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Iw2616951698

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IJERA (International journal of Engineering Research and Applications) is International online, ... peer reviewed journal. For more detail or submit your article, please visit www.ijera.com

IJERA (International journal of Engineering Research and Applications) is International online, ... peer reviewed journal. For more detail or submit your article, please visit www.ijera.com

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  • 1. Soumya Gadag, Raviraj D.Chougala / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 6, November- December 2012, pp.1695-1698Design and Analysis of 6T SRAM Cell with low Power Dissipation Soumya Gadag*, Raviraj D.Chougala** *(Assistant Professor Department of Electronics and Communication Angadi Institute of Technology and Management Belgaum, India ** (Assistant Professor Department of Electronics and Communication Angadi Institute of Technology and Management Belgaum, IndiaAbstract In the current technology demand for leakage power by adding some transistors. EachSRAM is increasing drastically due to its usage in technique provides an efficient way to reduce thealmost all embedded systems, forms a integral leakage power, but disadvantage of each technologypart of computer, System On Chip and high limit the application of each technique. In this paperperformance processors and VLSI circuits etc. SRAM cell was designed with different technologyThe Power Consumption has become a major and analyze the power consumption in eachconcern in Very Large Scale Integration circuit technique.designs and reducing the power dissipation hasbecome challenge to the Low power VLSI II. CONVENTIONAL 6T SRAM CELLdesigners. As power dissipation increases with the In a 6T cell, it consists of 6 Transistors andscaling of the technologies. As the feature size each bit in SRAM is stored on four transistors thatshrinks ,static power has become a great form two cross- coupled inverters. This storage cellchallenge for current and future technologies. In has two stable states which is used to denote 0 and 1.this research work, we design 6T SRAM and Two nMOS transistors serves as the accesssome of the techniques to reduce the leakage transistors to control the access to storage cell duringpower using like sleep approach, stack approach read and write operation. Access to the cell is enabledtechniques which reduces the leakage power by the word line which controls the two accesswithout changing the exact operation of SRAM. transistors M5 and M6 which in turn control whetherThe proposed circuits were designed in 0.18um the cell to be connected to BL and BLB. They areCMOS VLSI technology with a Microwind tool, used to transfer data for both read and writeand measure the power dissipation for the operations. Both BL and BLB are used to improvedifferent design approach in Advanced BSIM4 the Noise Margins.level. Power reduction is achieved with associatedarea overhead. The total power dissipation islower by 40% as compared to the 6T SRAM cell.key words- Power dissipation, sleep, stack, leakagepower.I. INTRODUCTION SRAM has become a major component inmany VLSI Chips due to their large storage densityand small access time. SRAM has become the topicof substantial research due to the rapid developmentfor low power, low voltage memory design duringrecent years due to increase demand for notebooks,laptops, IC memory cards and hand held Fig1a: Schematic for basic 6T SRAM Cellcommunication devices. Power dissipation consistsof dynamic power and static power. Static power is III. LEAKAGE POWER REDUCTION CIRCUITSthe power dissipated in the design in the absence of A. SRAM Cell with Sleep Transistorany switching activity and is defined as the product In present deep-sub micrometer devicesof supply voltage and the leakage current. with low threshold voltages, sub threshold and gate The rising demand for multimedia rich leakage are dominant sources of leakage and areapplications in handheld devices continues to drive expected to increase with the technology scaling.the need for large and high speed SRAM to enhance Solutions for leakage reduction is required at the boththe system performance. The portable hand held process technology and circuit levels [3]. One of thedevices need to reduce the dynamic and static power methods is to have an nMOS connected to virtualconsumption in order to meet the battery life time. In ground terminal as shown in Fig.2 . Effect of sleepthis work an attempt has been made to reduce the transistor is negligible as far as error is concerned. 1695 | P a g e
  • 2. Soumya Gadag, Raviraj D.Chougala / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 6, November- December 2012, pp.1695-1698The sleep transistor is required to completelydischarge virtual ground to real ground prior toturning on the write line (WL) of cell. Fig 3a: Schematic of Ultra Low-power 8T SRAM Cell The information written in the SRAM cell gets reinforced by the action of pMOS and nMOS transistors in either inverter, as long as the power isFig 2a: schematic of SRAM Cell with Sleep there. During inactive state, WL=0, but due to thetransistor cross coupled inverters and low power stack transistors, M7 and M8, in the pull-down path, data Sleep signal is high in normal operation and stored remains uncorrupted, at reduced power.present as small resistance as possible. Proper C. 6T SRAM Cell using stacking Techniqueselection of sleep transistor is required as it affect thetrade off. It should be wide to minimize supply In the 6T SRAM cell, is shown in Fig.4a thefluctuation. At the same time higher threshold result transistors M8, M4, M10 and M6 form cross coupledin better leakage suppression [6]. This 6T SRAM inverters. The basic idea behind our approach forcontain two cross coupled inverters suitable for low reduction of leakage power is the effective stackingpower design. The sizing of inverters in SRAM cell of transistors in the path from supply voltage todoes not correspond to electron hole mobility ratio, ground. This is based on the observation made in [4]also the access transistors must be sized such that that “a state with more than one transistor OFF in astored bits are not flipped