6th industrial symposium on nil & industry session on nanotechnology standards
th 6 Industrial Symposium on Nanoimprint Lithography & Industry Session on Nanotechnology Standards 23rd May 2012 | 0900 -1600 | Seminar Room 1 Institute of Materials Research and Engineering 3 Research Link, Singapore 117602Roll-to-roll nanoimprinting Direct imprinting of high resolution Water pinning on nano-structured TiO2 nanostructures plastic film Invited international speakers from: Co-organised by: Supported by:Register online by 21 May 2012 at http://www.imre.a-star.edu.sg/events.php?id=B531O538N534 Registration is free, however pre-registration is compulsory.
th 6 Industrial Symposium on Nanoimprint Lithography & Industry Session on Nanotechnology Standards 23 May 2012 ∙ IMRE, SingaporeSCOPE OF 6th INDUSTRIAL SYMPOSIUM ON NANOIMPRINT LITHOGRAPHYThe past five annual industry symposia on nanoimprint lithography have been excellentsources of information for corporate attendees of all stripes, from potential end-users tovalue-chain enterprises, seeking to stay abreast of the latest developments in the field. The6th Industrial Symposium on Nanoimprint Lithography, 2012 will emphasise commercialapplications that are closest to production. International speakers from companies withinterests in nanoimprint technology will emphasise this theme, as well as convey recentdevelopments in their respective businesses. Furthermore, there will be corporate exhibitsshowcasing the latest products produced by and for nanoimprint technology. Thesymposium is intended to be a platform for fostering new partnership and explore newcollaborations with industry.Chairperson (6th Industrial Symposium on Nanoimprint Lithography)Chair Hong Yee LOW Institute of Materials Research and Engineering, SingaporeCo-chair & Jaslyn LAWCorrespondence Institute of Materials Research and Engineering, Singapore 3 Research Link, Singapore 117602 Tel: (65) 6874 7902; Email: email@example.com Edwin KHOO Institute of Materials Research and Engineering, Singapore 3 Research Link, Singapore 117602 Tel: (65) 6874 1975; Email: firstname.lastname@example.org
th 6 Industrial Symposium on Nanoimprint Lithography & Industry Session on Nanotechnology Standards 23 May 2012 ∙ IMRE, SingaporeSCOPE OF INDUSTRY SESSION ON NANOTECHNOLOGY STANDARDSThe National Working Group for Nanotechnology Standards represents Singapore in theInternational Organisation for Standardisation (ISO) Technical Committee (TC) 229 onnanotechnology standards. ISO has 163 member countries involved in preparinginternational standards through ISO TCs. The National Working Group participates in ISOTC 229 on nanotechnologies which focuses on four main themes, namely: i) Terminologyand Nomenclature ii) Measurement and Characterisation iii) Health, Safety and Environmentand iv) Materials Specifications. Research laboratories, industry, consumers, trade,government, distributors, etc. are involved through their national working groups for theircountry, tapping on international expert networks and shaping ISO standards to facilitatetrade, improve quality and safety and protect health. The National Working Group forNanotechnology Standards is an active member in the ISO TC 229 and is committed to workeffectively with all relevant parties in Singapore. The industry session will highlight therelevance of particular ISO TC 229 nanotechnology standards to Singapore’s industry andresearch entities and how they could connect to the ISO standards platform given thepotential impact of nanotechnology on health, safety and trade.The National Working Group for Nanotechnology Standards is under the ChemicalStandards Committee (CSC) which is managed by the Standards Development Organisationat the Singapore Chemical Industry Council (SDO@SCIC). The CSC is one of the 11Standards Committees under the Standards Council which is administered by SPRINGSingapore, the national standards body.Chairperson (Industry Session on Nanotechnology Standards)Chair Ramam AKKIPEDDI Institute of Materials Research and Engineering, SingaporeCo-chair & Angeline POHCorrespondence SDO@SCIC, Singapore Chemical Industry Council 8 Jurong Town Hall Road #25-04, the JTC Summit Tel: (65) 6267 9661; Email: email@example.com
Time Programme0900 Registration0930 Opening Speech By Professor Andy Hor (Executive Director, Institute of Material Research and Engineering, A*STAR)0940 Appreciation Ceremony for ICON Project 1 & 2 Consortium Members1010 Nanoimprint Lithography for Biomedical Device Manufacturing By Mr. Gerald Kreindl (EVG)1025 High-Throughput UV Nanoimprint Process Using Resin Mold for High-Brightness Light- Emitting Diodes By Mr. Takafumi Okawa (Toshiba Machine CO LTD)1040 Break1110 A Universal Scheme for Direct Nanoimprint Lithography of Oxides By Dr. MSM Saifullah (Institute of Material Research and Engineering, A*STAR)1125 Resist Materials for Industrial Nanoimprint Processes By Dr. Marko Vogler (micro resist technology GmbH)1140 Nanoimprint Molds Produced Using Multi-Processing Fabrication By Dr. Chiharu Takahashi (NTT Advanced Technology Corporation)1155 New Applications for Nanoimprint By Mr. Theodor Kamp Nielsen (NIL Technology ApS)1210 Recent Progress on Wafer and Seamless Roller Nano-imprint Molds for HDD, LED and Display Applications By Mr. Tsuyoshi Watanabe ( HOYA Corporation)1225 Lunch1400 A Large Scaled Moth-Eye Film Development and Its Application By Mr. Tatsuo Shirahama (InnoX Co, Ltd)1415 Manufacturing of Engineered Micro- and Nano-structures By Dr. Melvin Zin (3M Singapore R&D Center)1430 International Nanotechnology Standards and Singapore By Professor Andy Hor (Chairperson, Working Group for Nanotechnology Standards)1445 International Perspectives on Nanotechnology Risk Issues - Synopsis By Professor Rob Aitken (Director of Strategic Consulting, Institute of Occupational Medicine & Director, SAFENANO initiative)1500 Using the International Nanotechnology Standards ISO TC 229 Platform for Industry By Dr. Akkipeddi Ramam (Singapore Representative, Working Group for Nanotechnology Standards)1515 Closing Remark By Mr. Yi-Hsen Gian (Director, Industry Identification and Incubation, Singapore Economic Development Board )1530 End of Programme and Tea Break