Application in Angora fiber processing and water filter surface activation Angora Rabbit At Kullu, world’s first Atm. Plasma Treated Plant Untreated Atm. Plasma Treated Untreated Fiber After Air plasma treatment
  • 5. Plasma Etching –Water Filter Surface Activation Carbon water filters – air plasma surface activation for inducing hydrophilicity on final products
  • 6. Plasma Enhanced Deposition Formation of Thin Films in an Env. Friendly way Development of SiOx coating for various applications using HMDSO precursor in RF Capacititive plasma
  • 7. Plasma nitriding, Plasma Silicon oxy-nitride - source ion implantation, Antireflection coating Plasma polymerization, for solar cells, thermal plasma for decorative coatings ceramic powder treatments Role in Materials, processes & technology development Welding (Cu-SS) and Protective ‘Silicon brazing joints (Cu-W, oxynitride’ coating Cu-Graphite etc.) for using PECVD on large Tokamak and other size ((35 cm X 35 cm) applications silver mirrors
  • 8. Plasma Surface Modification for making Skin Mimics for testing P&G Products A Confidential Project Major Steps to make Skin Mimics 1. Polymer Casting to make base of skin mimic 2. Plasma Processing to create Wet / Dry skin mimic 3. QC Check for the produced skin mimic 4. Packing & Dispatch of Skin Mimics QC Standards are followed very strictly from Raw Material to Final Product to ensure High Quality Service to valuable customers 1. Raw Polymer Liquid – Viscosity Measurement 2. Plasma Process – Uniformity for thickness & surface chemistry: Surface Energy Measurement 3. Mimic Hardness – Durometer for Shore A hardness 4. Mimic Transparency – L a b Values 5. Wet / Dry Property – Surface Energy Measurement 6. Surface Chemistry – XPS Analysis
  • 9. Plasma Nitriding Increasing Life of Industrial Components Sectors Benefiting: - Plastic molds - Auto-components - Aerospace - Space research - Defence - Textile component - Brass dies - Hydropower Hot wall Plasma Nitriding reactors Technology Transferred to ∅ (∅ 1500 mm x 1000 mm); reactors M/s Milman Thinfilm Systems Pvt. Ltd., Pune, India for can be stacked on top of each other commercialization
  • 10. Plasma Nitriding – Various Applications Crankshafts Guide Vanes Automatic gear box parts Plasma Nitriding Reactors built by our Tech. Transfer Partner M/s Milman Thin Films (PUNE) NBC, BIT, FCIPT @ Jaipur IGTR, GUJCOST, FCIPT @ Ahmedabad
  • 11. Plasma Immersion Ion Implantation Non-thermodynamic incorporation of elements Bias = upto -20 kV Fluence = upto 1018/cm2 Cross-sectional SEM: -20 kV nitrogen PIII of AISI316. The expanded austenite thickness ~ 8 Gas = N2, Ar, O2, CH4, H2 microns has higher hardness without loosing corrosion resistance. Temperature = upto 550 C Processing time = upto 24 hrs Pulse = IGBT / Tetrode
  • 12. Plasma Source Ion Implantation in India At FCIPT; gaseous ion implantation (-20 kV) At IIT- Kgp ionImplantation (- 20 kV) At FCIPT; multi metal deposition & implantation (-5 kV)
  • 13. Plasma Deposition - Cu coating on Polycarbonate B Magnetron E EXB Poly mer surf ace Cu Sample Holder Magnetic Field Coils Physical Vapour Dep. Sputter = Copper P = 10 microbar Gas = Argon Sputter bias = -800 V Substrate bias = pulsed 30 cm – 1 kV
  • 14. Plasma Deposition - Teflon coating on steel Untreated SS surface Teflon coated SS surface Chemical Vapour Deposition Gas: CF2 containing precursors Pressure: 10 microbar Substrate bias: RF (13.56 MHz), develops negative self bias which enhances ion bombardment
  • 15. Coatings for fusion Applications • Indian TBM – LLCB involves liquid + solid breeder design • T permeation, liquid metal corrosion & MHD drag are core issues • Alumindes with a top alulmina coating are considered candidate coatings for TBM • Process optimization under progress for hot dip aluminized coatings 3000 100 ● αFe 90 2500 BSE Image Al 80 Fe2Al5 Al ● 70 2000 Wt% Concentration Intensity (cps) Fe 60 1500 50 ● 40 1000 30 SE Image 20 Al 500 10 ● 0 Steel 0 20 40 60 80 100 0 50 100 150 200 250 Case Depth (m icrons) 2 Theta (degree)
  • 16. Surface Science Advanced Material Characterization Laboratory
  • 17. Plasma Pyrolysis Eco-Friendly Waste Remediation Technology • Thermal decomposition of carbonaceous material (using atmospheric pressure Plasma) in the absence of oxygen. • Heat causes the molecules to disintegrate during pyrolysis and leads to fragmentation of compounds. Useful to destroy: • Medical waste & Plastic waste • Municipal Solid waste • Toxic Chemical waste • Contaminated PVC waste • Hazardous waste
  • 18. Plasma Pyrolysis Eco-Friendly Waste Remediation Technology Features: • Complete destruction of waste • Free from NOx and dioxin emissions • Negligible bottom ash • Destroys pathogens by UV radiation. • Low manpower requirement • ENVIRONMENT FRIENDLY SYSTEM • Provisions for generation of ELECTRICITY from waste Fig: Plasma Pyrolysis system installed at Goa Medical College, Goa, India. Plasma Pyrolysis Technology for We are installing this system at 10 different Medical waste disposal transferred to locations across India M/s Bhagwati Pyrotech Pvt. Ltd., A’bad, for commercialization. Volume minimization of low level nuclear waste is being developed alongwith BARC
  • 19. Features Graphite Arc based Plasma Pyrolysis System Developed at FCIPT • Graphite plasma torch • Continuous operation • No heat losses due to cooling of torch electrodes • Proper refractory lining to minimize heat losses • Secondary chamber with special design to reduce soot particles
  • 20. Future Activities of FCIPT 1. WASTE MANAGEMENT - Energy recovery from waste - Safe disposal of variety of waste streams ( E-Waste) 2. SURFACE ENGINEERING and Modifications - Development of large coatings facilities - Plasma Nitrocarburizing & Carburizing - Plasma Etching & Textile Applications - Industrial Scale Systems Development 3. PLASMA DEVICES - Pulsed plasma thruster - Plasma diagnostic tools (probes, RPA) 4. POPULARIZING EXPERIMENTAL PLASMA SCIENCE RESEARCH IN INDIA
  • 21. FCIPT (IPR) & PLASMA PROCESSING In INDIA IPR, GANDHINAGAR Plasma Nitriding Plasma Implantation PYROLYSIS Thin Films Plasma Instrumentation