during a read operation . path from supply voltage to ground is far less leakyThus driver nMOS transistors must be stronger than a state with only one transistor OFF in any(larger W/L) than access transistors. supply to ground path.” In our method, we introduce two leakage control transistors in each inverter pairB. Ultra Low-power 8T SRAM Cell such that one of the leakage control transistor is near The 8T SRAM cell consists of two cross- its cutoff region of operation. Two leakage controlcoupled inverters made up of transistors M1, M3 and transistors (PMOS) and (NMOS) are introducedM2, M4. The transistors M5, M6 are access between the nodes and of the pull-up and pull-downtransistors. The two additional NMOS transistors M7 logic of the inverter. The drain nodes of theand M8, one each in pull down path of cross coupled transistors and are connected together to form theinverters are used to achieve leakage power output node of the Inverter. The source nodes of thereduction. The access transistors are connected to the transistors are connected to nodes of pull-up and pull-word line at their respective gate terminals, and the down logic, respectively. The switching of transistorsbit-lines at their drain terminals. The word line is is controlled by the voltage potentials at nodesused to select the cell while the bit lines are used to respectively. This wiring configuration ensures thatperform write and read operations on the cell. The one of the leakage control transistor is always near itsnode Q holds the stored value while other node QN cutoff region, irrespective of the input. Hence theholds its complement. The two complementary bit resistance of will be lesser than it‟s OFF resistance,lines are used to improve speed of write and read allowing conduction. Even though the resistance of isoperations. The 8T SRAM cell is shown in Fig. 2. not as high as it‟s OFF state resistance, it increasesThe SRAM cell is symmetric and hence M1=M2, the resistance of to ground path, controlling the flowM3=M4, M5=M6, M7=M8 [1]. of leakage currents, resulting in leakage power During write operation, word line (WL) is reduction. Thus, the introduction of leakage controlmade „1‟ and data to be written and its complement transistors increases the resistance of the path fromare imposed on the two complementary bit lines, BIT supply voltage to ground[5].and BITN. The data on the bit lines gets stored ontothe SRAM cell nodes „Q‟ and „QN‟ through accesstransistors, M5 and M6.[7] 1696 | P a g e
  • 3. Soumya Gadag, Raviraj D.Chougala / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 6, November- December 2012, pp.1695-1698Fig4a: Schematic of 6TSRAM Cell using stackingTechnique IV. MOTIVATION Fig 1c: Layout for basic 6T SRAM cell In the past few years a remarkable rise inVLSI fabrication has led to increase the densities ofintegrated circuits by decreasing the devicegeometries. Such high density circuits support highdesign complexities and very high speed butsusceptible to power consumption. Circuits withexcessive power dissipation are more susceptible torun time failures and give rise to reliability problems.The other factors behind the low power design isgrowing class of hand held devices, e.g., as portable Fig2b: Simulation results of SRAM Cell with Sleepdesktops, digital pens, audio and video based transistormultimedia products and wireless communicationssuch as PDA‟s and smartcards, etc.[2] These devices and systems demand highspeed and complex design functionalities. Theperformance of these devices is limited by the size,weight and lifetime of portable batteries. Memorydesign is an integral part in these devices and soreducing the power dissipation in these can improvethe system power efficiency, performance, reliability.In this paper provides the some possible solutions forlow power dissipation which in turn provides Lowpower SRAM Cell required for designing memory Fig2c: Layout of SRAM Cell with Sleep transistorsystems. V. SIMULATION RESULTS Fig3b: Simulation results of Ultra Low-power 8T SRAM CellFig1b: Simulation results for basic 6T SRAM Cell Fig 3c: Layout of Ultra Low-power 8T SRAM Cell 1697 | P a g e
  • 4. Soumya Gadag, Raviraj D.Chougala / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 6, November- December 2012, pp.1695-1698 Circuit Technique to Reduce Leakage in Deep submicron Cache Memories,” International Symposium on Low Power Electronics and Design, pp. 90-95, July 2000. [4] Z. Chen, M. Johnson, L. Wei and K. Roy, “Estimation of Standby Leakage Power inFig4b: Simulation results 6TSRAM Cell using CMOS Circuits Considering Accuratestacking Technique Modeling of Transistor Stacks,” International Symposium on Low Power Electronics and Design, pp. 239- 244, August 1998. [5] Atluri.Jhansi,K.Harikishore, “Designing anad Analysis of 8Bit SRAM Cell with Low Subthreshold Leakage Power. [6] Andrei Pavlov, and Manoj Sachdev,Fig4c:Layout of 6TSRAM Cell using stacking “CMOS SARM Design and ParametricTechnique Test in NAno-Scaled Technology: Process- Aware SRAM Design and Test,” Springer, Power dissipation Analysis between Basic SRAM 2008.and SRAM using leakage power reduction technique [7] R. Jacob Baker, H.W. Li, D.E. Boyce, “ CMOS Circuit Design, Layout and Simulation,” PHI 1998.VI.CONCLUSION In this paper we designed SRAM cell usingleakage power reduction techniques, to reduce powerdissipation. The anticipated circuits were designed in0.18um technology and analyzed for powerdissipation. Here we observed that in order to achievelow power consumption we compromised with areaand delay compared to the basic 6T SRAM .based onthe simulation results of SRAM, there is 40%reduction in power dissipation. Hence we concludethe proposed SRAM circuits used for low powerdesigns and these designed techniques are used toimprove the performance and can be used for lowpower applications.REFERENCES [1] H.P.Rajani and Shrimannarayan Kulkarni “Ultra low power 50nm SRAM for Temperature Invarient Data Retention”in CIIT 2011,CCIS 250,pp. 87-92. [2] International Technology Roadmap for Semiconductors by Semiconductor Industry Association, http://public.itrs.net, 2007. [3] M. Powell, S.-H. Yang, B. Falsafi, K. Roy and T. N. Vijay Kumar, “Gated-Vdd: A 1698 | P a g e

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